WDM传输系统中泵浦配置对光纤拉曼放大器增益特性的影响

通过理论分析和模拟运算,研究了光纤拉曼放大器泵浦优化的一般规律。     

织构对铟凸点剪切强度的影响

制作了2种形式的铟凸点：即直接蒸发沉积的铟柱和将铟柱回流得到的铟球。同时对比了铟柱和铟球2种凸点的剪切强度，测试结果表明铟球剪切强度为5.6MPa，铟柱的剪切强度为1.9MPa，前者约为后者的2.9倍。对铟凸点微观结构的X光衍射分析发现：铟柱剪切强度低是织构弱化所致；铟球剪切强度高是由于回流破坏了铟柱的理想（101）丝织构模式，从而提高了铟球的剪切强度。     

Pb/Sn凸剪切性能研究

在实际使用条件下,Pb/Sn凸点会由于承受温度循环而产生剪切应力,剪切应力导致的主要失效方式是开裂.通过对倒装焊后Pb/Sn凸点剪切强度的测量及对剪切后断口的分析,发现破坏主要发生在凸点下金属(UBM)层内部或UBM与Al焊盘之间,平均剪切强度受凸点尺寸影响很小,范围在21～24MPa。     

Proton and alpha evaporation spectra in low energy 12C and 16O induced reactions

Proton and alpha particle spectra have been measured in the ¹²C+⁹³Nb and ¹²C+⁵⁸Ni reactions at E(¹²C)=40 and 50 MeV and in the ¹⁶O + ⁹³Nb reaction at E(¹⁶O) =75 MeV. The spectra are compared with the statistical model calculations. The shapes of the calculated spectra are in agreement with experimental data except for the alpha spectrum in the ¹²C + ⁹³Nb reaction at 40 MeV. The observed evaporation bump is at ∼2 MeV lower energy compared to the calculated one. This discrepancy could imply alpha particle emission from a deformed configuration before compound nucleus formation at this near Coulomb barrier beam energy.     

Cross section of the impact single ionization of B2＋ by H＋

The ionization process of B2+ by H+ impact is studied using the continuum-distorted-wave eikonal-initial-state (CDW-EIS) method and the modified free electron peak approximation (M-FEPA), respectively. Total, single-, and double- differential cross sections from 1s and 2s orbitals are presented for the energy range from 10 keV/u to 10 MeV/u. Comparison between the results from the two methods demonstrates that the total and single-differential cross sections for the high-energy incident projectile case can be well evaluated using the simple M-FEPA model. Moreover, the M-FEPA model reproduces the essential features of the binary-encounter (BE) bump in the double-differential cross sections. Thus, the BE ionization mechanism is discussed in detail by adopting the M-FEPA model. In particular, the double- and single-differential cross sections from the 2s orbital show a high-energy hip, which is different from those from the 1s orbital. Based on Ref. [1], the Compton profiles of B2+ for 1s and 2s orbitals are given, and the hips in DDCS and SDCS from the 2s orbital are explained.     

铜柱凸块生产关键工艺技术研究

讨论了铜柱凸块生产工艺中籽晶层厚度和电镀电流密度等关键制程因素对铜柱凸块共面性、晶圆应力、凸块剖面结构和电镀效率等方面的影响.研究结果表明增加电镀籽晶层厚度可以提高凸块共面性;在相同电镀电流密度下,籽晶层越厚,晶圆应力越大;相同的籽晶层厚度下,随着电镀电流密度增加,晶圆应力增加,但增加速率逐渐变慢;低电流密度下铜柱凸块顶部形成盘碟形状的剖面结构,而高电流密度容易使铜柱顶部形成圆拱剖面结构;采用阶梯电镀速率电镀方法与均一慢电镀速率电镀出的铜柱凸块共面性一致,而采用阶梯电镀法既能够提高电镀效率又可以得到较好的铜柱顶部盘碟形剖面结构.     

Design rule of indium bump in infrared focal plane array for longer cycling life

In light of the proposed equivalent method, a three-dimensional structural modeling of InSb infrared focal plane arrays (IRFPAs) is created, and the simulated strain distribution is identical to the deformation distribution on the top surface of InSb IRFPAs. After comparing the deformation features at different regions with the structural characteristics of IRFPAs, we infer that the flatness of InSb IRFPAs will be improved with a thinner indium bump array, and this inference is verified by subsequent simulation results. That is, when the diameter of indium bump is smaller than 20 μm, the simulated Z-components of strain on the whole top surface of InSb IRFPAs is uniform, and the deformation amplitude is small. When the diameter of indium bump is larger than 28 μm, the simulated Z-components of strain increases rapidly with the thicker indium bump, and the flatness of InSb IRFPAs is worsened rapidly. According to the changing trend of deformation amplitude with diameters of indium bump, and employing element pitches normalization method, a design rule of indium bump is proposed. That is, when the diameter of indium bump is shorter than 0.4 times the element pitch, the flatness of InSb IRFPAs is in an acceptable range. This design rule was supported by different IRFPAs with different formats delivered by several main research groups for achieving a longer cycling life.     

圆片级封装的凸点制作技术

圆片级封装是一种先进的电子封装技术,近年来,圆片级封装技术的发展速度很快,主要应用于系统级芯片、光电器件和MEMS等.凸点制作是圆片级封装工艺的关键工序,目前凸点制作工艺方法有多种,重点介绍常用的电镀法、植球法和蒸发沉积法凸点工艺,分别介绍这三种凸点制作技术的工艺流程、关键技术.     

化学镀Ni-P在纯锡凸点的应用及界面研究

采用化学镀Ni-P作UBM阻挡层,利用电镀的方法制备了面阵列和周边排布的无铅纯锡凸点,凸点高度为85±2μm,一致性良好。研究了不同回流温度下纯锡焊球的剪切强度、断裂模式和与Ni-P层反应生成的金属间化合物。结果表明,纯锡凸点回流时与Ni-P生成针状Ni3Sn4,凸点剪切强度达到92MPa以上。剪切断裂为韧性断裂,随着回流温度提高及回流时间延长,Ni3Sn4相由针状向块状转变,Ni-P层与Ni3Sn4层间生成层状Ni3P相,粗化的Ni3Sn4相受压应力向焊球内部脱落。     

热超声倒装焊在制作大功率GaN基LED中的应用

设计了适合于倒装的大功率GaN基LED芯片结构,在倒装基板硅片上制作了金凸点,采用热超声倒装焊接(FCB)技术将芯片倒装在基板上.测试结果表明获得的大面积金凸点连接的剪切力最高达53.93 g/bump,焊接后的GaN基绿光LED在350 mA工作电流下正向电压为3.0 V.将热超声倒装焊接技术用于制作大功率GaN基LED器件,能起到良好的机械互连和电气互连.