一种基于FPGA的可变速率帧结构设计与实现

在简述V.35接口的基础上针对V.35接口速率可变的应用需求提出了一种速率可变的帧结构,该帧结构可支持N×64kb/s(3≤N≤32)速率,从而在V.35接口上实现了多种速率的低速业务传输.     

Microstructural stability and age-hardening behavior of Re-added dual two-phase Ni3Al and Ni3V intermetallic alloys

The effect of Re addition on the microstructure and hardening behaviour of the dual two-phase Ni₃Al (L1₂) and Ni₃V (D0₂₂) intermetallic alloy was investigated by scanning electron microscopy, transmission electron microscopy and Vickers hardness test. The two-phase eutectoid microstructure accompanying the Re-rich precipitates were observed in the channel region of the alloys in which Re substituted for Ni but not in those in which Re substituted for Al and V. The concomitant addition of Nb (or Ta) with Re more stabilized the two-phase eutectoid microstructure and consequently more induced the fine precipitates in the channel region. The annealing at temperatures below the eutectoid temperature was necessary to induce the fine precipitates in the channel region and thereby result in the precipitation hardening. The fine precipitation in the channel region and related hardening was attributed to the alloying feature so that Re is soluble in the A1 (fcc) phase at high temperatures and becomes less soluble in the two intermetallic phases decomposed from the A1 phase at low temperatures.     

HE-AAC V2编码原理及其应用

在保证优秀的音频质量下,提高音频编码的压缩效率是数字音频技术一直追求的目标,简单介绍目前最先进的音频编码HE-AAC V2的原理及应用,着重介绍其中用到的两种新技术频带复制(SBR)技术和参数立体声(PS)技术.     

应用数字PWM器件SA4828的大功率直流电源

本文介绍一种智能型、高精度PWR控制器SA4828，其控制实行全数字化产生三相脉宽调制波形．本文采用此器件设计大功率直流电源应用于22KW直流电机测试，对感性负载表现出具有纹波小，响应迅速、硬件电路简洁、控制简单易于编写的优点。     

铁电存储场效应晶体管I-V特性的物理机制模拟

文章讨论的模型主要描述了铁电存储场效应晶体管（FEMFET）的I-V特性。从理论结果可反映出几何尺寸效应和材料参数对晶体管电特性的影响。传统的阈值电压的概念巳不再适用，由于铁电层反偏偶极子的开关作用，自发极化的增加对存储器的工作状态产生很小的影响。该模型可用于设计和工艺参数的优化，并由直观原型的方法得到了验证。     

(Nd_(1-x)Er_x)_2Co_(15.5)V_(1.5)的结构转变与磁性

利用电弧熔炼制备了 (Nd1 xErx) 2 Co1 5 5V1 5(x=0— 1 0 )化合物样品 .通过x射线衍射分析和磁性测量研究了Er替代Nd2 Co1 5 5V1 5中的Nd时对化合物结构和磁性的影响 .研究结果表明 ,低Er含量 (x <0 4 ) ,化合物为Th2 Zn1 7型结构 ;高Er含量时 (x >0 5 ) ,化合物转变为Th2 Ni1 7结构 ;Er含量为x =0 4和 0 5时 ,两种结构共存 .两种结构的晶胞参数a ,c和晶胞体积V随着Er含量的增加都呈现递减的趋势 .随着Er含量的增加 ,(Nd1 xErx) 2 Co1 5 5V1 5化合物的居里温度和饱和磁化强度都单调下降 .(Nd1 xErx) 2 Co1 5 5V1 5化合物的室温各向异性由低Er含量时的易锥型转变为高Er含量时的易轴型 .x =0— 0 5的化合物在温度升高时发生自旋重取向转变 ,自旋重取向温度Tsr随Er含量的增加而减小     

Hydrothermal Synthesis and Characterization of a Novel Two-dimensional Framework Materials Constructed from Polyoxometalate and Coordination Groups: [H_2Mo_(5.5)V_(10.5)O_(40)(PO_4)][Cu(en)_2]_4·7H_2O

IntroductionPolyoxometalatesarewidelystudiedfortheirin terestingapplicationsincatalysis ,electronicconduc tivity ,magnetism ,nonlinearopticsandmedicine[1— 4 ] .Whilethemechanismofthesynthesisofpolyoxometalatesremainselusiveandisoftende scribedasself assembly ,thereseemstobeanincreas inguseofthecombinationofthehydrothermalmethodandthestructure directingtemplate .There searchwiththismethodhasdemonstratedthatanum beroftransitionmetaloxides ,typicallyreducedmolybdenumoxides ,mixedvalancevanadiumo…     

一种E1与V.35信号转换的实现方法

E1 是我国和欧洲电信传输网一次群使用的传输标准，V.35 是我国数字数据网使用较多的一种接口标准。本文给出由DS2155 和DS2175 等芯片实现E1 接口与V.35 接口转换的方法。     

Shape transition from InAs quantum dash to quantum dot on InP(3 1 1)A

We report on the shape transition from InAs quantum dashes to quantum dots (QDs) on lattice-matched GaInAsP on InP(3 1 1)A substrates. InAs quantum dashes develop during chemical-beam epitaxy of 3.2 monolayers InAs, which transform into round InAs QDs by introducing a growth interruption without arsenic flux after InAs deposition. The shape transition is solely attributed to surface properties, i.e., increase of the surface energy and symmetry under arsenic deficient conditions. The round QD shape is maintained during subsequent GaInAsP overgrowth because the reversed shape transition from dot to dash is kinetically hindered by the decreased ad-atom diffusion under arsenic flux.     

Photoelectron spectroscopic study of Li oxides on Li over-deposited V2O5 thin film surfaces

The Li oxides species formed on Li over-deposited V₂O₅ thin film surfaces have been studied by using X-ray and UV induced photoelectron spectroscopy (XPS and UPS). The photoelectron spectroscopic data show that the Li over-deposited V₂O₅ system itself is not stable. Further chemical decomposition reactions are taken place even under UHV conditions and lead to form Li₂O and Li₂O₂ compounds on the surface. The formation of Li₂O₂ causes to arise an emission line at about 11.3 eV in the valence band spectra.