P 型氮化镓层生长压力对InGaN/GaN基发光二极管性能的影响

The advantages of In Ga N/Ga N light emitting diodes(LEDs) with p-Ga N grown under high pressures are studied.It is shown that the high growth pressure could lead to better electronic properties of p-Ga N layers due to the eliminated compensation effect.The contact resistivity of p-Ga N layers are decreased due to the reduced donor-like defects on the p-Ga N surface.The leakage current is also reduced,which may be induced by the better filling of V-defects with p-Ga N layers grown under high pressures.The LED efficiency thus could be enhanced with high pressure grown p-Ga N layers.     

Surface properties of AlInGaN/GaN heterostructure

Surface structural, electronic and electrical properties of the quaternary alloy AlInGaN/GaN heterostructures are investigated. Surface termination, atomic arrangement, electronic and electrical properties of the (0001) surface and (10–11) V-defect facets have been experimentally analyzed using various surface sensitive techniques including spectroscopy and microscopy. Moreover, the effect of sub-band gap (of the barrier layer) illumination on contact potential difference (V_CPD) and the role of oxygen chemisorption have been studied.     

Microstructure of GaN grown by lateral confined epitaxy 2. GaN on patterned sapphire

Transmission electron microscopy (TEM), atomic force microscopy (AFM), and photoluminescence (PL) spectroscopy were used in order to study the microstructure and optical properties of GaN films grown by metal-organic chemical vapor deposition (MOCVD) on c-plane sapphire by lateral confined epitaxy (LCE). In this method, the substrate is etched prior to growth to form uniform mesas separated by trenches for laterally restricting growth area. As previously observed for LCE GaN on Si(111), the density of threading dislocations was significantly reduced in the areas close to the edge of mesas due to the lateral propagation of the dislocations. Hence, the overall material quality improves with decreasing mesa size, which is consistent with the observed increase in photoluminescence band edge peak intensity. Electron diffraction indicated ∼1° rotation about the [ ] axis between the mesa and trench material, which was also observed in the image contrast of these two regions with g= . Additionally, LCE samples prepared in [ ] and [ ] cross sections were used for comparing the growth rates in these two perpendicular directions. As theoretically expected, growth in the [ ] direction appears to proceed considerably faster than that in the [% MathType!MTEF!2!1!+-% feaafiart1ev1aaatCvAUfeBSjuyZL2yd9gzLbvyNv2CaerbuLwBLn% hiov2DGi1BTfMBaeXatLxBI9gBaerbd9wDYLwzYbItLDharqqtubsr% 4rNCHbGeaGqiVu0Je9qqqrpepC0xbbL8F4rqqrFfpeea0xe9Lq-Jc9% vqaqpepm0xbba9pwe9Q8fs0-yqaqpepae9pg0FirpepeKkFr0xfr-x% fr-xb9adbaqaaeGaciGaaiaabeqaamaabaabaaGcbaGaaGymaiaaig% daceaIYaGbaebacaaIWaaaaa!38D1!\[11\bar 20\]] direction.     

Structural and local electrical properties of AlInN/AlN/GaN heterostructures

GaN layers and Al_1−xIn_xN/AlN/GaN heterostructures have been studied by scanning probe microscopy methods. Threading dislocations (TDs), originating from the GaN (0 0 0 1) layer grown on sapphire, have been investigated. Using Current-Atomic Force Microscopy (C-AFM) TDs have been found to be highly conductive in both GaN and AlInN, while using semi-contact AFM (phase-imaging mode) indium segregation has been traced at TDs in AlInN/AlN/GaN heterostructures. It has been assessed that In segregation is responsible for high conductivity at dislocations in the examined heterostructures.     

Anomalous temperature-dependent photoluminescence peak energy in InAIN alloys

InA1N has been studied by means of temperature-dependent time-integrated photoluminescence and time-resolved photoluminescence. The variation of PL peak energy did not follow the behavior predicted by Varshni formula, and a faster redshift with increasing temperature was observed. We used a model that took account of the thermal activation and thermal transfer of localized excitons to describe and explain the observed behavior. A good fitting to the experiment result is obtained. We believe the anomalous temperature dependence of PL peak energy shift can be attributed to the temperature-dependent redistribution of localized excitons induced by thermal activation and thermal transfer in the strongly localized states. V-shaped defects are thought to be a major factor causing the strong localized states in our ln0.153Al0.847N sample.     

InAlN合金光致发光峰位能量随温度的异常变化

采用变温的时间积分和时间分辨光致发光方法来研究InAlN的光学性质,随着温度的升高,InAlN合金光致发光峰位能量随温度的变化不是遵循Varshni 公式所预期的变化,而是出现快速红移的现象。我们采用载流子的热激活和热转移模型来拟合了光致发光峰位能量随温度的变化,拟合结果和实验结果符合较好。我们认为峰位随温度的异常变化是由于载流子在深局域态之间的转移造成的,薄膜生长过程中产生的V型缺陷是造成In_0.153Al_0.847N薄膜中出现强局域态的主要原因。     

Microstructure of GaN deposited by lateral confined epitaxy on patterned Si (111)

Lateral confined epitaxy (LCE) is an epitaxial growth method on substrates patterned to form uniform mesas separated by trenches for laterally restricting growth area. In this work, plan view and cross-sectional transmission electron microscopy (TEM) were used in order to characterize the microstructure of GaN films grown by metal-organic chemical vapor deposition on patterned Si (111) using the LCE method. Two kinds of propagation modes of the dislocations were observed. The dislocations in the center of the mesa mainly propagate vertically to the surface. On the other hand, dislocations close (1–2 μm) to the mesa edges tend to bend laterally, allowing dislocation reactions that result in a lower dislocation density. This suggests that the overall material quality improves with decreasing mesa size, which is consistent with the observed increase in photoluminescence band edge peak intensity.     

Influence of Mg Doping on the Morphological, Optical, and Structural Properties of InGaN/GaN Multiple Quantum Wells

In this report, the influence of magnesium doping on the characteristics of InGaN/GaN multiple quantum wells (MQWs) was investigated by means of atomic force microscopy (AFM), photoluminescence (PL), and X-ray diffraction (XRD). Five-period InGaN/GaN MQWs with different magnesium doping levels were grown by metalorganic chemical vapor deposition. The AFM measurements indicated that magnesium doping led to a smoother surface morphology. The V-defect density was observed to decrease with increasing magnesium doping concentration from ∼10⁹ cm⁻² (no doping) to ∼10⁶ cm⁻² (Cp₂Mg: 0.04 sccm) and further to 0 (Cp₂ Mg: 0.2 sccm). The PL measurements showed that magnesium doping resulted in stronger emission, which can be attributed to the screening of the polarization-induced band bending. XRD revealed that magnesium doping had no measurable effect on the indium composition and growth rate of the MQWs. These results suggest that magnesium doping in MQWs might improve the optical properties of GaN photonic devices.     

MOCVD生长的InGaN/GaN薄膜组分和表面形貌研究（参加广西南宁固体薄膜会议论文）

摘要：本文利用MOCVD方法在（0001）取向的蓝宝石衬底上实现了不同生长温度条件下的InGaN薄膜的制备。通过改变生长温度实现了InGaN薄膜中In组分可控。通过XRD、SEM、AFM等测量手段研究了生长温度和组分、形貌、缺陷等性质的关系。对比SEM和AFM形貌图像提出并探讨了3种缺陷坑（大V型坑,In-rich坑和热腐蚀坑）模型以及形成机制。通过研究不同生长温度的InGaN薄膜样品,发现较高生长温度对InGaN薄膜形貌质量和缺陷控制有至关重要的作用。     

Surface morphology and composition studies in InGaN/GaN film grown by MOCVD

InGaN films were deposited on(0001) sapphire substrates with GaN buffer layers under different growth temperatures by metalorganic chemical vapor deposition.The In-composition of InGaN film was approximately controlled by changing the growth temperature.The connection between the growth temperature,In content,surface morphology and defect formation was obtained by X-ray diffraction,scanning electron microscopy(SEM) and atomic force microscopy(AFM).Meanwhile,by comparing the SEM and AFM surface morphology images,we proposed several models of three different defects and discussed the mechanism of formation.The prominent effect of higher growth temperature on the quality of the InGaN films and defect control were found by studying InGaN films at various growth temperatures.