Synthesis and characterization of Manganese doped Tungsten oxide by Microwave irradiation method

The aim of this article is to synthesis tungsten oxide (WO₃) nanoparticle along with Manganese (3 wt% and 10 wt%) by Microwave irradiation method. The physical properties of the synthesized Manganese doped Tungsten oxide materials were characterized by X-Ray Diffraction (XRD), Fourier Transform Infrared Spectroscopy (FTIR), Transmission Electron Microscope (TEM), UV-Diffuse Reflectance Spectroscopy, SEM-EDAX and Photoluminescence studies. The predominant peaks obtained in X-ray diffraction pattern reveal the crystalline nature of the nanoparticles and the structure belongs to Monoclinic for pure and Mn doped WO₃. FTIR analysis shows the presence of Tungsten and oxygen in the synthesis material and verified with EDAX. TEM analysis shows both pristine and Mn doped WO₃ nanopaticles. They are having spherical shaped morphology with average particle size from 35 to 40 nm. UV-DRS revealed that the bandgap energy for pure and Manganese doped WO₃ are discussed in this article. The Scanning Electron Microscope analysis shows the plate like morphology for pure WO₃ and the morphology were decreased by doping Manganese. The defects and oxygen deficiencies were analysed by photoluminescence spectroscopy.     

侵彻环境下两种钨合金的细观响应特性

本文实验发现具有较大密度和较高速度的93W钨合金长杆模拟弹的穿靶深度反而比密度较小，速度较低的90W钨合金长杆弹的穿靶深度小．针对这一现象，本文从两种材料在侵彻环境下的细观响应特性的差异上给出了有实验根据的合理分析，结论是90W在侵彻环境下较易于形成绝热剪切带，从而在弹头部发生“自锐化”效应所致．     

钨金属化与氧化铝陶瓷高温共烧

阐述了钨金属化与氧化铝陶瓷高温共烧工艺的特点,分析了烧结过程中温度曲线和露点等工艺参数对钨金属化与瓷件结合强度、密封气密性和收缩率的影响。通过反复的试验和烧结机理分析对比,给出了最佳的控制参数。     

STM/AFM studies of the evolution of morphology of electroplated Ni/W alloys

The surface morphology evolution of Ni/W alloys was studied, as a function of the alloy composition. Using the modified plating baths developed in our laboratory recently, electroplated Ni/W alloys with different W content, in the range of 7–67 atom percent (a/o), can be obtained. This was found to lead to different structures, ranging from polycrystalline fcc-Ni type structure to amorphous, followed by orthorhombic with increasing W content in the alloy. Powder XRD was studied to determine the crystal structures. Ex situ STM, AFM and SEM were used to study in detail the surface morphologies of the different alloys, and their evolution with increasing W content.

The important findings are that a mixture of two crystalline forms can give rise to an amorphous structure. Hillocks that are usually a characteristic of epitaxial growth can also exist in the amorphous alloys. Oriented scratches caused by stress can also be formed.

Up to 20 a/o of W is deposited in the alloys in crystalline form, with the fcc-Ni type structure. Between 20 and about 40 a/o an amorphous structure is observed, and above that an orthorhombic crystal structure is seen, which is characteristic of the NiW binary alloy. Careful choice of the composition of the plating bath allowed us to deposit an alloy containing 67 a/o W, which corresponds to the composition NiW₂.     

通用USB接口设备控制器的研究

简要介绍了USB技术的发展与现状；详细论述了USB系统的硬件结构；深入研究了USB系统的特点；探讨了USB系统目前仍在的问题。     

Low-resistance polysilicon process in contact application for high density devices

For the lowest resistance, it is required to have the epitaxial silicon contact between the silicon plug and the substrate and good step coverage at the high aspect-ratio contact holes, simultaneously. In this work, a double polysilicon (DPS) deposition technique was proposed for the requirements. The first, thin silicon layer is deposited in a single-wafer process chamber with an in-situ H₂-RTP (rapid thermal process) treatment for the epitaxial contact, and the second silicon layer is formed in a batch-type furnace for good step coverage. From chain resistance, Kelvin R_c, and current-voltage (I–V) measurement, the DPS process meets both low resistance and good uniformity, so that it suggests a breakthrough in the small-sized, semiconductor device application.     

Behavior of zirconium in the ZrOW(100) system at high temperature, studied by ISS, AES and work-function measurements

The behavior of zirconium atoms at the W(100) surface associated with oxygen adsorption at different sample temperatures has been studied by Auger electron spectroscopy (AES), ion scattering spectroscopy (ISS), and the relative change of the work function (Δф) measured by the onset of the secondary electron energy distribution. The results have revealed: (i) adsorption of zirconium onto the W(100) surface followed by the elevation of the sample temperature up to 1710 K in an oxygen partial pressure of 2.7 × 10⁻⁴ induces complete diffusion of zirconium atoms into the W(100) substrate; (ii) further exposure of oxygen induces co-existence of oxygen and tungsten on the surface at 1710 K, resulting in a work function of 4.37 eV; (iii) keeping the sample temperature at 1710 K, simple evacuation of the system has resulted in surface segregation of zirconium atoms to the surface to form a zirconium atomic layer on the top-most surface, reducing the work function to 2.7 eV. The results have revealed that this specific behavior of zirconium atoms at high temperature assures, with very good reproducibility, the highly stable performance and long service life of Zr---O/W(100)-emitters in practical use, even in a low vacuum of 10⁻⁶ Pa.     

WOx/TiO2光催化剂的可见光催化活性机理探讨

采用磁控溅射技术在用浸渍提拉法制得的TiO2薄膜上，溅射氧化钨层,通过气相反应中光催化降解二甲苯的实验表明，WOx/TiO2薄膜具有可见光活性.通过UV-Vis吸收光谱、X射线光电子能谱（XPS）等方法对其可见光活性的机理进行探索.UV-Vis吸收光谱表明WOx,TiO2对可见光响应的范围有一定的扩展,吸收强度增加.XPS表明WOx/TiO2薄膜表面形成了明显的W杂质能级和Ti缺陷能级,这是WOx/TiO2在可见光范围有一吸收的主要原因,也是光催化剂具有可见光活性的必要条件之一，同时杂质能级的存在使半导体费米能级上移,载流子增加,光催化效率提高.     

N-heterocyclic carbenes as ligands in high-valent molybdenum and tungsten complexes

Oxometal complexes of molybdenum and tungsten in high oxidation states from stable adducts with 1,3-dimethylimidazoline-2-ylidene (L) 1. The first ‘carbene’ complexes of molybdenum(VI) [MoO₂Cl(L)₃]Cl (3a) and tungsten(VI) WO₂Cl₂(L)₂ (4b) are reported.