In0.53Ga0.47As／InP异质结光电二极管的深能级

采用深能级瞬态谱仪（ＤＬＴＳ）测定了Ｉｎ０．５３Ｇａ０．４７Ａｓ／ＩｎＰ异质结光电二极管的ＤＬＴＳ谱。发现存在一电子陷阱，该陷阱能级位于导带底以下０．４４ｅＶ处，能级密度为３．１０×１０１３ｃｍ－３，电子俘获截面为１．７２×１０－１２ｃｍ－２。由于深能级的存在，导致了该器件存在一种新的“暗电流”──“深能级协助隧穿电流”。     

Surface-layer damage and responsivity in sputtered-ITO/p-GaN Schottky-barrier photodiodes

It is postulated that donor-like nitrogen vacancies, caused by the sputtering of a Schottky-barrier metal onto p-type gallium nitride, diffuse into the GaN and form a surface layer in which both the minority-carrier lifetime and mobility are drastically reduced. Such a damaged surface layer is shown to reduce the responsivity of p-GaN Schottky-barrier photodiodes, thereby offering an explanation for the responsivity values in the range of 0.03–0.04 A/W that have been measured in experimental ITO/p-GaN devices. On making allowance for the damaged surface layer, an electron diffusion length of around 300 nm can be inferred for the undamaged p-GaN region.     

Optical transmission through an interface between subwavelength slits

This paper studies optical transmission through an interface between two slits with different widths in a sheet composed of an ideal conductor. Such a structure is of potential use in fabricating optical diode and may be the simplest one compared to other designs. Our calculations show that there is a critical wavelength. When the light wavelength is below the critical wavelength, the transmissivity is unidirectional. The expression of the stable transmissivity as a function of the ratio of the widths of the two slits was obtained analytically. Particularly, at the critical wavelength, the transmissivities are zero. This phenomenon has great potential for application in the manufacture of wavelength blockers.     

InGaN/GaN MQD p–n junction photodiodes

The p–n junction photodiodes with InGaN/GaN MQD have been prepared by metal-organic chemical vapor deposition (MOCVD) growth; we achieved nanoscale InGaN self-assembled QDs in the well layers of the active region. The RT PL spectrum peak position for the fabricated InGaN/GaN MQD p–n Junction PDs is located at 464.6 nm and FWHM is 24.2 nm. After finishing device process, it was fond that the turn on voltage in forward bias and the break down voltage in reverse bias are about 3 and −13.5 V, respectively. Furthermore, with 1, 2, and 3 V applied bias, the maximum responsivity of the fabricated MQD p–n junction PD was observed at 350 nm, and the minimum of spectral response was measured at 465 nm. It was also found that the responsivity was nearly a constant from 390 to 440 nm. It seems to suggest that the spectral response in the range of 390–440 nm is due to the effect of the InGaN dots-in a-well active layers.     

Type-II InAs/GaSb superlattices for very long wavelength infrared detectors

Type-II superlattices (SLs) can be designed for semiconductor band gaps as large as 400 meV down to semimetallic. This flexibility in design makes them an excellent candidate for infrared photodiodes with cut-off wavelengths beyond 15 μm. There are relatively few options for high-performance infrared detectors to cover wavelengths longer than 15 μm, especially for operating temperatures above 15 K. In the past few years, excellent results have been obtained on photoconductive and photodiode samples designed for infrared detection in the very long wavelength infrared (VLWIR) range (λ>15 μm). There is a variety of possible designs for these SLs which will produce the same narrow band gap by adjusting individual layer thicknesses, or indium content, in the InGaSb layer. Several of these different design options have been grown and characterized. These designs often require monolayer control per layer over hundreds of repeats in the SL. Photoresponse spectra for type-II SLs are compared to show how the design choices not only change the band gap but also the band structure, as reflected in features observed in the spectra. Theoretical modeling results are used to interpret the photoresponse spectra. SLs with cut-off wavelengths ranging from 15 to 25 μm are covered.     

Two-color cross-correlation of fs-laser pulses by two-photon induced photoconductivity for near and far field optical measurements

Two-color two-photon induced photoconductivity in a GaAsP diffusion type photodiode is demonstrated by measuring femtosecond cross-correlation functions for widely separated wavelength pairs of 775 and 1300 nm. Results are obtained for a range of tunable wavelengths and average powers of the incident lasers by measuring the two-photon induced photocurrent as a function of the optical delay between the pulses. The temporal autocorrelation of femtosecond laser pulses in the near-field of a small diameter aluminum coated optical fiber tip is also obtained with the same photodiode method for single colors.     

Temperature,Current, and Voltage Dependences of Junction Failure in PIN Photodiodes

A PIN photodiode having a low dark current of 1.35 nA and a high external quantum efficiency of 95.3% fabricated for a passive optical network receiver. As the current was increased under a high voltage of 38 V and a temperature of 190°C, it was observed that there is a threshold current at 11 mA which induces a junction failure. Experimental data suggest that the junction failure occurs due to the crystal breaking at the end facet as a result of thermal heat or energetic carriers. This threshold behavior of junction failure is a valuable observation for the safe treatment of photodiodes. As long as the current is limited below the threshold currents, we have not observed failure events of our photodiodes.     

Diffusion length analysis and measurement in the base region of photodiodes

An experimental technique for determining the minority carrier diffusion length in the base region of SI photodiodes described. Optical arrangement has been suggested, in which the device was operated in the photoconductive mode and its photo-response in the wavelength region near the energy gap is measured. The ratio of incident light intensity to photocurrent is a linear function of reciprocal absorption coefficient the slope of which gives L_n. In addition, a nonlinear least-squares analysis is also used to determine the diffusion length. Furthermore, it has been found that L_n decreases as the absorbed dose of gamma rays increases.     

16元非晶硅荧光探测器的结构和工艺

研究一种新型的非晶硅ＰＩＮ异质结荧光探测器的结构和制备工艺，详细讨论了探测器单元的结构优化设计和暗电流和灵敏度等特性，实验表明，采用α－ＳｉＣ／α－Ｓｉ异质结构，提高沉积非晶硅基薄膜的本底真空度，优化制备工艺，可制备高信噪比的非晶硅荧光探测器。     

InGaAs/InGaAsP/InP SAGM-APD器件设计考虑及I_P—V曲线二级阶梯状扭折

本文根据雪崩电场和限制隧道电流电场要求出发,设计和估算了InGaAs/InGaAsP/InPSAGM-APD器件参数,测量并解释了I_p-V曲线的二级阶梯扭折行为,指出了V_(th)/V_B以1/3左右为宜和与实际测量的M_p比较吻合的经验公式。