Towards implementation of a nickel silicide process for CMOS technologies

In this paper, we review some of the advantages and disadvantages of nickel silicide as a material for the electrical contacts to the source, drain and gate of current and future CMOS devices. We first present some of the limitations imposed on the current cobalt silicide process because of the constant scaling, of the introduction of new substrate geometries (i.e. thin silicon on insulator) and of the modifications to the substrate material (i.e. SiGe). We then discuss the advantages of NiSi and for each of the CoSi₂ limitations, we point out why Ni is believed to be superior from the point of view of material properties, miscibility of phases and formation mechanisms. Discussion follows on the expected limitations of NiSi and some of the possible solutions to palliate these limitations.     

闪光照相条件下相对质量吸收系数的测量

 介绍了闪光照相中X光传播规律的等效单能模型。针对闪光照相出光重复性差、能谱测量困难的特点提出了相对质量吸收系数的概念。阐述了闪光照相中相对质量吸收系数的测量原理和方法。在闪光照相实验设备上采用整条D～L曲线对钨材料相对质量吸收系数进行了测量，得到的实验结果为1.23，与数值模拟结果1.26符合较好。     

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl₂-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH₄/H₂/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl₂ discharges is smooth, whereas that after etching in CH₄/H₂/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH₄/H₂/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH₄/H₂/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication.     

Condensation film on an inclined rotating disk

The three dimensional problem of steady fluid deposition on an inclined rotating disk is solved by similarity transform. For a given spraying rate there may be one, two or no steady state solution. The inclination causes a downward draining flow and a lateral flow. Perturbation solutions compare well with exact similarity solutions when the fluid film is thin.     

化学束外延

本文介绍了化学束外延(CBE)的发明和发展,论述了CBE的原理和设备。文中还介绍了最近提出的一种生长机理。     

ICP-AES测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量

采用电感耦合等离子体-原子发射光谱法同时测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量.以表征表面调整转化层厚度及钝化膜厚度,采用本方法准确度高、快速简便,经试验结果令人满意.     

Widely tunable long-period fiber grating with nm-thick higher refractive index film overlay

By introducing a four-layer step-index waveguide modeling, the characteristics of long-period fiber grating (LPFG) with an nm-thick film overlay, which has higher refractive index than that of fiber cladding are investigated in detail. The influence of both the overlay thickness and refractive index on the tuning ability of LPFG is analyzed. The numerical results demonstrate that spectral response of LPFG is divided into three distinct regions as the overlay deposition increases and the shift of resonant wavelength is drastic in some special thickness range. In conjunction with higher-order cladding mode coupling and fiber cladding etching, the sensitivity of LPFG to the overlay refractive index is enhanced significantly and over 120 nm resonant wavelength tunable range is achieved.     

The effect of microscopic features upon the transmissivity of enclosed laser ablated laminated metallised polymer films

A vacuum-deposited aluminium layer (20 nm) is sandwiched between two layers of laminated oriented polypropylene (OPP) film whose thickness varies from 20 to 40 μm. Selected areas of this sealed system were transparentised by the redistribution of the aluminium layer without breaking the seal or causing damage to the OPP film using a 75 W Q-switched Nd:YAG laser. The resultant transparentised films contain aluminium particles, distorted polymer areas and intact areas of the vacuum-coated aluminium layer. This paper investigates the effect of microscopic features upon the overall transmissivity of the laser-treated films and hence the quality of the transparentisation process.     

甲基红染料掺杂的聚乙烯醇薄膜光存储特性的实验研究

用2倍频小型YAG激光(532nm)作为写入光和擦除光,用He-Ne激光器623.8nm线作为读出光,用CCD作为探测器,研究了不同写入光功率下,甲基红/聚乙烯醇(MR/PVA)薄膜光栅生长的动力学过程和不同擦除光功率下,光栅擦除的动力学过程.结合光栅生长曲线的波动现象,对光存储机制进行了新的探讨.实验发现,两写入光和读出光的功率配比为1:1:1时,可获得最大衍射效率,提出读出光对写入过程具有双重作用的物理模型,对此实验结果给出了合理的解释.     

不锈钢丝网上薄膜TiO2光催化剂的Raman光谱研究

用Raman光谱方法来研究用Sol Gel法负载于金属丝网的薄膜TiO2 光催化剂的物相结构、厚度以及粒径大小。研究结果显示 ,薄膜达到一定厚度能够阻止基底Fe元素向薄膜表层的扩散 ;在 4 0 0℃下灼烧制得的薄膜TiO2 光催化剂具有锐钛矿晶型 ,而高于 4 0 0℃时 ,将出现金红石相TiO2 ;锐钛矿晶型TiO2 的Raman特征峰产生偏移 ,表明薄膜粒径的变化 ,通过计算表明 ,薄膜TiO2 的粒径为 10nm左右 ,TEM的分析结果也与之一致。