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XIAYou-xin PEIXian-deng HUANGHao XIEChang-sheng WANGHai-wei 《半导体光子学与技术》2003,9(2):123-127
The characteristic of near-field spots is analyzed.The size of the near field and the heat response time of the hybrid record medium to overcome super paramagnetic effect are calculated based on the heat transfer theory.A novel measuring method for the diameter of near-field recording spot is also presented.Since the grain of the recording media is tiny enough,near-field optical lithography can be accomplished with the aid of atomic force microscope(AFM).The diameter of near-field recording sopt can be obtained by specifically designed computer.So the relationship between the near-field recording spot diameter and the probe size of near-field recording system,the near field recording distance coupling between head and disc can be got. 相似文献
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厚膜电路的制造从丝网印刷开始,丝网印刷是厚膜电路制造的最初工序,它给后面的工序带来重要影响。由于印刷不良而引起的缺陷都是在电路制成后才被发现的,所以丝网印刷 相似文献
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The growing interest in the use of Gallium Arsenids semiconductor materials has presented many opportunities for device operational speed improvements but has also presented many problems for the device maker,A novel deep-submicron x-ray lithography process for T-shaped gate patterns useful for high-electron-mobility transistors(HEMT) is introduced in this work.In the fabrication of T-shaped gate a therr layer resists method is used.The x-ray exposure experiments were finished by Beijing Synchrotron Radiation Facility(BSRF) 3B1A beamline,and good result has been obtained. 相似文献
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结合微接触印刷术和TiO2沉积成膜技术,在单晶硅表面成功地制备了具有微米级图案结构的TiO2薄膜,并利用XPS,SEM和AFM对其表面性质和结构进行了表征.该硅基图案化TiO2微结构在光电转化、微机电和光催化等领域中的应用具有重要意义. 相似文献
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光电印制板的制造和特征 总被引:1,自引:1,他引:0
概述了光电印制板(O/EPCB)的制造和特征,它具有三维3D光学互连用的埋入多模步长指数(MM-SI)波导和集成不同平面微镜(IMM)。利用UV平面印刷术在PCB上积层光电路,利用倾斜曝光制造45°输入/输出I/O耦合元件。 相似文献