Human-to-metal electrostatic discharge current measurements – Notes on the ESD current waveform

The Electrostatic Discharge (ESD) phenomenon has been described through the IEC 61000-4-2. ESD current parameters' values, have been set in this Standard. The theoretical ESD current waveform defined in this standard, describing the conventional Contact discharge mode, needs to be re-evaluated on the basis of accurate experimental data. Even though the standard deals with commercial ESD generators, its goal is to simulate the natural phenomenon as good as possible. More and accurate data may contribute to the better simulation of the natural phenomenon. New values and better comprehension of the phenomenon demand new measurements based on high end measuring equipment. Such works and publications have been carried out the past years. Yet, the need to systematize and integrate this work remains. Larger and trust-worthy series of measurements need to be carried out and presented clearly.This paper deals with new ESD-current data, taken with broadband equipment. New and more detailed measurements like these, were never before taken at such a large number of individuals. The goal of this work is that the data acquired can serve as a basis for re-evaluating the conventional approach of the scientific community to the ESD event.In this paper, using a broadband measuring system, new parameters' values are measured and relations are presented, following standard statistical procedures. The results, which occur from measurements carried out on tenths of human individuals, are questioning the Standard in many points. A new way of approaching the standardization of the ESD current is proposed, as the excuse of the poor measuring equipment that sets barriers on the measuring accuracy, does not apply any more. The charging voltages of 500 V and 1000 V were also examined since such range of voltages are often met at ESD events and they are considered very harmful.     

原位液相透射电子显微镜及其在 纳米粒子表征方面的应用

近年来,基于透射电子显微技术、微纳加工技术和薄膜制造技术的发展,原位液相透射电子显微技术产生,为构建多种纳米级分辨率尺度下的微实验平台,发展新型纳米表征技术和众多领域的相关研究提供了途径.本文首先介绍了应用于原位液相透射电子显微技术的液体腔设计要求,然后介绍了液体腔的发展和典型的制备工艺,最后综述了近年来液体腔透射电子显微镜在纳米粒子成核和生长方面的应用研究,并探讨了该技术前沿发展面临的机遇和挑战.本文将为提高我国先进纳米表征技术和原子精准构筑技术提供相关讨论和支持.     

用等厚干涉测定液体折射率

介绍一种采用等厚干涉原理测定液体折射率的简单可靠的方法。     

计算全息检测非球面干涉场的理论分析与实验结果

本文应用光学全息术及傅里叶光学的理论对计算全息图干涉检测非球面面形的光路及干涉场进行了理论分析,提出了其干涉场为不定域干涉的观点,并在实验中予以证实.     

Scanning tunnelling microscope studies of growth of RuO2（110） thin layer on Ru（0001）

This paper reports that the growth of RuO_x(110) thin layer growth on Ru(0001) has been investigated by means of scanning tunnelling microscope (STM). The STM images showed a domain structure with three rotational domains of RuO_x(110) rotated by an angle of 120℃. The as-grown RuO_x(110) thin layer is expanded from the bulk-truncated RuO_x(110) due to the large mismatch between RuO_x(110) and the Ru(0001) substrate. The results also indicate that growth of RuO_x(110) thin layer on the Ru(0001) substrate by oxidation tends first to formation of the Ru-O (oxygen) chains in the [001] direction of RuO_x(110).     

迈克尔逊干涉仪中补偿板与干涉条纹

通过分析缺失补偿板的迈克尔逊干涉仪中的附加光程差,推出干涉条纹满足的方程式,并用计算机模拟了动镜移动过程中变化的干涉条纹,与实验结果相一致.     

激光二极管反馈干涉的实验观测

利用LabView软件虚拟示波器和信号源,观测了激光二极管反馈干涉实验现象．实验证明反馈回激光二极管的光的入射方向和入射光强以及信号处理电路的带宽,对反馈干涉信号有很大的影响．     

Experimental observation of quantum corrections to electrical resistivity in nanocrystalline soft magnetic alloys

X-ray diffraction patterns of nanocrystalline Fe-Cu-Nb-Si-B (FINEMET) alloys reveal that bcc α-Fe/α-FeSi crystallites with the average grain size of 20(5) nm are dispersed in amorphous matrix. Enhanced electron—electron interaction (EEI) and quantum interference (QI) effects as well as electron-magnon (and/or electron-spin fluctuation) scattering turn out to be the main mechanisms that govern the temperature dependence of resistivity. Of all the inelastic scattering processes, inelastic electron-phonon scattering is the most effective mechanism to destroy phase coherence of electron wave functions. The diffusion constant, density of states at the Fermi level and the inelastic scattering time have been estimated, for the first time, for the alloys in question Article presented at the International Symposium on Advances in Superconductivity and Magnetism: Materials, Mechanisms and Devices, ASMM2D-2001, 25–28 September 2001, Mangalore, India.     

Laser-induced damage of Ta2O5/SiO2 narrow-band interference filters under different 1064 nm Nd:YAG laser modes

The laser-induced damage (LID) behavior of narrow-band interference filters was investigated with a Nd:YAG laser at 1064 nm under single-pulse mode and free-running mode. The absorption measurement of such coatings was performed with surface thermal lensing (STL) technique. The damage morphologies under the two different laser modes were also studied in detail. It was found that all the filters exhibited a pass-band-center-dependent absorption and laser-induced damage threshold (LIDT) behavior, but the damage morphologies were diverse. The explanation was given with the analysis of the electric field distribution and the operational behavior of the irradiation laser.     

半导体激光自混频干涉式传感器中的干涉与调制

应用F-P模型，阐述了半导体激光自混频干涉式传感器的干涉与调制过程，同时给出了相应的计算．