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T. Ohishi S. Maekawa T. Ishikawa D. Kamoto 《Journal of Sol-Gel Science and Technology》1997,8(1-3):511-515
A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered
films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce
heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels. 相似文献
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M.?KursaweEmail author R.?Anselmann V.?Hilarius G.?Pfaff 《Journal of Sol-Gel Science and Technology》2005,33(1):71-74
Nano-sized materials produced by wet chemical processing have a wide range of industrial applications. For example, a solution of monodisperse SiO2-particles for single-layer anti-reflection coating on glass was developed. Although being porous, the anti-reflection coating shows excellent mechanical stability which is sufficient for commercial applications. The coating sol is used to produce cover glass with high transmission for solar energy systems, e.g. photovoltaic modules.Nano-sized materials made by sol–gel processes are not limited to niche applications. Inorganic metal oxide coatings on thin mica platelets are the basis for pearl lustre pigments. The inorganic layers, consisting of titanium dioxide or iron oxides, are obtained by a wet chemical procedure. The well-defined layer thickness, varying from 50 to 300 nm, determines the optical properties of the pearlescent pigment. By using synthetic SiO2 platelets instead of natural mica, impressive angle-dependant colour effects can be achieved. Synthetic SiO2 platelets are also produced by a sol–gel coating technique.Special spherical silica particles made by a wet chemical processing are used in cosmetic applications. The size distribution determines the skin feeling of the formulation. In addition, specific colour or anti-wrinkle effects can be achieved. 相似文献
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N.?YamaguchiEmail author K.?Tadanaga A.?Matsuda T.?Minami M.?Tatsumisago 《Journal of Sol-Gel Science and Technology》2005,33(1):117-120
Anti-reflective (AR) properties of flowerlike alumina thin films with a small roughness of less than 100 nm have been studied on substrates such as soda-lime silica glass, non-alkali glass, and quartz glass. The highest AR effects were obtained on quartz glass substrate, which has the lowest refractive index of the three substrates. The reflectance of quartz glass substrates coated with flowerlike Al2O3 was less than 0.5% in the wavelength region from 300 to 720 nm. 相似文献
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采用原子层沉积技术在熔石英和BK7玻璃基片上镀制了TiO2/Al2O3薄膜,沉积温度分别为110℃和280℃。利用X射线粉末衍射仪对膜层微观结构进行了分析研究,并在激光损伤平台上进行了抗激光损伤阈值测量。采用Nomarski微分干涉差显微镜和原子力显微镜对激光损伤后的形貌进行了观察分析。结果表明,采用原子层沉积技术镀制的TiO2/Al2O3增透膜的厚度均匀性较好,Φ50 mm样品的膜层厚度均匀性优于99%;光谱增透效果显著,在1 064 nm处的透过率〉99.8%;在熔石英和BK7基片上,TiO2/Al2O3薄膜在110℃时的激光损伤阈值分别为(6.73±0.47)J/cm2和(6.5±0.46)J/cm2,明显高于在280℃时的损伤阈值。 相似文献
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In this paper we report on a high-contrast top-emitting organic light-emitting device utilizing a moderate-reflection contrast-enhancement stack and a high refractive index anti-reflection layer.The contrast-enhancement stack consists of a thin metal anode layer,a dielectric bilayer,and a thick metal underlayer.The resulting device,with the optimized contrast-enhancement stack thicknesses of Ni(30 nm)/MgF 2(62 nm)/ZnS(16 nm)/Ni(20 nm) and the 25-nm-thick ZnS anti-reflection layer,achieves a luminous reflectance of 4.01% in the visible region and a maximum current efficiency of 0.99 cd/A(at 62.3 mA/cm 2) together with a very stable chromaticity.The contrast ratio reaches 561:1 at an on-state brightness of 1000 cd/m 2 under an ambient illumination of 140 lx.In addition,the anti-reflection layer can also enhance the transmissivity of the cathode and improve light out-coupling by the effective restraint of microcavity effects. 相似文献
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对光刻胶内光强分布进行了计算与模拟, 结果表明, 来自基底的反射光与入射光干涉, 光强在垂直基底的方向上呈现强弱周期性变化, 即驻波效应. 进一步的分析与实验结果表明, 随着基底反射率的增加, 驻波效应变得严重, 进而影响光栅掩模的槽形、占宽比并限制线条高度. 为减弱驻波效应的影响, 尝试了使用减反射膜降低基底反射光强度, 实验结果表明, 在基底与光刻胶之间增加一层减反射膜吸收来自基底的反射光强度, 减弱驻波效应的效果显著.
关键词:
全息光刻
驻波
减反射膜 相似文献
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采用脉冲激光沉积(PLD)方法在湿法腐蚀后的Si(100)衬底上制备了Y2O3:Bi,Yb减反转光薄膜。所制备的薄膜在300~800 nm波长范围内的平均反射率最低至5.28%,同时在晶体硅太阳能电池最佳响应范围内的980 nm附近表现出了良好的下转光特性。与非减反下转光薄膜相比较,具有减反结构的Y2O3:Bi,Yb下转换薄膜的转光强度有了明显的提升。随着衬底腐蚀时间在一定范围内的延长,Bi3+和Yb3+的发射峰强度线性增大。该减反转光薄膜为太阳能电池效率提高提供了一种简单可行的方法。 相似文献