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排序方式: 共有343条查询结果,搜索用时 15 毫秒
1.
氪灯、氙灯光谱强度分布和光谱效率测量是反映氪灯、氙灯性能的关键指标。介绍了一套新型的氪灯、氙灯光谱强度分布和光谱效率检测系统。该系统是一套测量连续发光灯和脉冲闪光灯发光性能及效果的综合检测设备。该检测单元采用计算机进行操控,人机界面良好,便于检验人员进行氪灯和氙灯光谱强度分布和光谱效率的批量检测。检验人员利用该系统可进行装机模拟试验和可靠性试验,可对氪灯和氙灯的性能进行必要的分析研究,不断地积累了氪灯和氙灯的检验数据和经验。 相似文献
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空心阴极灯激发的微波等离子体炬原子/离子荧光光谱研究--钙的原子/离子荧光光谱 总被引:2,自引:0,他引:2
用强短脉冲供电技术的空心阴极灯作激发源、微波等离子体炬作原子/离子化器,建立了原子/离子荧光光谱实验装置。详细研究了微波等离子体功率、观察高度、空心阴极灯电流等因素对原子/离子荧光信号强度的影响,测量了系统对Ca的原子/离子荧光光谱的检出限。 相似文献
3.
Zhengmao Zhu 《Applied Surface Science》2005,252(2):303-310
The reactivity of the surface of poly(ethylene terephthalate) (PET) film under 172 nm UV irradiation (xenon excimer lamp) towards nitrogen-borne 1-octene, n-nonane and heptafluorodecene vapor was investigated. Materials receiving from 0 to 24 J/cm2 of UV were examined by X-ray photoelectron spectroscopy (XPS), time of flight secondary ion mass spectroscopy (ToF/SIMS), water and mineral oil contact angle measurement and atomic force microscopy (AFM). A uniform nanoscale layer developed on PET surface attributed to the grafting reaction between photolytically-produced polymer radicals and vapor phase molecules. 相似文献
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几种常见光源特性的研究 总被引:2,自引:1,他引:1
本通过大学物理实验中常用光源特性的分析,说明了实验中光源使用的合理性。 相似文献
6.
In photochemical vapor deposition of aluminum film on silicon using dimethylaluminum hydride, (CH3)2AlH, a surface reaction dominated below a (CH3)2AlH pressure of 0.3 m Torr at 200°C, which was induced only with the 160 nm band emitted from a deuterium lamp. A gas-phase reaction occurred above 0.3 mTorr at 200°C, which could be induced by both 160 nm and 240 nm emission bands from the lamp. To distinguish between surface ad gas-phase reactions, a thickness profile was used. At 240°C the surface reaction could be induced even by the 240 nm band, while the deposits formed under illumination of the two bands were thinner than those obtained with only the 240 nm band, indicating occurrence of vacuum ultraviolet (VUV)-enhanced desorption. The mechanism responsible for the observed wavelength dependence in unclear. The electrical resistivity of the films deposited at 200°C was 4.5 μΩ cm, which did not change with wavelength. 相似文献
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Konrad Seppelt 《无机化学与普通化学杂志》2003,629(14):2427-2430
Long after the first isolation of a xenon compound in 1962 the first compounds with metal‐xenon bonds are prepared. The metal atoms are so far Au and Hg. The most stable metal xenon compounds decompose under loss of xenon slightly above room temperature. They can only exist if solvents and counter ions are weaker bases than atomic xenon. Solvents and counter ions used so far are HF, (SbF6)—, and (Sb2F11)—. 相似文献
10.
Previously unknown polyfluorocyclohexenyl, and acyclic perfluoroalkenyliodine tetrafluorides were prepared in high yields. Perfluorocyclohex-1-enyliodine tetrafluoride was obtained from pentafluoroiodobenzene using XeF2-NbF5 in aHF. The reaction of C6F5I with the weaker fluorooxidant XeF2-BF3 in 1,1,1,3,3-pentafluorobutane (PFB) yielded C6F5IF2, perfluorocyclohexa-1,4-dienyliodine difluoride, C6F5IF4, perfluorocyclohexa-1,4, and 1,3-dienyliodine tetrafluoride as intermediate products on parallel reaction routes. Both perfluoroalkenyl iodides, cis- and trans-(CF3)2CFCFCFI, reacted with XeF2-BF3 in PFB to give the corresponding perfluoroalkenyliodine tetrafluorides, cis- and trans-(CF3)2CFCFCFIF4. Even perfluoroalkyl iodides can be fluorinated by this reagent as was demonstrated by the preparation of C6F13IF4 from C6F13I. Generally, the CFCIFn fragment (n = 0, 2, or 4) in cyclic or acyclic perfluoroalkenyliodine compounds RFIFn did not undergo a transformation to the corresponding perfluoroalkyliodine compound. Furthermore, no perfluoroorganoiodine hexafluorides were detected in reactions with the fluorooxidant XeF2-aHF or BF3 or NbF5. 相似文献