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金刚石线锯切割多晶硅片表面特性与酸刻蚀制绒问题   总被引:3,自引:1,他引:2  
刘小梅  李妙  陈文浩  周浪 《光子学报》2014,43(8):816001
为解决金刚石切割多晶硅片与常规HF-HNO3-H2O混合酸湿法制绒技术不兼容的问题,对金刚石切割多晶硅片的表面特性和大幅度提高混合酸溶液中HF的比例进行了刻蚀制绒实验.结果表明,金刚石线切割多晶硅片表面存在约33%的光滑条带区域,其余为与砂浆切割硅片表面相近的粗糙崩坑区域;这些光滑区域使得金刚石切割多晶硅片表面光反射率比砂浆切割多晶硅片高3%~4%;而且光滑区域在富HNO3和富HF的HF-HNO3-H2O混合酸溶液中均较难于腐蚀,使其刻蚀制绒后反射率比砂浆切割多晶硅片低1%~2%,制绒后的金刚石切割多晶硅片反射率比制绒后的砂浆切割多晶硅片高4%~6%,不能满足太阳电池生产要求.富HNO3和富HF两种酸刻蚀体系,均不能解决金刚石切割多晶硅片的制绒问题.  相似文献   
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刘小梅  陈文浩  李妙  周浪 《光子学报》2015,44(1):116002-0116002
采用气相刻蚀制绒法研究金刚石线锯切割多晶硅片制绒.加热体积比1∶3、总体积400 mL的HF-HNO3酸混合溶液到90℃,使酸混合溶液受热产生气相,利用气相对金刚石线锯切割多晶硅片表面进行制绒.结果表明,制绒15 min之后,硅片表面的切割纹被完全去除;小腐蚀坑密布硅片表面,尺寸小于1μm,而传统湿法酸制绒所形成的腐蚀坑尺寸大于10μm.气相刻蚀后的金刚石线锯切割多晶硅片表面的微观粗糙度比传统酸混液制绒后的金刚石线锯切割多晶硅片表面的微观粗糙度高3倍多.气相制绒效果明显,并仅有12.11%的低反射率.  相似文献   
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Results of the studies of optical properties of anti-reflective glasses with various texturization patterns, which were used as a coating for crystalline silicon solar cells, are presented. It was found that glass samples sorted by their optical transmittance demonstrated the same order as when sorted by their solar-cell short-circuit current enhancement parameter. The value of the latter depended on the parameters of texturization, such as the surface density of inclusions and their profile, and the depth of etching pits. A 2% relative increase of the solar cell efficiency was obtained for the best glass sample for null degree angle of incidence, proving enhanced light trapping properties of the studied glass.  相似文献   
4.
Reflectivity of porous-pyramids structured silicon surface   总被引:1,自引:0,他引:1  
The antireflection of porous-pyramids structured silicon surface has been studied. The porous surface is formed by stain etching in HF/Fe(NO3)3 aqueous solution after textured in KOH/IPA solution. Reflectivity measurements show an overall reflectance of 4.2% for porous-pyramids textured silicon surface in the range from 400 to 900 nm. An optimal etching time of 30 min is obtained when both reflectivity and photo-generated carriers lifetime are considered. This technique may be probably used in the texturization process for high-efficiency silicon solar cells.  相似文献   
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