Design of Millimeter Wave TFMS Bandpass Filter

In this paper, a Ka-band thin film microstrip line(TFMS) filter with multi-layer structure on silicon substrate is introduced. The simulated results show that it is possible to design compact millimeter-wave filter on silicon substrate with process compatible to current VLSI technology.     

A 28GHz CMOS FREQUENCY DOUBLER WITH TFMS

In this paper, a 28GHz CMOS frequency doubler with TFMS (thin film microstrip line) has been introduced in order to experimentally study the possibility of millimeter wave CMOS devices based on TFMS. The present doubler shows 2dB conversion loss and approximately 12dB suppression to fundamental frequency. The result shows that the CMOS technology compatible TFMS are promising on the design of millimeter-wave CMOS devices.     

Fluoropolymer materials and architectures prepared by controlled radical polymerizations

This review initially summarizes the mechanisms, merits and limitations of the three controlled radical polymerizations: nitroxide mediated polymerization (NMP), atom transfer radical polymerization (ATRP) or metal catalyzed living radical polymerization, and reversible addition-fragmentation chain transfer (RAFT) polymerization. This is followed by two parts, one dealing with homo- and copolymerizations of fluorinated methacrylates and acrylates, and a second where fluorinated styrenes, alone or in combination with other monomers, are the main issues. In these parts, initiators (including multifunctional and macroinitiators), ligands and other reaction conditions as well as some kinetics and conversions are discussed. Numerous possibilities for preparation of a variety of different block copolymers where one or more blocks are fluorinated are devoted particular attention. The advantageous properties and functionalities that can be obtained from these novel fluorinated materials and architectures are especially emphasized. Thus, various amphiphilic, biocompatible or low energy materials, fluorinated nanoparticles and nanoporous films/membranes as well as materials for submicron and nanolevel electronics have been fabricated. In addition, the possible fluorination of various surfaces through surface initiation is highlighted. A final part deals with the use of fluorine containing initiators and macroinitiators, and the applications on the novel materials derived thereof.