Surface antiferromagnetic domain structures of NiO (0 0 1) studied using UV photoemission electron microscope

Direct observation of the antiferro (AF) magnetic domain structures of a NiO (0 0 1) surface is found to be possible using a spectroscopy photoelectron low-energy electron microscope (SPELEEM) and a commercial UV Hg excitation light source without using any polarizers. The principle is based on the magnetic linear dichroism (MLD) effect, where different domain contrasts are produced according to the relative angle between the antiferromagnetic axis and the linearly polarized light. The observed AF magnetic domain structures are strongly affected by both bulk AF magnetic domain structures and the stresses induced during the sample cleaving process. Moreover, the AF magnetic domain structures are found to be irreversible when the sample is heated to over its Néel temperature and then cooled. The possibility of imaging AF magnetic domain structures without using synchrotron radiation or a polarizer is attractive.     

Energy-filtered XPEEM with NanoESCA using synchrotron and laboratory X-ray sources: Principles and first demonstrated results

The importance of energy filtering in PEEM-based imaging methods has been shown in recent years with the availability of powerful instruments. A new instrument, the NanoESCA, combines a fully electrostatic PEEM column and an aberration corrected double hemispherical analyser as energy filter. This paper reports on recently demonstrated XPEEM results using the first commercially available NanoESCA instrument operated with both synchrotron soft X-rays and monochromatic laboratory Al Kα radiation. The implementation of elemental and bonding-state specific imaging is shown with both excitation sources. The presently achieved (but not yet ultimate) lateral resolutions on energy filtered core-level images are 150 nm with a large synchrotron spot and below 1 μm with a focused laboratory source. To date this is the unique example of laboratory XPEEM core-level imaging.     

Initial oxidation of Ni(1 1 1) observed by electron emission microscopy: PEEM and MEEM

The initial oxidation of Ni(1 1 1) in the temperature range of 550-700 K has been monitored by photoelectron emission microscopy (PEEM) and metastable-atom electron emission microscopy (MEEM). The PEEM and MEEM images show uniform patterns for the chemisorbed overlayer, reflecting the electronic homogeneity as seen at the μm scale. During the nucleation and lateral growth of oxide, however, the μm-scale pattern due to the formation of oxide domains appears and its evolution depends strongly on the substrate temperature and dose pressure of gaseous O₂. Our data indicate that the high-temperature oxidation is regarded as a successive multi-nucleation process in a reaction-diffusion field.     

High-precision sample stage for photoemission microscopy of organic films

A high-precision sample stage for photoemission microscopy has been constructed to translate the sample by ±3 mm with accuracy better than 100 nm. The stage is actuated by step motors settled outside the vacuum. The accuracies of the translations were measured by observing a standard patterned sample with a photoemission electron microscope (PEEM) of 50 nm resolution. The accuracy was nearly independent of the distance of each translation step and the error was not accumulated by repeated steps. After round-trip translations up to 0.2 mm, the sample came back to the original position with accuracy of ±50 nm. The performance of the stage was demonstrated by observing growth processes of lead phthalocyanine (PbPc) films formed on graphite.     

Ag induced restructuring of the oxygen precovered Cu(1 1 0) surface

The interplay between chemisorbed oxygen and deposited Ag on the Cu(1 1 0) surface has been studied by scanning tunneling microscopy (STM) and photoelectron emission microscopy (PEEM). The Cu-CuO stripe phase formed on the clean Cu(1 1 0) surface upon oxygen chemisorption at 660 K is partly dissolved by Ag deposition at 300 K. Upon annealing, however, a phase separation is observed, where the Cu-O compounds agglomerate into large CuO islands and the Ag is located in between. Also a strong preference for the Ag to attach to step bunches is observed. Especially on the fully (2×1)O reconstructed Cu(1 1 0) surface, all the deposited Ag is found at the step bunches giving rise to a contrast in PEEM.     

A brief history of PEEM

The evolution of cathode lens-based photo emission electron microscopy (PEEM) from the simple beginnings in the early 1930s to its sophisticated present state is discussed. In addition to conventional ultraviolet light-excited PEEM (UV-PEEM), laser excited PEEM and the various modes of synchrotron X-ray-excited PEEM (XPEEM) particular emphasis is placed on the complementary combination of these methods with low energy electron microscopy (LEEM).     

Thickness dependence of magnetic domain formation in La0.6Sr0.4MnO3 epitaxial thin films studied by XMCD-PEEM

We have used photoelectron emission microscopy (PEEM) and X-ray magnetic circular dichroism (XMCD) to study the effect of thin film thickness on the magnetic domain formation in La_0.6Sr_0.4MnO₃ samples that were epitaxially grown on stepped SrTiO₃ (0 0 1) substrates. The magnetic image exhibited a stripe structure elongated along the step direction, irrespective of film thickness, suggesting that uniaxial magnetic anisotropy induced by step-and-terrace structures plays an important role in the magnetic domain formation. Additional domains evolved gradually with increasing film thickness. In these domains, the direction of magnetization differed from the step direction due to biaxial magneto-crystalline anisotropy. The evolution of additional magnetic domains with increasing film thickness implies that a competition exists between the two anisotropies in LSMO films.     

Synchrotron PEEM and ToF‐SIMS study of oxidized heterogeneous pentlandite,pyrrhotite and chalcopyrite

Synchrotron‐based photoemission electron microscopy (PEEM; probing the surface region) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS; probing the uppermost surface layer) have been used to image naturally heterogeneous samples containing chalcopyrite (CuFeS₂), pentlandite [(Ni,Fe)₉S₈] and monoclinic pyrrhotite (Fe₇S₈) both freshly polished and exposed to pH 9 KOH for 30 min. PEEM images constructed from the metal L₃ absorption edges were acquired for the freshly prepared and solution‐exposed mineral samples. These images were also used to produce near‐edge X‐ray absorption fine‐structure spectra from regions of the images, allowing the chemistry of the surface of each mineral to be interrogated, and the effect of solution exposure on the mineral surface chemistry to be determined. The PEEM results indicate that the iron in the monoclinic pyrrhotite oxidized preferentially and extensively, while the iron in the chalcopyrite and pentlandite underwent only mild oxidation. The ToF‐SIMS data gave a clearer picture of the changes happening in the uppermost surface layer, with oxidation products being observed on all three minerals, and significant polysulfide formation and copper activation being detected for pyrrhotite.     

Microscopic observation of lateral diffusion at Si-SiO2 interface by photoelectron emission microscopy using synchrotron radiation

The lateral surface diffusion at Si-SiO₂ interface has been observed at nanometer scale using photoelectron emission microscopy (PEEM) combined with synchrotron soft X-ray excitation. The samples investigated were Si-SiO_x micro-patterns prepared by O₂⁺ ion implantation in Si (0 0 1) wafer using a mask. The lateral spacial resolution of the PEEM system was about 41 nm. The brightness of each spot in the PEEM images changed depending on the photon energy around the Si K-edge, in proportion to the X-ray absorption intensity of the corresponding valence states. It was found that the lateral diffusion occurs by 400-450 °C lower temperature than that reported for the longitudinal diffusion at the Si-SiO₂ interface. It was also found that no intermediate valence states such as SiO (Si²⁺) exist at the Si-SiO₂ interface during the diffusion. The observed differences between lateral and longitudinal diffusion are interpreted by the sublimated property of silicon monoxide (SiO).