Synthesis and Structure of Ba[ZrN2] and Ba2[NbN3]

Ba₃N₂ reacts at 950°C under pure N₂ with Zr to yield dark red, air-sensitive Ba[ZrN₂]. This new compound crystallizes in the tetragonal space group P4/nmm with a = 416.10(2), c = 839.2(1) pm and Z = 2. The crystal structure was solved and refined using X-ray and neutron powder diffraction data. In the nitrido zirconate [ZrN₂]^2? the Zr atoms exhibit a square-pyramidal coordination by five N atoms at distances of 201(3) and 220.2(2) pm. The pyramids share all the edges in the basal plane to form layers parallel to (001) with their apices alternately pointing up and down. The Ba²⁺ cations are integrated into these layers at the levels of the pyramidal apices. The structure can be interpreted as a stuffed PbFCl type. Ba₂[NbN₃] is formed by the reaction of Ba₃N₂ and NbN or of Ba and Nb at 1 000°C under N₂. Isostructural to Ba₂[TaN₃] it crystallizes in the monoclinic space group C2/c with a = 613.2(3), b = 1 176.8(3), c = 1 322.9(4) pm, β = 91.65(2)°, Z = 8. The nitrido niobate anions form chains of corner sharing NbN₄ tetrahedra with distances Nb? N between 188(1) and 199.9(9) pm.     

Structural,morphological and mechanical properties of niobium nitride thin films grown by ion and electron beams emanated from plasma

The influence of variation in plasma deposition parameters on the structural, morphological and mechanical characteristics of the niobium nitride films grown by plasma-emanated ion and electron beams are investigated. Crystallographic investigation made by X-ray diffractometer shows that the film synthesized at 10?cm axial distance with 15 plasma focus shots (PFS) exhibits better crystallinity when compared to the other deposition conditions. Morphological analysis made by scanning electron microscope reveals a definite granular pattern composed of homogeneously distributed nano-spheroids grown as clustered particles for the film synthesized at 10?cm axial distance for 15 PFS. Roughness analysis demonstrates higher rms roughness for the films synthesized at shorter axial distance and by greater number of PFS. Maximum niobium atomic percentage (35.8) and maximum average hardness (19.4?±?0.4?GPa) characterized by energy-dispersive spectroscopy and nano-hardness analyzer respectively are observed for film synthesized at 10?cm axial distance with 15 PFS.     

MgO和Si上NbN超薄薄膜的生长研究

我们在单晶MgO(100)、Si(100)和SiOx/Si基片上成功生长了纳米厚度的超薄NbN薄膜,利用现代分析手段:X射线衍射(XRD)、透射电子显微镜(TEM)、原子力显微镜(AFM)等技术分析研究了所制备的超薄NbN薄膜的微观结构、厚度、表面界面情况等物理特性。研究表明,在MgO(100)基片上获得了外延生长的单晶NbN超薄薄膜,在Si(100)和SiOx/Si基片上获得的是多晶NbN超薄薄膜。厚度均约6nm左右。这些超薄薄膜的超导转变温度分别为:MgO上薄膜是14.46K,Si和SiOx上薄膜分别是8.74K和9.01K.     

MgO衬底NbN/AlN/NbN多层膜的制备

本文主要讨论磁控溅射设备制备的NbN/AlN/NbN三层结构的技术工艺,为制备All-NbN的 NbN/AlN/NbN SIS 隧道结作准备.我们在室温下利用直流磁控溅射工艺制备了单晶NbN薄膜,并对其超导电性做了初步的研究;又利用射频磁控溅射工艺制备了取向较好的AlN薄膜.我们利用磁控溅射方法制作NbN/AlN/NbN多层薄膜,然后对制备SIS隧道结进行了一些探索.     

Nb5 N6 microbolometer arrays for terahertz detection

A novel room-temperature microbolometer array chip consisting of an Nb5N6 thin film microbridge and a dipole planar antenna, which is used as a terahertz (THz) detector, is described in this paper. Due to the high-temperature coefficient of the resistance of the Nb5N6 thin film, which is as high as -0.7% K-1 , such an antenna-coupled microbolometer is ideal for detecting signals in a frequency range from 0.22THz to 0.33THz. The dc responsivity, calculated from the measured I-V curve of the Nb5N6 microbolometer, is about -760 V/W at a bias current of 0.19mA. A typical noise voltage as low as 10 nV/Hz 1/2 yields a low noise equivalent power (NEP) of 1.3×10-11W/Hz 1/2 at a modulation frequency above 4kHz, and the best RF responsivity, characterized using an infrared device measuring method, is about 580V/W, with the corresponding NEP being 1.7×10-11W/Hz 1/2 . In order to further test the performance of the Nb5N6 microbolometer, we construct a quasi-optical type receiver by attaching it to a hyperhemispherical silicon lens, and the result is that the best responsivity of the receiver is up to 320V/W. This work could offer another way to develop a large scale focal-plane array in silicon using simple techniques and at low cost.     

纳米多孔氮化铌薄膜红外宽带光响应特性

具有超导绝缘相变特性的纳米多孔超导薄膜在红外光电探测领域有着潜在的应用价值,而其在红外波段的宽带光响应特性研究目前尚未见报道.为此,本文以纳米多孔氮化铌(NbN)薄膜为主要对象,研究了其在780—5000nm的近、中红外波长范围内的光响应特性.首先,采用Drude模型拟合的方法,不仅将对实验数据拟合的精度提高了约17%,而且得到了中红外波段的NbN光学参数;进而,采用时域有限差分法分析了加载纳米多孔NbN薄膜的背面对光器件的光响应特性,并给出了能够将纳米多孔薄膜简化为均匀薄膜的Bruggeman等效模型,从而可以将纳米多孔NbN薄膜光响应特性的仿真维度由三维降为一维;最后,基于等效模型和传输矩阵法,对加载纳米多孔NbN薄膜的背面对光器件在近、中红外波段内的光吸收特性进行了优化设计.结果表明:一方面,使用Bruggeman等效模型简化设计过程并不会影响最终结果的正确性;另一方面,仅仅是加载较为简单的光学腔,即可使得探测器的薄膜光吸收率在近、中红外宽带设计时均大于82%,在近红外双波长设计时均大于93.7%,并且多孔薄膜结构具有天然的极化不敏感特性.     

精确研究NbN分子d~1∑~+—b~1∑~+电子态跃迁的P线系发射光谱

本文利用最近建立的能精确求解双原子分子P线系发射光谱的物理新公式,研究了NbN分子从电子态d~1∑~+向b~1∑~+电子态跃迁中(1,1)跃迁带的P支发射光谱.获得的计算结果不仅很好地重现了已知低转动态的实验谱线数据,同时也预言了该跃迁带包含转动量子数J=80在内的高振转激发态的精确P线系发射光谱.该方法在理论上为实验技术难以精确测量的双原子分子体系提供了一种获得精确的高激发态谱线数据的物理新方法.从而可以为那些需要NbN分子高激发态跃迁谱线的研究工作提供必要的数据.     

精确研究NbN分子d1Σ+—b1Σ+电子态跃迁的P线系发射光谱

本文利用最近建立的能精确求解双原子分子P线系发射光谱的物理新公式, 研究了NbN分子从电子态d¹Σ⁺向b¹Σ⁺电子态跃迁中(1,1)跃迁带的P支发射光谱. 获得的计算结果不仅很好地重现了已知低转动态的实验谱线数据, 同时也预言了该跃迁带包含转动量子数J=80在内的高振转激发态的精确P线系发射光谱. 该方法在理论上为实验技术难以精确测量的双原子分子体系提供了一种获得精确的高激发态谱线数据的物理新方法. 从而可以为那些需要NbN分子高激发态跃迁谱线的研究工作提供必要的数据.     

MgO(111)上NbN和AlN薄膜的生长研究

在制备NbN/AlN/NbN隧道结的工艺过程中,为了获得具有优质单晶结构的NbN薄膜,我们在MgO(111)基片上探索了直流溅射法制备NbN薄膜的生长工艺条件,XRD研究分析表明,我们获得了单晶结构良好的NbN薄膜;为了支持作为上电极的NbN薄膜的生长,也需要良好的AlN薄膜用作势垒层,我们采用射频磁控溅射设备和纯净的Al靶对AlN薄膜进行了制备研究.实验结果表明,所获得的AlN薄膜具有六方c-轴取向,并讨论了衬底和薄膜界面处可能的结构情况.