Fabrication of patterned gold electrodes with spin-coated-and-fired Au(1 1 1) film by the soft lithography

We prepared high quality Au(1 1 1) film on Si wafer through the spin coating and thermal decomposition of a gold ink, spin-coated-and-fired (SCAF) Au film. The X-ray measurements, XRD and pole-figure analysis, showed that the SCAF Au film has a (1 1 1) out-of-plane orientation with a random in-plane orientation. In order to confirm the chemical activity of the SCAF Au film, we demonstrate the formation of patterned structures with the film by using soft lithography technique. The chemical activities of this physically stable SCAF Au film to the alkanethiols were at least equivalent those of physically deposited the Au films. The possibility of the mass production of micro patterned structure with the SCAF Au film was also demonstrated over the wide region on Si wafer by the microcontact lithography. These suggest that the Au film will help the easy fabrication of various nanosized devices on Si wafer and other substrates.     

Low noise double pass L-band erbium-doped fiber amplifier

A new double pass long wavelength band erbium-doped fiber amplifier with enhanced noise figure characteristics is demonstrated. The noise figure is improved by about 2.6 dB with the incorporation of broadband conventional-band fiber Bragg grating (FBG) in between the two segments of erbium-doped fiber. By incorporating both the pre-amplifier and the FBG, the noise figure is further improved, which varies from 4.0 to 5.0 dB in the flat gain region from 1570 to 1600 nm. The gain varies from 32.0 to 33.4 dB within this region. The new amplifier with high gain and low noise figure can be useful as an inline amplifier in a wavelength division multiplexing transmission system.     

热电物理的研究进展

热电效应在发电，致冷方面有巨大的应用潜力，这些年来，人们为提高热电能量转换效率进行了不懈的努力，文章概述了从机理上提高材料热性能的一般途径，在此基础上，介绍了最近几年在氧化物超导体，ＴＰｎ３化合物，富硼固体等新材料体系中，以及在非均匀材料，复合型材料，量子阱结构等新形式材料中的研究结果。     

关于李萨如图形讨论的小结

对《大学物理》和其它一些刊物上多年来关于李萨如图形的讨论作了归纳和分析。     

FRS-XRSA表征双轴取向聚对苯二甲酸乙二酯薄膜的取向分布

Ｘ－射线散射理论分析（ＦＲＳ－ＸＲＳＡ）是作者为了研究和表征取向高聚物结晶度与晶粒取向分布（ＯＤＣ）的一种新方案．在表征ＯＤＣ方面应用分峰法（ＣＰＲ）消除了传统极图法（ＰＦＭ）中高重叠峰相互干扰的困难，克服了取向分布函数分析（ＯＤＦＡ）中出现虚织构的困难，并且经一次系统的ＦＲＳ－ＸＲＳ测定，可以得到几乎所有主要（ｈｋｌ）晶面法向的ＯＤＣ．作者应用ＦＲＳ－ＸＲＳＡ对二类双轴取向ＰＥＴ磁带薄膜进行了ＯＤＣ的研究。基于结晶几何学原理（ＣＧＰ），建立了三斜晶系晶粒坐标系与试样坐标系的关系，并用于推演未测定方位角（αｉ，βｉ）（ｈｋｌ）的晶面散射以及未测（ｈ′ｋ′ｌ′）晶面的ＯＤＣ．作者关系建立了双轴取向函数〈ｃｏｓ２φｈｋｌ，ｉ〉，ｉ＝Ｎ、Ｍ、Ｔ的计算公式．按照ＦＲＳ－ＸＲＳＡ获得了反映取向分布的１０个晶面的双轴极图、三个主晶面（１００）、（０１０）、（１０５）的总极图，以及反映平均取向的各种取向函数，如〈ｃｏｓ２φｈｋｌ，ｉ〉、ｆｃｈｋｌ，ｉ等，结果十分令人满意．     

Relationship between the density of supercritical CO<Subscript>2</Subscript> + ethanol binary system and its critical properties

The dependent relation between temperature and pressure of supercritical CO₂+ ethanol binary system under the pressure range from 5 to 10 MPa with the variety of densities and mole fractions of ethanol that range from 0 to 2% was investigated by the static visual method in a constant volume. The critical temperature and pressure were experimentally determined simultaneously. The PTρ figures at different ethanol contents were described based on the determined pressure and temperature data, from which pressure of supercritical CO₂ + ethanol binary system was found to increase linearly with the increasing temperature. P-T lines show certain convergent feature in a specific concentration of ethanol and the convergent points shift to the region of higher temperature and pressure with the increasing ethanol compositions. Furthermore, the effect of density and ethanol concentration on the critical point of CO₂ + ethanol binary system was discussed in details. Critical points increase linearly with the increasing mole fraction of ethanol in specific density and critical points change at different densities. The critical compressibility factors Z_c of supercritical CO₂ + ethanol binary systems at different compositions of ethanol were calculated and Z _c -ρ figure was obtained accordingly. It was found from Z _c -ρ figure that critical compressibility factors of supercritical CO₂ unitary or binary systems decline linearly with the increasing density, by which the critical point can be predicted precisely.     

Crystalline orientation of the InN films prepared by atmospheric pressure halide chemical vapor deposition

The structural analysis of the hexagonal InN film prepared on a Si(100) substrate by the AP-HCVD technique using InCl₃ and NH₃ as starting materials were carried out by the X-ray pole figure analysis. The deposited films consist of the hexagonal InN pillar crystals. It was found that the pillar crystals, which have random rotation around the 100 axis, were grown at an angle of 70–90° to the substrate.     

掺Er及Yb-Er共掺Al2O3光波导放大器噪音特性的数值模拟

利用由速率方程、有限元场分布、传输方程构建的综合理论模型,数值求解了掺Er及Yb-Er共掺Al2O3光波导放大器的噪音系数和正反向自发辐射功率.结果表明,随波导长度的增加,当增益开始下降时,噪音系数显著增加.同时显示了抽运功率和掺杂浓度对噪音系数的影响,比较了两种掺杂放大器的噪音系数,Yb-Er共掺比只掺Er的约小0.8 dB.     

A super-junction SOI-LDMOS with low resistance electron channel

A novel super-junction LDMOS with low resistance channel(LRC), named LRC-LDMOS based on the silicon-oninsulator(SOI) technology is proposed. The LRC is highly doped on the surface of the drift region, which can significantly reduce the specific on resistance(Ron,sp) in forward conduction. The charge compensation between the LRC, N-pillar,and P-pillar of the super-junction are adjusted to satisfy the charge balance, which can completely deplete the whole drift,thus the breakdown voltage(BV) is enhanced in reverse blocking. The three-dimensional(3 D) simulation results show that the BV and R_(on,sp) of the device can reach 253 V and 15.5 mΩ·cm~2, respectively, and the Baliga's figure of merit(FOM = BV~2/R_(on,sp)) of 4.1 MW/cm~2 is achieved, breaking through the silicon limit.     

Formylated polystyrene for the fabrication of pore selective aldehyde group functionalized honeycomb patterned porous polystyrene films

Formylated polystyrene (PS‐CHO) was synthesized by chemical modification of polystyrene (PS) for the fabrication of honeycomb patterned (HCP) porous PS films with aldehyde group functionalized pores via breath figure method under humid conditions. The incorporation of hydrophilic aldehyde group affected the hydrophobicity of PS solution and assisted the self‐assembly of PS‐CHO toward pore. The presence of aldehyde groups in the films were proved by the post treatment with Tollens's reagent, which results in silver decoration at pores. The morphology of the films before and after silver decoration was studied by scanning electron microscopy analysis. The pore selectively self‐assembled aldehyde groups in the patterned porous films can have many applications as a reactive substrate in biomaterials and chemical moieties adhesion. © 2018 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2018 , 56, 1181–1192