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排序方式: 共有1603条查询结果,搜索用时 15 毫秒
1.
Weidong Gao Meiqiong Zhan Shuhai Fan Janda Shao Zheng-Xiu Fan 《Applied Surface Science》2005,250(1-4):195-202
The laser-induced damage (LID) behavior of narrow-band interference filters was investigated with a Nd:YAG laser at 1064 nm under single-pulse mode and free-running mode. The absorption measurement of such coatings was performed with surface thermal lensing (STL) technique. The damage morphologies under the two different laser modes were also studied in detail. It was found that all the filters exhibited a pass-band-center-dependent absorption and laser-induced damage threshold (LIDT) behavior, but the damage morphologies were diverse. The explanation was given with the analysis of the electric field distribution and the operational behavior of the irradiation laser. 相似文献
2.
《Physica E: Low-dimensional Systems and Nanostructures》2003,16(3-4):568
An inexpensive method to produce a pyramidal-type 2D photonic structures in the silicon substrate was proposed. The method is based on the combination of imprint lithography and wet Si1 0 0 etching in water solution of hydrazine, which etches 1 1 1 faces much more slowly than others. Thermally grown SiO2 mask for the hydrazine etching was used, because single Al mask cannot be well bonded to the substrate and tends to peel during the etching. It was revealed that transmittance in the infrared spectrum region of the patterned silicon decreases by about five times compared with that of flat silicon substrate and this decrease is almost independent of the angle of the incident beam. In the infrared region, decrease of transmittance of the patterned samples is directly proportional to the wave number. The shape of formed pyramids has strong influence on the transmittance. Decrease of the transmittance is much more rapid and larger in the case of sharpless pillars. 相似文献
3.
报道了硅基有机微腔的电致发光(EL).该微腔由上半透明金属膜、中心有源多层膜和多孔硅分布Bragg反射镜(PS DBR)组成.半透明金属膜由Ag(20nm)构成,充当发光器件的负电极和微腔的上反射镜.有源多层膜由Al (1 nm) / LiF(05 nm) /Alq3/Alq3:DCJTB/NPB/CuPc/ITO/SiO2组成,其中的Al/LiF为电子注入层,ITO为正电极,SiO2为使正、负电极电隔离的介质层.该PS DBR是采用设备简单、成本低廉且非常省时的电化学腐蚀法用单晶Si来制备的;该PS
关键词:
电化学腐蚀
电致发光
窄峰发射
硅基有机微腔 相似文献
4.
The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl2-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH4/H2/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl2 discharges is smooth, whereas that after etching in CH4/H2/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH4/H2/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH4/H2/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication. 相似文献
5.
Microstructure effect on chemical etching behavior of the annealed Ti-6Al-4V and Ti-3Al-2.5V titanium (Ti) alloys was compared with that of unalloyed commercially pure titanium. The microstructural evolution of structure phases after annealing the titanium and its alloys at temperature near and above β transus and followed by furnace cooling to room temperature was studied using optical microscope, scanning electron microscope and X-ray diffraction techniques. The microstructure study illustrates that the heat treatment enhanced partitioning effect allows extensive formation of hemispherical and near spherical pits roughened surface to be readily acquired by chemically etching the annealed α + β titanium alloys. The kinetics of the chemical etching reaction process show a linear dependence on time. The annealed α + β titanium alloys that exhibit relatively lower weight loss and thickness reduction rate illustrate less chemical activity than the annealed unalloyed titanium. 相似文献
6.
Hua Zhang Nabil A. Amro Robert Elghanian Joseph Fragala 《Applied Surface Science》2006,253(4):1960-1963
A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. 相似文献
7.
利用掺钛的蓝宝石飞秒激光系统输出的单脉冲和多脉冲飞秒激光(中心波长800 nm,脉宽50 fs,靶面聚焦直径Ф 40 μm),分别对BK7玻璃基底上厚约500 nm的单层HfO2和单层ZrO2薄膜进行辐照,得到了这两种薄膜在1-on-1和1 000-on-1测试方法下的激光损伤阈值。实验发现,两种方法下HfO2单层膜的阈值均比ZrO2单层膜的阈值高。从简化的Keldysh多光子离化理论出发,认为HfO2薄膜材料的带比ZrO2的宽是导致上述结果的主要原因。同时,同一种薄膜的多脉冲下的阈值比单脉冲下的低,原因是多脉冲下,飞秒激光对光学薄膜的损伤存在累积效应。 相似文献
8.
由Q-Nd:YAG脉冲激光(波长1.06μm,脉宽10 ns)烧蚀Al靶产生等离子体.观测了在低气压和直流电场条件下的Al等离子体发射光谱.研究了激光功率密度和直流电场对各谱线强度的影响,分析了谱线半高全宽与外加电压,等离子体电子温度与激光能量的变化规律.结果表明,直流电场对铝原子谱线强度有显著的增强,铝原子谱线的半高全宽与直流电场的外加电压基本上呈线性关系. 相似文献
9.
In this paper, experimental results of the investigation of the periodic structure on thermoelectric semiconductor Cu2Se are presented. Periodic structures were formed on surfaces of semiconductors due to multi-beam interaction of Q-switched Nd:YAG laser, which was operated in the lowest order of Gaussian mode and pulse duration 7 ns. Surface temperature evolution and transient reflectivity are studied during laser treatment. Creation of Cu islands in the maximal intensity of interference pattern was found. 相似文献
10.
CR-39 is a highly sensitive etched track detector for neutron monitoring and dosimetry applications but its dose equivalent response is strongly direction dependent with respect to the incident neutrons. This is considered to be a major drawback for their use. In the present study, an attempt has been made to develop a pyramid shaped dosimeter, which consists of polyethylene material of thickness 1 mm with the provision to hold three CR-39 films at an angle of 35° to each other. The response of CR-39 in this configuration under optimum electrochemical etching at elevated temperature have been found nearly angular independent and therefore the dosimeter can be used for neutron monitoring, i.e. personnel as well as area monitoring. 相似文献