Growth of silicon thin film by LPE on porous silicon bilayers

The fabrication of solar cells based on the transfer of a thin silicon film on a foreign substrate is an attractive way to realise cheap and efficient photovoltaic devices. The aim of this work is to realise a thin mono-crystalline silicon film on a double porous silicon layer in order to detach and transfer it on mullite. The first step is the fabrication of a double porous silicon layer by electrochemical anodisation using two different current densities. The low current leads to a low porosity layer and during annealing, the recrystallisation of this layer allows epitaxial growth. The second current leads to a high porosity which permits the transfer on to a low cost substrate. Liquid Phase Epitaxy (LPE) performed with indium (or In+Ga) in the temperature range of 950–1050°C leads to almost homogeneous layers. Growth rate is about 0.35 μm min⁻¹. Crystallinity of the grown epilayer is similar on porous silicon and on single crystal silicon. In this paper, we focus on the realisation of porous silicon sacrificial layer and subsequent LPE growth. This revised version was published online in July 2006 with corrections to the Cover Date.     

液相外延制备InGaAsP/InP掩埋异质结若干工艺问题的讨论

本文对InGaAsP/InP(DC-PBH)激光器掩埋异质结液相外延生长中的几个关键工艺问题进行了研究,提出了获得有利于沟道掩埋生长的理想沟道几何图形的新的腐蚀配方(Br_2/HBr),对二次外延再生长光刻腐蚀面损伤层和有害杂质的去除采用了阳极氧化工艺,同时探索了利用二次外延过程中Zn扩散来控制限制层(3)掺杂的新方法,在研究基础上制造了重现性好且性能良好的1.3μm激光二极管,室温时,阈值电流最低小于25mA,典型值为30mA,在60mA直流电流的驱动下,光输出功率高达12.5mW.     

在LPE生长中降温和恒温对InAsPSb外延层组分分布的影响

采用LPE技术,生长出InAsPSb外延层,研究了降温、恒温两种方法对外延层组分分布的影响。结果表明,用恒温方法生长时,外延层中P、Sb组分分布较为均匀,在脉冲电流激发下,得到了3.09μm激光输出。     

Growth and characterisation of Zn:LiNbO3/Mg:LiNbO3 multilayer thin films grown by liquid phase epitaxy

1, 3 and 5 mol% ZnO doped LiNbO₃ film and 2 mol% MgO doped LiNbO₃ multilayer films were grown on the LiNbO₃ (001) substrate by liquid phase epitaxy (LPE) method with a Li₂O‐V₂O₅ system. We examined the optical transmission spectra of the Zn:LiNbO₃ by Fourier Transform‐Infrared Spectrophotometer (FT‐IR). The crystallinity and the lattice mismatch between the Zn:LiNbO₃ film and Mg:LiNbO₃ film was confirmed by x‐ray rocking curve (XRC) and observed the ZnO and MgO distribution in the cross‐section of the multilayer thin films by electron probe micro analyzer (EPMA). Furthermore, the surface morphology of the films was observed using atomic force microscopy (AFM). (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

LPE碲镉汞薄膜的显微Raman谱与显微荧光谱分析

利用Raman显微镜系统对4块用液相外延(LPE)方法在Cd0.96Zn0.04Te衬底上生长的Hg0.8Cd0.2Te外延薄膜样品，在100～5 000cm^-1光谱范围进行测量，在实验曲线中除了观察到与碲镉汞材料晶格振动相符的类．HgTe的光学振动横模(TO1模)和纵模(LO1模)的Raman散射峰、类-CdTe光学振动横模(TO2模)和纵模(LO2模)混合的Raman散射峰以及来源于TO1 LO1的二级Raman散射峰外，在1 000～5 000cm^-1光谱范围首次发现了LPE碲镉汞薄膜的显微荧光峰，该显微荧光的发光范围换算为电子伏特标度为1．34～1．83eV．发光中心位于2750cm^-1即1.62eV，发光峰的半高宽(FWFIM)约为0．25eV。通过分析指出．该显微荧光来源于碲镉汞外延层中阴性离子空位与材料导带底的共振能级的发光。     

超薄溶液LPE技术生长GaInAsP/InP超晶格的理论与实验

本文由有限厚度溶液及自由表面浓度和恒定表面浓度二种模型出发对LPE生长动力学过程进行了理论分析,并导出了实现薄层生长的参数控制条件,根据这一条件用LPE技术实际生长了GaInAsP/InP超晶格,570℃下用突冷法及被压缩到200μm～500μm的薄层溶液在0.2s的驻留时间内分别重复长出了5nm(Ga0.40In0.60As0.89P0.11)和10nm(InP)的超晶格,证明了用重复推拉舟的LPE系统在一定的参数条件下可以生长MQW结构.     

Hybrid heterostructure with a nanolayer of diluted GaIn(Mn)AsSb compound in a type II broken-gap heterojunction

Nanotechnology of obtainment of diluted magnetic semiconductors based on the GaInAsSb compounds is developed using the pulsed laser ablation deposition of Mn atoms on the surface of the epitaxial layer of a quaternary alloy obtained by liquid phase epitaxy. Fabricated heterostructures were studied using high-resolution X-ray diffraction for the Bragg and grazing diffraction geometries, and the depth profiling analysis was performed by secondary ion mass spectrometry. It was established that the nanoscale region of the Ga_0.96In_0.04As_0.11Sb_0.89 epilayer near the deposition surface of atomic Mn exhibits the presence of a quinary compound with Mn atoms in the lattice of the solid solution layer.     

Determination of crystallite particle size distribution of polymers from WAXS

A method for the calculation of crystallite size distributions from the profile of wide-angle x-ray reflections is developed. The influence of lattice distortions on the profile is taken into account. The information about the lattice distortions is obtained from the measurement of the integral widths of a number of reflections. The method is applied to samples of (ethylen-1 hexen) copolymers. The change of crystallite size distributions in lateral directions with increasing temperature (20–121°C) is measured. Recrystallization processes at temperatures near the melting point are observed. © 1996 John Wiley & Sons, Inc.     

变温吸收谱研究液相外延碲镉汞浅能级

利用变温吸收谱(11—300K)对非故意掺杂液相外延Hg_1-xCd_xTe进行研究,对吸收边在低温区间(<70K)出现的约7—20meV反常移动现象进行了分析.结果表明该现象是由材料中Hg空位作为受主能级存在而形成的,红移幅度与样品组分/载流子浓度有关.据此估算Hg空位大致位于价带上方约20meV,与Hg空位形成浅受主能级的经验公式计算结果基本符合.该结果可以解释由传统吸收谱方法确定材料禁带宽度略高于材料实际光电响应截止能量值的现象. 关键词： 碲镉汞 液相外延 汞空位 反常吸收     

1.25μm近红外场助光阴极材料InGaAsP/InP的液相外延

本文简要阐述了近红外场助光阴极的原理及对外延材料的要求。利用液相外延工艺并采用独特的掺杂技术生长出了用于近红外光电阴极的InP/InGaAsP 异质结结构。显微分析。x射线双晶衍射、电子探针、电化学C-V等测试结果表明外延层的结晶质量及电学性能符合设计的特殊要求,在此基础上制作的场助光电阴极量子效率在1.20μm处为3.5×10^-4,其响应波长可达1.25μm。