应力对M-Z型InP/InGaAsP-EAM偏振

采用Agilent 81910A光子全参量测试仪,首次实验研究了InP/In1－xGaxAs1－yPy-MQW（Multiple-Quantum-Well,MQW）材料与衬底间因应力而产生的M-Z型光调制器的PDL影响以及由此引起的由差分群时延(Differential Group Delay,DGD)表征的偏振模色散(Polarization Mode Dispersion,PMD).研究结果表明,半导体MQW光调制器的PDL与DGD是一致的.因此在半导体光器件的制作过程中,应尽可能地减小衬底与波导芯层之间的因残存应力的存在造成对光器件的高速性能的不利影响.     

Photodiffraction in InGaAs/InGaAsP multiple quantum wells enclosed in a microcavity

We report new results on the diffraction properties of photoinduced gratings in InGaAs/InGaAsP MQW structures. The original feature of this device is that the QWs are enclosed in an asymmetric Fabry–Perot microcavity in order to increase the diffraction efficiency. We observe oscillations in the diffraction efficiency due to resonant effects in the microcavity. The experimental spectra are compared with theory. Diffraction efficiency at 1.55 μm attains a maximum value of 2.7% at a write beam fluence of 260 μ J cm⁻², and then decreases at higher fluences. We explain this phenomenon by an absorption saturation at high excitation.     

长波长大应变InGaAs/InGaAsP分布反馈激光器的材料生长与器件制备

采用低压金属有机化合物气相沉积法(LP-MOCVD)生长并制作了1.6—1.7μm大应变InGaAs/InGaAsP分布反馈激光器.采用应变缓冲层技术，得到质量良好的大应变InGaAs/InP体材料.器件采用了4个大应变的量子阱，加入了载流子阻挡层改善器件的温度特性.1.66μm和1.74μm未镀膜的3μm脊型波导器件阈值电流低(小于15mA)，输出功率高(100mA时大于14mW).从10—40℃，1.74μm激光器的特征温度T₀=57K，和1.55μm InGaAsP分布反馈激光器的特征温度相当. 关键词： MOCVD InGaAs/InGaAsP 应变量子阱 分布反馈激光器     

InGaAsP/InP photodetectors targeting on 1.06 μm wavelength detection

InP-based InGaAsP photodetectors targeting on 1.06 μm wavelength detection have been grown by gas source molecular beam epitaxy and demonstrated. For the detector with 200 μm mesa diameter, the dark current at 10 mV reverse bias and R₀A are 8.89 pA (2.2 × 10⁻⁸ A/cm²) and 3.9 × 10⁵ Ω cm² at room temperature. The responsivity and detectivity of the InGaAsP detector are 0.30 A/W and 1.45 × 10¹² cm Hz^1/2 W⁻¹ at 1.06 μm wavelength. Comparing to the reference In_0.53Ga_0.47As detector, the dark current of this InGaAsP detector is about 570 times lower and the detectivity is more than ten times higher, which agrees well with the theoretical estimation.     

液相外延制备InGaAsP/InP掩埋异质结若干工艺问题的讨论

本文对InGaAsP/InP(DC-PBH)激光器掩埋异质结液相外延生长中的几个关键工艺问题进行了研究,提出了获得有利于沟道掩埋生长的理想沟道几何图形的新的腐蚀配方(Br_2/HBr),对二次外延再生长光刻腐蚀面损伤层和有害杂质的去除采用了阳极氧化工艺,同时探索了利用二次外延过程中Zn扩散来控制限制层(3)掺杂的新方法,在研究基础上制造了重现性好且性能良好的1.3μm激光二极管,室温时,阈值电流最低小于25mA,典型值为30mA,在60mA直流电流的驱动下,光输出功率高达12.5mW.     

InGaAsP multiple quantum well edge-emitting light-emitting diode showing low coherence characteristics using selective-area metalorganic vapor phase epitaxy

Low coherence multiple-quantum well edge-emitting light-emitting diodes were obtained using selective-area metalorganic vapor-phase epitaxial growth, which utilized growth rate enhancement on an open stripe region between mask stripes. An optical absorption region, which was controlled by selective-area growth, was introduced to suppress optical feedback. At a driving current of 100 mA and an ambient temperature of 25°C, a power of 55 μW was coupled into a single-mode fiber, and a broad spectrum without spectral ripple was observed. Low coherence characteristics and very small temperature dependence were obtained in the temperature range from -40°C to 85°C. The modulation bandwidth was 210 MHz at a bias current of 100 mA.     

1．55μmInGaAsP及其相应量子阱结构的LP－MOCVD生长

本文研究了用低压金属有机化合物汽相外延（ＬＰ－ＭＯＣＶＤ）技术在（１００）ＩｎＰ衬底上生长ＩｎＧａＡｓｐ体材料及ＩｎＧａＡＰ／ＩｎＰ量子阱结构材料的生长条件。三甲基镓（ＴＭ６３）、三甲基铟（ＴＭｈ）和纯的砷烷（Ａ８Ｈ３）、磷烷（ＰＨ３）分别用作Ⅲ族和Ⅴ族源，在非故意掺杂情况下，ＩｎＧａＡｓＰ材料的载流子浓度为３．６×１０１５ｃｍ－３；在液氦温度和室温下，与ＩｎＰ晶格匹配的ＩｎＧａＡｓＰ光致发光半峰宽分别为１９．２ｍｅＶ和６３ｍｅＶ；对外延层的组分及厚度均匀性分别进行了转靶Ｘ光衍射仪，低温光致发光和扫描电子显微镜分析，对不同阱宽的量子阱结构材料测出了由于量子尺寸效应导致光致发光波长随阱宽增加而红移现象。     

InP/InGaAsP多量子阱自发辐射谱的解析函数

利用洛伦兹线型函数、高斯线型函数和Sech线型函数对InP/InGaAsP多量子阱自发辐射谱进行拟合,采用莱文贝格-马夸特算法,得到上述三种函数的解析表达式.研究结果表明:高斯线型光谱拟合函数的中心波长为1548.651nm,谱线半极大全宽度为61.42 nm,功率补偿为0.00212 mW,拟合优度为0.99191,残差平方和为2.26505×10~(-6).高斯线型拟合的拟合优度最大,残差平方和最小,且各数据点的残差值分布在±0.0001之间,分布比较均匀.高斯线型函数具有较高拟合度.     

MBE-grown Ridge-waveguide InGaAs/InGaAsP Strained Quantum Well Lasers at 2 μm Wavelength

The result of molecular beam epitaxy (MBE)-grown ridge-waveguide InGaAs/ InGaAsP/InP strained quantum well lasers at 2 μm wavelength is reported. The pulsed electrical luminescence spectrum at room temperature is observed with peak wavelength of about 1.98 μm. At 77 K the lasers become lasing in pulse regime, with threshold current of about 18～30 mA, peak wavelength of about 1.87～ 1. 91 μm, and single longitudinal mode operation in the current range of 160～230 mA.     

1．55μmInGaAsP及其相应量子阱结构的LP-MOCVD生长

本文研究了用低压金属有机化合物汽相外延(LP-MOCVD)技术在(100)InP衬底上生长InGaAsp体材料及InGaAP/InP量子阱结构材料的生长条件。三甲基镓(TM63)、三甲基铟(TMh)和纯的砷烷(A8H3)、磷烷(PH3)分别用作Ⅲ族和Ⅴ族源,在非故意掺杂情况下,InGaAsP材料的载流子浓度为3.6×10¹⁵cm^-3;在液氦温度和室温下,与InP晶格匹配的InGaAsP光致发光半峰宽分别为19.2meV和63meV;对外延层的组分及厚度均匀性分别进行了转靶X光衍射仪,低温光致发光和扫描电子显微镜分析,对不同阱宽的量子阱结构材料测出了由于量子尺寸效应导致光致发光波长随阱宽增加而红移现象。