光纤光栅选频掺Yb3+双包层光纤激光器

利用相位掩模法 ,在D形内包层掺Yb3 双包层光纤一端直接写制出Bragg光栅 ,用作双包层光纤激光器的输出腔镜 .试验得到了线宽为 0 196nm ,波长为 10 5 8 2nm ,最高输出功率为 5 70mW的稳定激光输出 ,解决了激光器中模式竞争造成的输出不稳定现象 .从速率方程出发 ,对激光器的输出功率与抽运功率、光栅反射率的关系以及最佳光纤长度进行了理论分析 ,结果与实验符合很好     

High-Density Read-Only Memory Disc with Ag11In12Sb51Te26 Super-Resolution Mask Layer

A novel read-only memory (ROM) disc with an Ag11ln12Sb51Te26 super-resolution mask layer is proposed and investigated for the first time to our knowledge. The carrier-to-noise ratio of more than 40 dB could be obtained from small pits (380nm), which are below the readout resolution limit (400nm), in our dynamic setup with a wavelength of 632.8 nm and numerical aperture of 0.40. Dependences of carrier-to-noise ratio on readout power,readout velocity and film thickness are studied. The results show that the optimum film thickness is 20-50nm and the corresponding carrier-to-noise ratio is more than 40dB at readout power of 4mW and readout velocity of 2m/s in our experiment. The super-resolution readout mechanism for this ROM disc is also discussed.     

n型砷化镓微区光电化学腐蚀过程

在n-GaAs电解液界面,用聚焦He-Ne激光照射, 使n-GaAs表面发生微区光电化学腐蚀, 用计算机控制步进马达, 使试样在X-Y二维方向扫描移动, 能在晶片上得到刻蚀点直径2 μm的刻蚀图案. 研究了激光相对光强, KOH、H_2SO_4、KCl等刻蚀剡的浓度, 光腐蚀的时间, 电极电位等因素对腐蚀点的直径和深度的影响, 通过实验数据找出腐蚀过程的规律, 并用光电化学原理进行解释.     

基于低通滤波的相位掩模干涉图相位解调方法

 传统的四步相移算法在分析相位掩模干涉图时存在相移值误差、分辨力降低和相干噪声等不足,从而影响了动态干涉仪的性能。为了提高相位掩模干涉图的分析精度,提出了一种基于低通滤波的相位解调方法。该方法根据相位掩模引入相位的空间频率远大于被测相位空间频率的最大值,采用低通滤波的方法提取相位信息。数值分析结果表明,该方法的精度高于传统四步相移算法。分析干涉图的信噪比,合理选择低通滤波器,可进一步提高相位解调的精度。     

Analysis of ultra-short pulse shaping with programmable amplitude and phase masks

Specified ultra-short pulse waveforms could be synthesized with high-resolution zero-dispersion pulse shaping system.The system and parameters are analyzed and discussed.The pulse shaping system with optimized parameters could resolve the frequency components of ultra-broad bandwidth pulse and prevent the spatial shaping of individual frequency components.The specified waveforms,Meyer wavelet and square root raised cosine pulses,are generated with programmable amplitude and phase masks.     

极紫外光刻掩模相位型缺陷检测方法

提出了一种基于空间像的极紫外光刻掩模相位型缺陷检测方法,用于检测多层膜相位型缺陷的类型、位置和表面形貌。缺陷的类型、位置和表面形貌均会影响含缺陷掩模的空间像的分布。因此,采用深度学习模型构建含缺陷掩模的空间像与待测缺陷信息之间的映射,利用训练后的模型可从含缺陷掩模的空间像中获取待测缺陷信息。采用卷积神经网络（CNN）模型构建含缺陷空白掩模的空间像和缺陷类型与位置之间的关系,建立用于缺陷类型和位置检测的CNN模型。在获取缺陷的类型与位置后,基于测得的缺陷位置对空间像进行截取,利用截取后的空间像的频谱信息和多层感知机模型获取缺陷表面形貌参数。仿真结果表明,所提方法可对多层膜相位型缺陷的类型、位置和表面形貌参数进行准确检测。     

A novel strategy for in situ maskless synthesis of biochips： Self-driving micro-fluid porous type printing （SMPTP）

A novel maskless technique,self-driving micro-fluid porous type printing(SMPTP),was reported to in situ synthesize oligonucleotide arrays on glass slide,which has the merits of low cost,high quality and simple craft.In SMPTP for fabricating gene- chips,porous fiber tubes with a number of nanometric or micron channels functioned as“active letters”and were assembled in designed patterns,which are identical to the distribution of monomers in each layer of the array,and four patterns were needed for each layer.By means of capillarity,the synthesis solution was automatically taken into porous tubes assembled in a printing plate and reached the surface.An oligonucleotide array of 160 features with four different 15-mer probes was in situ synthesized using this technique.The four specific oligonucleotide probes,including the matched and the mismatched by the fluorescent target sequence,gave obviously different hybridization fluorescent signals.     

掩模法制备高TcYBa2Cu3O7Josephson边缘结

本文利用脉冲激光沉积的定向性和掩模的阴影效应，原位沉积Ｎ－ＹＢＣＯ作为势垒层制备了高ＴｃＹＢａ２Ｃｕ３Ｏ７Ｊｏｓｅｐｈｓｏｎ边缘结，在６０Ｋ，微波辐照观察到明显的Ｓｈａｐｉｒｏ台阶，在Ｔｃ附近，Ｉｃ∽（１－Ｔ／Ｔｃ），ｎ＝１．８８。