基于YAG透明陶瓷制作衍射光栅元件的研究

研究并制作了以钇铝石榴石(YAG)透明陶瓷为基底材料的衍射光栅元件。通过磁控溅射技术在YAG透明陶瓷表面溅射一层均匀致密的金属铬,获得带有硬掩模的陶瓷样品。借助接触式曝光系统进行光刻,反复试验,获得带有衍射光栅的YAG透明陶瓷样品。经光学轮廓仪检测,样品铬膜厚0.072 m,光栅细节得到完好保留。实际光栅的衍射图样再次验证了以YAG透明陶瓷代替传统微光刻基底材料制作衍射光栅的可行性,使得衍射光栅在更为复杂的环境下发挥作用成为可能。     

Novel UV-curable and alkali-soluble resins for light-shielding black matrix application

A carbon black (CB) photo resist, comprising CB, CB dispersant, photo-curable resin, photo-initiator, and solvent, has been developed in order to prepare a light-shielding black matrix (BM) in the liquid crystal display application. In order to prepare a BM with a high opacity property or optical density (OD), the effect of CB such as its particle and concentration on light absorption property was first evaluated, and the results showed that 45 wt% CB with a particle size of about 100 nm in BM could reach an OD value of 4 μm⁻¹. Moreover, six different UV-curable and alkali-soluble resins (A1, A2, and A3; B1, B2, and B3) were synthesized as photo-curable resins. Structures of these resins were characterized by FTIR and GPC, in which concentrations of various functional groups, especially carboxylic acid and double bond, were calculated. Subsequently, their photo-initiated polymerization rate with or without CB were measured. Finally, it was found that through a proper selection of the newly synthesized resins to prepare a carbon black photo resist, a BM with an OD of 4 μm⁻¹ and a good resolution of 10 μm was successfully prepared upon low UV irradiation energy of 50 mJ/cm².     

氟化钙晶体生长的研究进展

随着深紫外光刻技术的发展,透光范围宽、透过率高的CaF2晶体成了人们关注的焦点,其尺寸和质量得到了不断的提高.结合CaF2的基本性质,综述了CaF2晶体的主要生长方法及存在的问题.从原料的纯化处理到晶体的光学加工,归纳总结了提高紫外级CaF2晶体的尺寸、质量和产率的有效措施.