排序方式: 共有41条查询结果,搜索用时 31 毫秒
1.
本文研究了在反应气体中引入不同浓度的CO2对微波等离子体化学气相沉积(MPCVD)法同质外延生长单晶金刚石内应力的影响,并对其作用机理进行了分析。研究发现,随着CO2浓度增加,单晶金刚石内应力逐渐减小,这是由于添加的CO2提供了含氧基团,可以有效刻蚀金刚石生长过程中的非金刚石碳,并能够降低金刚石中杂质的含量,从而避免晶格畸变,减少生长缺陷,并最终表现为单晶金刚石内应力的减小,其中金刚石内应力以压应力的形式呈现。此外反应气体中加入CO2可以降低单晶金刚石的生长速率和沉积温度,且在合适的碳氢氧原子比(5∶112∶4)下能够得到杂质少、结晶度高的单晶金刚石。 相似文献
2.
Relationship between the spatial position of the seed and growth mode for single-crystal diamond grown with an enclosed-type holder 下载免费PDF全文
Wen-Liang Xie 《中国物理 B》2022,31(10):108106-108106
The relationship between the spatial position of the diamond seed and growth mode is investigated with an enclosed-type holder for single-crystal diamond growth using the microwave plasma chemical vapor deposition epitaxial method. The results demonstrate that there are three main regions by varying the spatial position of the seed. Due to the plasma concentration occurring at the seed edge, a larger depth is beneficial to transfer the plasma to the holder surface and suppress the polycrystalline diamond rim around the seed edge. However, the plasma density at the edge decreases drastically when the depth is too large, resulting in the growth of a vicinal grain plane and the reduction of surface area. By adopting an appropriate spatial location, the size of single-crystal diamond can be increased from 7 mm × 7 mm × 0.35 mm to 8.6 mm × 8.6 mm × 2.8 mm without the polycrystalline diamond rim. 相似文献
3.
4.
5.
GU Yousong ZHANG Yongping CHANG Xiangrong TIAN Zhongzhuo CHEN Nanxian SHI Dongxia ZHANG Xiufang YUAN Lei 《中国科学A辑(英文版)》2000,43(2)
C3N4 films have been synthesized on both Si and Pt substrates by microwave plasma chemical vapor deposition (MPCVD) method. X-ray spectra were calculated for single phase α-C3N4 and β-C3N4 respectively. The experimental X-ray spectra of films deposited on both Si and Pt substrates showed all the strong peaks of α-C3N4 and β-C3N4, so the films are mixtures of α-C3N4 and β-C3N4. The N/C atomic ratio is in the range of 1.0-2.0. X-ray photoelectron spectroscopy (XPS) analysis indicated that the binding energy of C 1s and N 1s are 286.2 eV and 399.5 eV respectively, corresponding to polarized C-N bond. Fourier transform infrared absorption (FT-IR) and Raman spectra support the existence of C-N covalent bond in the films. Nano-indentation hardness tests showed that the bulk modulus of a film deposited on Pt is up to 349 GPa. 相似文献
6.
Significant suppression of residual nitrogen incorporation in diamond film with a novel susceptor geometry employed in MPCVD 下载免费PDF全文
Weikang Zhao 《中国物理 B》2022,31(11):118102-118102
This work proposed to change the structure of the sample susceptor of the microwave plasma chemical vapor deposition (MPCVD) reaction chamber, that is, to introduce a small hole in the center of the susceptor to study its suppression effect on the incorporation of residual nitrogen in the MPCVD diamond film. By using COMSOL multiphysics software simulation, the plasma characteristics and the concentration of chemical reactants in the cylindrical cavity of MPCVD system were studied, including electric field intensity, electron number density, electron temperature, the concentrations of atomic hydrogen, methyl, and nitrogenous substances, etc. After introducing a small hole in the center of the molybdenum support susceptor, we found that no significant changes were found in the center area of the plasma, but the electron state in the plasma changed greatly on the surface above the susceptor. The electron number density was reduced by about 40%, while the electron temperature was reduced by about 0.02 eV, and the concentration of atomic nitrogen was decreased by about an order of magnitude. Moreover, we found that if a specific lower microwave input power is used, and a susceptor structure without the small hole is introduced, the change results similar to those in the surface area of the susceptor will be obtained, but the spatial distribution of electromagnetic field and reactant concentration will be changed. 相似文献
7.
8.
使用自行研制的椭球谐振腔式MPCVD装置,以H2-CH4为气源、沉积功率8 kW条件下,在不同CH4浓度、沉积温度和气体流量工艺条件下制备了大面积金刚石膜.使用X射线衍射仪对金刚石膜的择优取向的变化规律进行了研究.实验结果表明,高功率条件下工艺参数对金刚石膜的择优取向有不同程度的影响.在CH4浓度由0.5;上升到1.0;时,金刚石膜的择优取向由(220)转变为(111),由1.O;上升到2.5;时,则由(111)转变为(220)以及(311);在700 ~ 1050℃温度范围内,随着沉积温度的升高,金刚石膜(111)择优取向生长的倾向增高,当沉积温度高于1050℃时,金刚石膜改变了原先的以(111)择优取向生长的趋势,变为了以(100)择优取向生长;在气体流速为200~1000 sccm范围内时,随气体流量的增加,金刚石膜(111)择优取向的倾向增加.当气体流量大于1000sccm时,金刚石膜(111)择优取向的倾向又稍有降低. 相似文献
9.
《Comptes Rendus Physique》2019,20(6):583-592
During the growth of a single-crystal diamond by MPCVD, polycrystalline diamonds are prone to grow in the edge regions. This substantially reduces the usable area of the grown diamond film. In addition, the inhomogeneous distribution of internal stress causes diamond to crack during continuous growth. In recent years, a series of experimental studies have been carried out to solve these problems and some achievements have been obtained. However, in order to understand fundamentally the growth mechanism of diamond, the relationship between growth quality and various influencing factors still needs to be quantitatively studied through integrated simulations and experiments. Electron number density and substrate temperature are important factors affecting diamond crystallization quality. In this paper, the growth conditions of the diamond were simulated and analyzed. Simulation results were compared with the experimental results. This evidences that the surface temperature distribution is relatively homogeneous, and that the significant electron number density gradient in the axial direction is the main reason for the formation of polycrystals in the edge regions. Therefore, substrate holders with different cavity depths were designed and the substrates grew in the same temperature range. The surface morphologies, crystalline qualities, and internal stress distributions of the grown diamonds were measured, and it was found that the quality of growth increased first and then decreased with the depth of the cavity, while the growth rate decreased with increasing the latter. These results are in good agreement with the simulation results. Finally, suggestions on the selection of the substrate holder for film growth with different thicknesses are proposed. 相似文献
10.
本研究在自制的5 kW大功率MPCVD装置中,利用边缘效应成功的在基片边缘处以50μm/h的沉积速率沉积出品粒尺寸达500 μm左右的大颗粒金刚石并以70μm/h沉积速率同质外延修复长大了一颗天然的单晶金刚石.在实验中,利用SEM和Raman光谱对基片边缘区域和中央区域所沉积的金刚石颗粒进行了表征.结果表明,边缘处沉积的金刚石颗粒与中央区域沉积的金刚石颗粒相比,具有更大的晶粒尺寸和更好的质量.通过仔细观察实验条件,对边缘效应产生的原因进行了分析,发现由于基片边缘放电,使得基片表面的电场强度和温度分布发生变化,从而导致基片边缘区域的等离子体密度和温度高于中央区域,高等离子体密度和温度的综合作用是使得在基片边缘能以较高的沉积速率沉积出大尺寸金刚石颗粒的主要原因. 相似文献