Lithographic design of photosensitive polyarylates based on reaction development patterning

The factors affecting pattern‐forming properties in reaction development patterning were examined with polyarylates with various bisphenol moieties. The developability of the photosensitive polyarylates was dependent on the properties of the subtituent (R) in the bisphenol moieties. The development time decreased in the following order: R?C(CH₃)₂ > fluorenyl unit ? phenolphthalein unit > C(CF₃)₂ > SO₂. This order agreed with that of the reactivity between the polyarylates and ethanolamine, and these orders can be explained by pK_a of the bisphenol used to prepare the polyarylates. The development with NH₂? R′? OH resulted in successful positive‐tone pattern formation. However, pattern formation with the developers containing NH₂? R′? OCH₃ was unsuccessful. © 2006 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 44: 2694–2706, 2006     

A Large-Area Patterned TiO2/SnO2 Bilayer Type Photocatalyst Prepared by Gravure Printing

Anatase TiO₂ films (thickness = 50 nm) were formed in shape of stripes (width = 1.6 mm, interval = 0.4 mm) by gravure printing on commercially available SnO₂ coated soda-lime glass substrates (dimension = 300 × 300 mm). Its photocatalytic activity was examined for the gas-phase oxidation of CH₃CHO in comparison with a simple TiO₂ photocatalyst formed on a silica glass. The patterned TiO₂/SnO₂ bilayer type photocatalyst showed a high photocatalytic activity in an H₂O bearing atmosphere. On the other hand, neither the patterning nor stacking effect was observed for the same reaction under dry conditions. These results could be explained in terms of the reducing potential of the electrons in the conduction band of the SnO₂ layer.     

Photolithographically patternable nitrate-sensitive acrylate-based membrane

A photocurable acrylate matrix nitrate-sensitive membrane containing 2-nitrophenyl n-octyl ether as mediator and tetraalkylammonium nitrate as an active compound is described. The photocuring was achieved by the use of photoinitiators containing diaryliodonium chloride. This acrylate membrane is patternable via a photolithographic process with a only slight loss of electrochemical characteristics.     

DNA分子在气液界面的组装相变特性及其LB膜结构研究

对十八胺与DNA在气液界面上组装及其相变过程进行了研究，利用AFM观察了不 同压力下转移的DNA复合LB膜结构。发现在低表面压时，DNA复合单分子膜表现为技 术发散的分形结构；随着压力的升高，DNA复合膜逐渐由紧密的网状排布结构变为 团聚的块状和团簇结构。表明通过调节膜压，可使膜内DNA分子的构象发生大的变 化，从而生成具有特定形态的二维纳米图案。这种具有特殊形态和结构的DNA LB膜 可望为合成新型生物纳米结构有序功能体系提供模板。     

Wrinkle morphologies with two distinct wavelengths

Wrinkles with two distinct wavelengths formed sequentially on the same surface are investigated. A series of aligned wrinkles are formed through local strain application on a partially crosslinked elastomer. After the formation of these primary wrinkles, the elastomer is fully crosslinked, and a mechanical compressive strain is applied to the sample orthogonal to the primary wrinkles. This mechanical strain results in smaller secondary wrinkles superimposed on the larger primary aligned wrinkles. Resulting biaxial morphologies suggest that the primary pattern directs the formation of the smaller wrinkles. The modulus mismatch of the substrate on primary and secondary wrinkle formation dictates the ratio between the two resulting wavelengths, as well as the specific biaxial morphologies, ranging from zigzag ridges to ellipsoidal bumps or corn‐on‐the‐cob structures to the classic herringbone. The sequential strain wrinkling process has the potential to be used on an industrial scale for the facile formation of surface topography with two discrete, tunable lateral dimensions over large surface areas. © 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2012     

Embossing of organic thin films using a surfactant assisted lift-off technique

A simple technique for patterning organic materials using a surfactant assisted lift-off method is proposed. Thin films of various organic materials are prepared, and areas in contact with a surfactant coated poly(dimethylsiloxane) (PDMS) stamp are selectively removed. The general applicability of this technique is shown for materials containing nitrate, amine, and carboxylic acid functional groups. This technique provides a new methodology for fabricating patterns with vertical dimensions ranging from 30 nm up to 3 μm on organic thin films with specific functional groups.     

Patterning Surfaces for Controlled Platelet Adhesion and Detection of Dysfunctional Platelets

Platelets play a fundamental role in thrombus formation and in the pathogenesis of arterial thrombosis. Patterning surfaces for controlled platelet adhesion paves the way for adhesion and activation mechanisms in platelets and detection of platelet functional defects. Here, a new and simple method based on controlled polymerization of 2‐methacryloyloxyethyl phosphorylcholine (MPC) on the surface of styrene‐block‐(ethylene‐co‐butylene)‐block‐styrene (SEBS) is shown. The competition between polymerization and degradation enables platelet adhesion on SEBS to be switched on and off. The adhesive sites of the platelets can be down to single cell level, and the dysfunctional platelets can be quantitatively detected.

     

Construction of microscale structures in enclosed microfluidic networks by using a magnetic beads based method

A large number of microscale structures have been used to elaborate flowing control or complex biological and chemical reaction on microfluidic chips. However, it is still inconvenient to fabricate microstructures with different heights (or depths) on the same substrate. These kinds of microstructures can be fabricated by using the photolithography and wet-etching method step by step, but involves time-consuming design and fabrication process, as well as complicated alignment of different masters. In addition, few existing methods can be used to perform fabrication within enclosed microfluidic networks. It is also difficult to change or remove existing microstructures within these networks. In this study, a magnetic-beads-based approach is presented to build microstructures in enclosed microfluidic networks. Electromagnetic field generated by microfabricated conducting wires (coils) is used to manipulate and trap magnetic beads on the bottom surface of a microchannel. These trapped beads are accumulated to form a microscale pile with desired shape, which can adjust liquid flow, dock cells, modify surface, and do some other things as those fabricated microstructures. Once the electromagnetic field is changed, trapped beads may form new shapes or be removed by a liquid flow. Besides being used in microfabrication, this magnetic-beads-based method can be used for novel microfluidic manipulation. It has been validated by forming microscale dam structure for cell docking and modified surface for cell patterning, as well as guiding the growth of neurons.     

Spatially Resolved Bottom‐Side Fluorination of Graphene by Two‐Dimensional Substrate Patterning

Patterned functionalization can, on the one hand, open the band gap of graphene and, on the other hand, program demanding designs on graphene. The functionalization technique is essential for graphene‐based nanoarchitectures. A new and highly efficient method was applied to obtain patterned functionalization on graphene by mild fluorination with spatially arranged AgF arrays on the structured substrate. Scanning Raman spectroscopy (SRS) and scanning electron microscopy coupled with energy‐dispersive X‐ray spectroscopy (SEM‐EDS) were used to characterize the functionalized materials. For the first time, chemical patterning on the bottom side of graphene was realized. The chemical nature of the patterned functionalization was determined to be the ditopic scenario with fluorine atoms occupying the bottom side and moieties, such as oxygen‐containing groups or hydrogen atoms, binding on the top side, which provides information about the mechanism of the fluorination process. Our strategy can be conceptually extended to pattern other functionalities by using other reactants. Bottom‐side patterned functionalization enables utilization of the top side of a material, thereby opening up the possibilities for applications in graphene‐based devices.