电子束流品质对自由电子激光小信号增益影响的计算

对电子束有一定初始能量分散或角度分散时的自由电子激光小信号增益用较简便的方法进行了分析计算,并给出了一个渐近公式,结果与用计算机模拟解自由电子激光微分方程组得到的结果一致。     

Calculation of heat transfer and uniformity of chemical amplification during post-exposure bake

Heat transfer in a resist-coated silicon wafer using a bake process is theoretically evaluated by modeling the three-dimensional diffusion process, focusing on the controllability of the lithographic performance of chemically amplified resists. Six models of various ambient conditions are used. The proximity gap between the hotplate and the wafer is found to have a dominant influence on the heat transfer process for the whole system. Because the atmosphere near the wafer acts as a thermal diffusion buffer layer, no temperature gradient occurs in the resist, even when it is subjected to convective heat transfer from the resist surface. Experimental results obtained by X-ray lithography confirm the calculation results.     

激光等离子体软X射线接近式光刻术初步研究

描述了用高功率脉冲激光打靶产生的等离子体作为软Ｘ射线源而进行的接近式软Ｘ射线光刻研究，采用负性辐射线光刻胶聚氯甲基苯乙烯，得到了一些新的实验结果。     

Exposure Simulation Model for Chemically Amplified Resists

In this study, after Dill’s model is discussed for transmittance and refractive indices of the non-chemically amplified resists, G- and I-line novolak resists, and the chemically amplified resists, a modification of Dill’s model as a new exposure model is introduced. The simulation results obtained using this new model with the multi-thin film interface method and the Berning theory have shown a good matching to the experimental data. Also, the simulated transmittance change due to the exposure parameters are used to analyze the influence of the coefficients on the transmittance.     

电功率20 GW重复频率强流电子束二极管研究

采用静电场模拟对二极管结构及导引磁场位形分布进行了优化设计，并在20GW脉冲功率源上进行了重复频率运行实验研究，二极管输出电子束电压超过1MV，电流达20kA，脉冲宽度45ns，重复频率100Hz，达到了设计指标.     

一种新型微透镜阵列成象式投影光刻系统的研究

从理论和实验两方面入手,系统地研究了微透镜阵列的形成原理和制作工艺,分析了微透镜阵列的面形结构,得到了联系微透镜阵列矢高与制作工艺参量的经验公式.并且将四片微透镜阵列耦合,形成一个深紫外光刻的1:1成象的多孔径微小光刻系统.从几何光学理论出发,分析了这个光刻系统综合成象的特点,讨论了这种光刻系统的光学性能,并给出了实验测量方法.     

毛细管放电X光激光装置中的预脉冲电源

针对目前毛细管放电X 光激光装置产生的预脉冲电流幅值过大、持续时间较短的问题，提出了增加预脉冲开关抑制原有预脉冲，再外加由脉冲成形网络组成的预脉冲发生器，产生所需预脉冲的改造方案。可在主脉冲来临之前产生幅度10~50A，持续时间约17μs的方波预脉冲电流，来满足毛细管放电泵浦类氖氩X光激光实验的需要。     

Thin-film electroluminescent emitters based on calcium sulfide doped with cerium

Stavropol' State Technical University, 2 Kulakov Av., Stavropol', 355000. Translated from Zhurnal Prikladnoi Spektroskopii, Vol. 62, No. 3, pp. 178–181, May–June, 1995.     

Acid-catalyzed deprotection mechanism of tert-butyloxycarbonyloxy polymers in chemically amplified resists

A mechanism of acid-catalyzed deprotection of poly(4-tert-butyloxycarbonyloxy-styrene), PBOCST, in chemically amplified resists has been elucidated in terms of elementary processes by means of semiempirical molecular orbital calculations. It is concluded that the overall deprotection of tert-butyloxycarbonyl (t-BOC) group proceeds stepwise; i.e., (a) the first products are an acid carbonate and a tert-butyl cation; (b) a phenolic compound is the secondary and final product from the acid carbonate, which is realized by assistance with a counter anion accompanied by acid; (c) the counter anion also assists acid regeneration from the tert-butyl cation to produce isobutylene. The yield rate of the phenol is proportional to the product of concentrations of the polymer, the catalytic acid, and the counter anion. The activation energy (21 kcal/mol) calculated for the rate-determining step (a) is in good agreement with an experiment. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 1035–1042, 1998     

Photogenerated base in polymer curing and imaging: Design of reactive styrenic copolymers susceptible to a base-catalyzed β-elimination

A novel family of functionalized styrenic copolymers that are susceptible to a base-catalyzed β-elimination reaction is reported. The reactive copolymers, poly-{(2-phenyl-2-cyanoethoxycarbonyloxystyrene)-co-(4-hydroxystyrene)}, are prepared by chemical modification of poly(4-hydroxystyrene) using 2-phenyl-2-cyanoethyl chloroformate. A photoresist material consisting of the copolymer and bis[[(2-nitrobenzyl)-oxy] carbonyl]-4,4′-trimethylenedipiperidine used as an amine photogenerator affords positive tone images by UV irradiation. The effect of copolymer structure and composition on imaging, thermal stability, and the ease of β-elimination reaction is discussed. © 1997 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 35 : 3543–3552 1997