Summary: A simple lithographic process in conjunction with a novel biocompatible nonchemically amplified photoresist material was successfully used for cell patterning. UV light irradiation on selected regions of the nonchemically amplified resist film renders the exposed regions hydrophilic by the formation of carboxylic groups. Mouse fibroblast cells were found to be preferentially aligned and proliferated on the UV light exposed regions of the nonchemically amplified resist film where carboxylic groups were present.
Schematic representation of the simplified lithographic process used for cell patterning. 相似文献
A novel top‐surface imaging process was successfully established using selective chemisorption of amine‐functionalized poly(dimethyl siloxane) onto the carboxylic groups formed on the surface of diazoketo‐functionalized polymer film by UV light irradiation. The chemisorbed poly(dimethyl siloxane) worked as an efficient etch mask for the subsequent oxygen plasma etching process for pattern generation. High‐resolution patterns were resolved with the new imaging process.
Summary: Photobleachable deep UV resists were designed by introducing diazoketo groups in polymer side chains. The diazoketo groups undergo the Wolff rearrangement upon irradiation in the deep UV, affording ketenes that react with water to provide base‐soluble photoproducts. The polymers were synthesized by radical copolymerization of 2‐(2‐diazo‐3‐oxo‐butyryloxy)‐ethyl methacrylate, 2‐hydroxyethyl methacrylate, and γ‐butyrolacton‐2‐yl methacrylate. The single component resist showed 0.7 µm line and space patterns using a mercury‐xenon lamp in a contact printing mode.
Scanning electron micrograph of 0.7 µm line and space patterns printed with polymer B at a dose of 70 mJ · cm−2. 相似文献