Chlor-, Brom- und Iodtrisilane: Synthesen und Si-Kernresonanzspektren

Halogenated trisilanes X_nSi₃H_8−n with X = Cl, Br, I and n = 2–7 as well as the tetrasilanes H₂XSiSiX₂SiX₂SiX₂H have been prepared by dearylation of appropriate aryltrisilanes and aryltetrasilanes (aryl = phenyl, p-tolyl) with either liquid or gaseous hydrogen halides. The compounds have been characterized with elemental analysis as well as ²⁹Si NMR spectroscopy.     

Reactions of trimethylsiloxychlorosilanes with lithium metal - On the mechanism of the formation of trimethylsiloxysilyllithium compounds LiSiRR’(OSiMe3)

The reaction pathway for the formation of the trimethylsiloxysilyllithium compounds (Me₃SiO)RR′SiLi (2a: R = Et, 2b: R = ⁱPr, 2c: R = 2,4,6-Me₃C₆H₂ (Mes); 2a-c: R′ = Ph; 2d: R = R′ = Mes) starting from the conversion of the corresponding trimethylsiloxychlorosilanes (Me₃SiO)RR′SiCl (1a-d) in the presence of excess lithium in a mixture of THF/diethyl ether/n-pentane at −110 °C was investigated.The trimethylsiloxychlorosilanes (Me₃SiO)RPhSiCl (1a: R = Et, 1b: R = ⁱPr, 1c: R = Mes) react with lithium to give initially the trimethylsiloxysilyllithium compounds (Me₃SiO)RPhSiLi (2a-c). These siloxysilyllithiums 2 couple partially with more trimethylsiloxychlorosilanes 1 to produce the siloxydisilanes (Me₃SiO)RPhSi-SiPhR(OSiMe₃) (Ia-c), and they undergo bimolecular self-condensation affording the trimethylsiloxydisilanyllithium compounds (Me₃SiO)RPhSi-RPhSiLi (3a-c). The siloxydisilanes I are cleaved by excess of lithium to give the trimethylsiloxysilyllithiums (Me₃SiO)RPhSiLi (2). In the case of the two trimethylsiloxydisilanyllithiums (Me₃SiO)RPhSi-RPhSiLi (3a: R = Et, 3b: R = ⁱPr) a reaction with more trimethylsiloxychlorosilanes (Me₃SiO)RPhSiCl (1a, 1b) takes place under formation of siloxytrisilanes (Me₃SiO)RPhSi-RPhSi-SiPhR(OSiMe₃) (IIa: R = Et, IIb: R = ⁱPr) which are cleaved by lithium to yield the trimethylsiloxysilyllithiums (Me₃SiO)RPhSiLi (2a, 2b) and the trimethylsiloxydisilanyllithiums (Me₃SiO)RPhSi-RPhSiLi (3a, 3b). The dimesityl-trimethylsiloxy-silyllithium (Me₃SiO)Mes₂SiLi (2d) was obtained directly by reaction of the trimethylsiloxychlorosilane (Me₃SiO)Mes₂SiCl (1d) and lithium without formation of the siloxydisilane intermediate. Both silyllithium compounds 2 and 3 were trapped with HMe₂SiCl giving the products (Me₃SiO)RR′Si-SiMe₂H and (Me₃SiO)RPhSi-RPhSi-SiMe₂H.     

Synthesis and characterisation of two new binaphthyl trisilanes

The synthesis and characterisation of two binaphthyl trisilanes is described. Reaction between 2,2′-dilithio-1,1′-binaphthyl and 1,3-dichlorohexamethyltrisilane gave 3,3,4,4,5,5-hexamethyl-4,5-dihydro-3H-3,4,5-trisilacyclohepta[2,1-a;4,3-a′]binaphthalene (3). Compound 3 was characterised by ¹H, ¹³C and ²⁹Si NMR spectroscopy and a crystal structure analysis. Reaction between 2,2′-dilithio-1,1′-binaphthyl and 1,3-bis(trifluoromethanesulfonyloxy)-1,1,2,3,3-pentamethyltrisilane, generated in situ by treatment of 1,3-diphenyl-1,1,2,3,3-pentamethyltrisilane with trifluormethanesulfonic acid, gave 3,3,4,5,5-pentamethyl-4,5-dihydro-3H-3,4,5-trisilacyclohepta[2,1-a;4,3-a′]binaphthalene (7). Analysis by ¹H, ¹³C and ²⁹Si NMR spectroscopy revealed that 7 had a very similar structure to 3.     

Substituted lithiumtrimethylsiloxysilanides LiSiRR′(OSiMe3) - Investigations of their synthesis, stability and reactivity

The reactions of the trimethylsiloxychlorosilanes (Me₃SiO)RR′SiCl (1a-h: R′ = Ph, 1a: R = H, 1b: R = Me, 1c: R = Et, 1d: R = ⁱPr, 1e: R = ^tBu, 1f: R = Ph, 1g: R = 2,4,6-Me₃C₆H₂ (Mes), 1h: R = 2,4,6-(Me₂CH)₃C₆H₂ (Tip); 1i: R = R′ = Mes) with lithium metal in tetrahydrofuran (THF) at −78 °C and in a mixture of THF/diethyl ether/n-pentane in a volume ratio 4:1:1 at −110 °C lead to mixtures of numerous compounds. Dependent on the substituents silyllithium derivatives (Me₃SiO)RR′SiLi (2b-i), Me₃SiO(RR′Si)₂Li (3a-g), Me₃SiRR′SiLi (4a-h), (LiO)RR′SiLi (12e, 12g-i), trisiloxanes (Me₃SiO)₂SiRR′ (5a-i) and trimethylsiloxydisilanes (6f^∗, 6h^∗, 6i^∗) are formed. All silyllithium compounds were trapped with Me₃SiCl or HMe₂SiCl resulting in the following products: (Me₃SiO)RR′SiSiMe₂R″ (6b-i: R″ = Me, 7c-i: R″ = H), Me₃SiO(RR′Si)₂SiMe₂R″ (8a-g: R″ = Me, 9a-g: R″ = H), Me₃SiRR′SiSiMe₂R″ (10a-h: R″ = Me, 11a-h: R″ = H) and (HMe₂SiO)RR′SiSiMe₂H (13e, 13g-i). The stability of trimethylsiloxysilyllithiums 2 depends on the substituents and on the temperature. (Me₃SiO)Mes₂SiLi (2i) is the most stable compound due to the high steric shielding of the silicon centre. The trimethylsiloxysilyllithiums 2a-g undergo partially self-condensation to afford the corresponding trimethylsiloxydisilanyllithiums Me₃SiO(RR′Si)₂Li (3a-g). (Me₃)Si-O bond cleavage was observed for 2e and 2g-i. The relatively stable trimethylsiloxysilyllithiums 2f, 2g and 2i react with n-butyllithium under nucleophilic butylation to give the n-butyl-substituted silyllithiums ⁿBuRR′SiLi (15g, 15f, 15i), which were trapped with Me₃SiCl. By reaction of 2g and 2i with 2,3-dimethylbuta-1,3-diene the corresponding 1,1-diarylsilacyclopentenes 17g and 17i are obtained.X-ray studies of 17g revealed a folded silacyclopentene ring with the silicon atom located 0.5 Å above the mean plane formed by the four carbon ring atoms.