排序方式: 共有5条查询结果,搜索用时 15 毫秒
1
1.
Emad Yousif Emaad Bakir Jumat Salimon Nadia Salih 《Journal of Saudi Chemical Society》2012,16(3):279-285
The photostabilization of poly(methyl methacrylate) (PMMA) films by Schiff bases of 2,5-dimercapto-1,3,4-thiadiazole compounds was investigated. The PMMA films containing concentration of complexes 0.5% by weight were produced by the casting method from chloroform solvent. The photostabilization activities of these compounds were determined by monitoring the hydroxyl index with irradiation time. The changes in viscosity average molecular weight of PMMA with irradiation time were also tracked (using benzene as a solvent). The quantum yield of the chain scission (Φcs) of these complexes in PMMA films was evaluated and found to range between 4.19 × 10?5 and 8.75 × 10?5. Results obtained showed that the rate of photostabilization of PMMA in the presence of the additive followed the trend:[1] > [2] > [3] > [4] > [5].According to the experimental results obtained, several mechanisms were suggested depending on the structure of the additive. Among them, UV absorption, peroxide decomposer, and radical scavenger for photostabilizer mechanisms were suggested. 相似文献
2.
3.
4.
5.
A new kind of photostabilizers, eopolymer of 2, 2, 6, 6-tetramethyl-4-piperidinyl methacrylate and β-hydroxy-γ-(ortho-hydroxy benzoxy) propyl methacrylate, has been synthesized. The spectral behaviors of these copolymers were studied in detail. In the presence of salicylyl group a strong absorption in the region of 280—330 nm could be observed, and an unusual Stoke's shift appeared in the fluorescence spectrum excited by 310nm. The photostabilization ability of these copolymers in the process of photodegradation of cis-poly (butadiene) was studied. Results indicated that these compounds possess excellent photostabilization ability. 相似文献
1