Untersuchungen zum Verhalten der Pt-Metalle gegenüber festen und flüssigen Kationenaustauschern mit Hilfe der Radiotracermethode

Mit Hilfe radioaktiver Nuklide wurde die Aufnahme der Pt-Metalle aus chloridhaltigen Lösungen sowoht durch feste (Wofatit KPS) als auch durch flüssige Kationenaustauscher (Bis-2-äthylhexylphosphorsäure) bei Variation des pH-Wertes, der Vorbehandlung sowie der Edelmetallkonzentration bestimmt. Pt und Ir wurden nur geringfügig, Pd und Rh dagegen deutlich stärker adsorbiert. Beide Austauschertypen zeigten qualitativ das gleiche Verhalten. Die gefundenen Abhängigkeiten der Adsorption wurden auf das komplexchemische Verhalten der Pt-Metalle zurückgeführt. Es werden Verfahren zur schnellen radiochemischen Reinigung der benutzten Nuklide angegeben.     

Imaging Photodissociation Dynamics of MgO at 193 nm

In this work, we used time-sliced ion velocity imaging to study the photodissociation dynamics of MgO at \mbox{193 nm}. Three dissociation pathways are found through the speed and angular distributions of magnesium. One pathway is the one-photon excitation of MgO(X\begin{document}$^1\Sigma^+$\end{document}) to MgO(G\begin{document}$^1\Pi$\end{document}) followed by spin-orbit coupling between the G\begin{document}$^1\Pi$\end{document}, 3\begin{document}$^3\Pi$\end{document} and 1\begin{document}$^5\Pi$\end{document} states, and finally dissociated to the Mg(\begin{document}$^3$\end{document}P\begin{document}$_\textrm{u}$\end{document})+O(\begin{document}$^3$\end{document}P\begin{document}$_\textrm{g}$\end{document}) along the 1\begin{document}$^5\Pi$\end{document} surface. The other two pathways are one-photon absorption of MgO(A\begin{document}$^1\Pi$\end{document}) state to MgO(G\begin{document}$^1\Pi$\end{document}) and MgO(4\begin{document}$^1\Pi$\end{document}) state to dissociate into Mg(\begin{document}$^3$\end{document}P\begin{document}$_\textrm{u}$\end{document})+O(\begin{document}$^3$\end{document}P\begin{document}$_\textrm{g}$\end{document}) and Mg(\begin{document}$^1$\end{document}S\begin{document}$_\textrm{g}$\end{document})+O(\begin{document}$^1$\end{document}S\begin{document}$_\textrm{g}$\end{document}), respectively. The anisotropy parameters of the dissociation pathways are related to the lifetime of the vibrational energy levels and the coupling of rotational and vibronic spin-orbit states. The total kinetic energy analysis gives \begin{document}$D_0$\end{document}(Mg\begin{document}$-$\end{document}O)=21645\begin{document}$\pm$\end{document}50 cm\begin{document}$^{-1}$\end{document}.     

Exposure Simulation Model for Chemically Amplified Resists

In this study, after Dill’s model is discussed for transmittance and refractive indices of the non-chemically amplified resists, G- and I-line novolak resists, and the chemically amplified resists, a modification of Dill’s model as a new exposure model is introduced. The simulation results obtained using this new model with the multi-thin film interface method and the Berning theory have shown a good matching to the experimental data. Also, the simulated transmittance change due to the exposure parameters are used to analyze the influence of the coefficients on the transmittance.     

193 nm氟化物增透膜的特性

 为了研制低损耗、高性能的193 nm氟化物增透膜,研究了基底和不同氟化物材料组合对氟化物增透膜的影响。在熔石英基底上,将挡板法和预镀层技术相结合,采用热舟蒸发方式制备了不同氟化物材料组合增透膜,对增透膜的剩余反射率和光学损耗等光学特性,以及表面粗糙度和应力等特性进行了测量和比较。在分析比较和优化的基础上,设计制备的3层1/4波长规整膜系AlF3/LaF3增透膜在193 nm的剩余反射率低于0.14%,单面镀膜增透膜的透射率为93.85%,增透膜表面均方根粗糙度为0.979 nm,总的损耗约为6％。要得到高性能的193 nm增透膜,应选用超级抛光基底。     

The kinetics of a negative‐tone acrylic photoresist for 193‐nm lithography

Polymethacrylates with tert‐alcohol ester were synthesized as negative‐tone chemical amplification photoresists (CAMPs) for 193‐nm microlithography. The acid‐catalyzed dehydration reaction of the CAMPs was analyzed via Fourier transform infrared. The crosslinking behavior following the dehydration reaction of the exposed CAMPs made it possible for them to be used as negative‐tone photoresists. During the postexposure‐baking process of the resists, the decay of the active proton concentration due to the evaporation and trapping of the active acid was lumped to a time constant (τ). Kinetic studies revealed this dehydration reaction was the first order to the hydroxy group and proton concentration. The introduction of the isobornyl methacrylate monomer into the resists produced a higher glass‐transition temperature as well as a higher reactive ion etching resistance. The lithographic performance was investigated by use of isopropyl alcohol as a developer under various processing conditions. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 954–961, 2000     

Positive solutions for one-dimensional -Laplacian boundary value problems with sign changing nonlinearity

This paper deals with the existence of positive solutions for the one-dimensional p-Laplacian

subject to the boundary value conditions:

where _p(s)=|s|^p−2s,p>1. We show that it has at least one or two positive solutions under some assumptions by applying the fixed point theorem. The interesting points are that the nonlinear term f is involved with the first-order derivative explicitly and f may change sign.     

193 nm激光引发PET表面的化学接枝

将聚对苯二甲酸乙二醇酯[Poly(ethylene terephthalate), PET]材料置于氨气气氛中, 利用激光光子同时激发材料表面及氨气形成自由基, 用激光引发反应并促进氨基在材料表面的接枝. 改性后的测试结果表明, 材料表面粗糙度没有显著变化, 但水接触角的减小表明表面化学结构发生了某种变化. 傅里叶变换红外光谱(FTIR/ATR)图谱在3352和1613 cm-1处出现了新的氨基吸收峰, 证实了表面接枝了氨基. 同时X射线光电子能谱(XPS)也证明了材料表面C—N键的存在, 其C1s结合能为285.5 eV, N1s为398.9 eV. 飞行时间二次离子质谱(Tof-SIMS)也检测到含氨基的分子碎片, 其碎片成像图显示接枝仅发生在激光辐照部位. 实验结果表明, 激光能在生物材料表面进行局部区域的选择性接枝.     

Spanning trails containing given edges

A graph G is Eulerian-connected if for any u and v in V(G), G has a spanning (u,v)-trail. A graph G is edge-Eulerian-connected if for any e^′ and e^″ in E(G), G has a spanning (e^′,e^″)-trail. For an integer r?0, a graph is called r-Eulerian-connected if for any X⊆E(G) with |X|?r, and for any , G has a spanning (u,v)-trail T such that X⊆E(T). The r-edge-Eulerian-connectivity of a graph can be defined similarly. Let θ(r) be the minimum value of k such that every k-edge-connected graph is r-Eulerian-connected. Catlin proved that θ(0)=4. We shall show that θ(r)=4 for 0?r?2, and θ(r)=r+1 for r?3. Results on r-edge-Eulerian connectivity are also discussed.     

Effect of energy addition on MR $\rightarrow$ RR transition

A combined computational and experimental study was performed to investigate the effect of a single laser energy pulse on the transition from a Mach Reflection (MR) to a Regular Reflection (RR) in the Dual Solution Domain (DSD). The freestream Mach number is 3.45 and two oblique shock waves are formed by two symmetric 193_2003_Article_198_TeX2GIFEqu2.gif" alt="$22^\circ$" align="middle" border="0"> wedges. These conditions correspond to a point midway within the DSD wherein either an MR or an RR is possible. A steady MR was first obtained experimentally and numerically, then a single laser pulse was deposited above the horizontal center plane. In the experiment, the laser beam was focused resulting in a deposition volume of approximately 3 mm³, while in the simulation, the laser pulse was modeled as an initial variation of the temperature and pressure using Gaussian profile. A grid refinement study was conducted to assess the accuracy of the numerical simulations. For the steady MR, the simulation showed the variation of Mach stem height along the span due to side effects. The predicted spanwise averaged Mach stem height was 1.96 mm within 2% of the experimental value of 2 mm. The experiment showed that the Mach stem height decreased to 30% of its original height due to the interaction with the thermal spot generated by the laser pulse and then returned to its original height by 193_2003_Article_198_TeX2GIFEqu3.gif" alt="$300\;\mu$" align="middle" border="0"> s. That the Mach stem returned to its original height was most likely due to freestream turbulence in the wind tunnel. The numerical simulation successfully predicted the reverse transition from a stable MR to a stable RR and the stable RR persisted across the span. This study showed the capability of a laser energy pulse to control the reverse transition of MR 193_2003_Article_198_TeX2GIFEqu4.gif" alt="$\rightarrow$" align="middle" border="0"> RR within the Dual Solution Domain.     

New fluoropolymer materials

We report the synthesis of two classes of fluoropolymers that could impact several key lithographic techniques; one has potential applications in next generation photolithography (193 nm, 157 nm, and immersion lithography) and the other in lithographic techniques which are emerging as viable alternatives to photolithography for future applications (i.e., soft lithography).