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Influences of Thalliation on the Morphology and Critical Temperature of Tl2Ba2CaCu2O8 Thin Films 下载免费PDF全文
Tl2Ba2CaCu2Ox(Tl-2212) thin films were prepared by the two-step technique.A precursor film was first prepared by the pulsed laser deposition method,and then experienced the incorporation of thalliation in a one-step or two-step annealing process.The experimental results show that the two-step annealing process produces dense and smooth films,and that the one-step annealing process produces a high critical temperature film of 101K,but the transition width is wide.Precursor films with homogeneous Ba2Ca1.3Cu2.1Ox composition are essential for producing high-quality Tl-2212 films. 相似文献
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YBa2Cu3O7-δ and Tl2Ba2CaCu2O8 thin films for microwave filters were synthesized by pulsed laser deposition and the two-step thalliation process. Substrate
quality requirements and the relation of thin film morphology, microstructure with microwave surface resistance were discussed. 相似文献
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我们研究了Tl-2212超导薄膜在带有YSZ/CeO2缓冲层和带有CeO2/YSZ/CeO2缓冲层的Ni金属RABiTS基带上的生长情况.基带上的缓冲层是采用PLD方法制备的,Tl-2212薄膜的制备采用了磁控溅射和后热处理两步方法.XRD 实验结果表明,Tl-2212薄膜都具有很好的C轴垂直于膜面的织构,并具有双向外延生长特性.在CeO2/YSZ/CeO2/Ni基带上制作的Tl-2212薄膜的Tc达到102.8 K,Jc(77 K,0 T)达到2.6 MA/cm2;在YSZ/CeO2/Ni基带上薄膜Tc可达97.7 K,Jc(77 K,0 T)也可以达到0.45 MA/cm2. 相似文献
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Fabrication and Properties of Double-Side Tl2Ba2CaCu2O8 Thin Film on CeO2 Buffered Sapphire Substrate 下载免费PDF全文
The double-side Tl2Ba2 CaCu2O8 (Tl-2212) superconducting thin films were fabricated on CeO2 buffered sapphire substrates. The reactive magnetron sputtering technique was used to grow CeO2 buffer thin films on sapphire substrates. Making use of the metal cerium as a sputtering source, the depositing rate is much higher compared with the CeO2 target. The Ti-2212 thin films on CeO2 buffered sapphire substrates were fabricated by adc magnetron sputtering and post-annealing process. The x-ray diffraction indicates that the thin film is pure Tl-2212 phase with the e-axis perpendicular to the substrate surfaces, and epitaxially grown on the CeO2 buffered sapphire. The critical transition temperature Tc is around 106K, the critical current density Jc is around 3.5 MA/cm^2 at 77K, and the microwave surface resistance R8 at 77K and 10 CHz of the film is as low as 390μ Ω. 相似文献
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为了降低现有内部模板攻击的数据复杂度并提高攻击成功率,提出了一种内部模板攻击改进算法.对内部模板攻击算法进行了两点改进:一是在模板匹配分析阶段,提出了一种基于等级相关性的模板匹配策略,利用功耗曲线电压值的相对排名,提高了单个密钥片段恢复的局部成功率;二是在密钥恢复阶段,提出了一种基于校验方程的密钥恢复方法,利用冗余信息来修正猜测多个密钥片段的概率分布,提高了多密钥片段恢复的全局成功率.以8位微控制器上的LED(轻型加密设备)密码功耗旁路分析为例,开展了攻击验证实验.结果表明:改进后的算法提高了匹配的区分度,降低了攻击所需功耗曲线数量,仅需要50条功耗曲线即可使攻击的全局成功概率接近100%. 相似文献