玉米酒糟为主要氮源的Nisin生产菌株的诱变选育

为使乳酸乳球菌适应玉米酒糟作为发酵生产乳酸链球菌素(Nisin)的主要氮源,首先对培养基进行了初步优化,发现在酒糟清液中加入蔗糖、酵母膏和磷酸氢二钾明显促进了乳酸乳球菌的生长.在此基础上,使用等离子体对乳酸乳球菌进行诱变处理,利用24方孔深孔板技术可实现对高产Nisin突变菌株的选择性筛选.结果表明,诱变菌株在只有5.0%存活率时,得到的正突变菌株可达26.2%.借助摇瓶发酵实验对其生产Nisin的发酵水平进行研究,发现有1株诱变选育菌株发酵Nisin的活性高达6 520 U/mL,并且其发酵能力比诱变起始菌株能力更强.     

Moisture absorption characteristics of a SiO2 film from 2 to 3 μm

We prepare SiO2 coatings on different substrates by either electron-beam evaporation or dual ion-beam sputtering. The relative transmittances of the Si O2 coatings are measured during the heating process. The Si O2 coating microstructures are studied. Results indicate that the intensity and peak position of moisture absorption are closely related to the microstructures of the coatings. The formation of microstructures depends not only on the preparation process of the coatings but also on the substrate characteristics.     

CO氧化反应中H2O对MOx和Au/MOx催化性能的影响

过渡金属氧化物［1,2］及负载型贵金属催化剂［3～13］是催化氧化消除CO的有效催化剂,一直是研究的热点. 虽然对MOx和Au/MOx上CO的氧化性能研究得较多,但大多是在无水条件下进行的;涉及催化剂抗水性能的报道较少［3,9,10］,且仅限于对催化剂活性的研究. Haruta等［3］对Au/Fe2O3,Au/Co3O4和Au/TiO 2等体系开展了一些工作, 认为水对CO氧化活性有促进作用. 本文重点考察了水对MOx(M=Al,Ca,Co,Cr,Cu,Fe,La,Mn,Ni和Zn)催化剂上CO氧化活性的影响,以及水对Au/MOx 催化剂活性及稳定性的影响.     

沉积温度对LaF3薄膜性能的影响

 在189，255，277和321 ℃的沉积温度下用热舟蒸发方法制备了LaF₃薄膜。通过X射线衍射(XRD)测试了薄膜的晶体结构;采用分光光度计测量了薄膜的透射光谱，并计算得到样品的折射率、消光系数和截止波长;利用光学干涉仪测试得到了薄膜的残余应力;采用三倍频Nd:YAG脉冲激光测试了薄膜的激光损伤阈值。结果表明：随沉积温度的提高，LaF₃薄膜的结晶状况明显变好，晶粒尺寸逐渐变大；膜层变得更加致密，折射率变大，然而薄膜吸收变得严重，截止波段向长波漂移，同时薄膜的残余应力也增加，内应力在薄膜的残余应力中起着决定作用；薄膜的激光损伤阈值在高温制备时相对较高。     

硒化锌衬底表面仿生宽带增透微结构的设计及制作

采用时域有限差分法研究了硒化锌基底的抛物线型周期阵列仿生微结构的光学性质,重点分析了微结构阵列的周期、高度、占空比和形状轮廓等对反射率的影响,得到了有较好增透效果的结构参数。根据模拟参数进行两次干涉曝光制备掩模,采用反应离子刻蚀技术制备周期阵列微结构。通过场发射扫描电子显微镜对微结构的表面形貌进行表征,并采用傅里叶变换红外光谱仪在中红外波段分别对双面抛光、单面微结构的硒化锌片进行透过率测试。结果表明:单面微结构样品在2~5μm范围内的整体平均透过率比双面抛光硒化锌基片提高了10%,在2.3μm处的最大透过率为82%。     

焦炭中磷的测定(大量硅、钛存在下)

煤灰中的微量磷,一般采用灵敏度较高的钼兰比色法测定,在硅存在下,国家标准推荐以氢氟酸—高氯酸驱硅后完成测定;例行分析则以盐酸—高氯酸发烟浸提磷并使硅脱水,这样测得的结果,由于磷浸提不完全而系统偏低,而硅却使结果偏高。在适量硅存在下,由于两者的相互补偿而结果接近真实。然而高于50%以上的硅时,测定便     

Effects of annealing time on the structure,morphology, and stress of gold–chromium bilayer film

In this work, a 200-nm-thick gold film with a 10-nm-thick chromium layer used as an adhesive layer is fabricated on fused silica by the electron beam evaporation method. The effects of annealing time at 300℃ on the structure, morphology and stress of the film are studied. We find that chromium could diffuse to the surface of the film by formatting a solid solution with gold during annealing. Meanwhile, chromium is oxidized on the surface and diffused downward along the grain grooves in the gold film. The various operant mechanisms that change the residual stresses of gold films for different annealing times are discussed.     

三倍频分光膜在1064 nm的破斑特性研究

采用电子束蒸发方式制备了两种不同材料组合的分光膜,分别对其在波长1064 nm激光辐照下的损伤阈值进行了测试,用Alpha-Step 500台阶仪对破斑进行了深度测量。实验结果表明,破斑呈现出表面层的剥落和深坑破坏两种形态。表面层的剥落深度在一定范围内不随能量密度的变化而变化;深坑破坏深浅不一,是膜内缺陷融化、汽化及喷发的综合作用的结果,是损伤阈值降低的主要原因。     

PbTiO3铁电薄膜的应力与尺寸效应

用推广的Landau Devonshire理论研究了应力与尺寸效应对PbTiO3(PTO)薄膜的铁电/介电性质的影响.研究表明:在外推长度δ>0时,张应力使膜的相变温度降低、自发极化减小,压应力使膜的相变温度升高、自发极化增加.在温度一定时PTO薄膜存在一个临界应力σc,当应力大于σc时,任意膜厚都保持顺电相.当应力小于σc时,存在尺寸驱动的相变,即当膜厚大于临界尺寸Lc时,膜进入铁电相;而当膜厚小于临界尺寸Lc时,膜处于顺电相.     

Design and Fabrication of Chirped Mirror

Chirped mirrors （CMs） are designed and manufactured. The optimized CM provides a group delay dispersion （ODD） of around -60fs^2 and average reflectivity of 99.4% with bandwidth 200 nm at a central wavelength of 800nm. The CM structure consists of 52 layers of alternating high refractive index Ta2O5 and low refractive index SiO2. Measurement results show that the control of CM manufacturing accuracy can meet our requirement through time control with ion beam sputtering. Because the ODD of CMs is highly sensitive to small discrepancies between the layer thickness of calculated design and those of the manufactured mirror, we analyze the error sources which result in thickness errors and refractive index inhomogeneities in film manufacture.