Defocusing image to pattern contact holes using attenuated phase shift masks

The patterning of contact holes by selecting out-of-focus image plane (defocus) using attenuated phase shift masks (APSM) has been studied. Defocus is found to enhance the image modulation at low partial coherence for contact holes with negative local average of mask function. Semi-dense holes up to 130 nm in 8% APSM have been printed by 0.5 μm defocus at a partial coherence of 0.31 using KrF scanner with highest numerical aperture of 0.68. However, these holes were closed with in-focus imaging. Defocus is also found to be beneficial for patterning the pitches that have extensive side lobes with in-focus imaging.     

Fixed collision rate back-off scheme for collision resolution in wireless networks

This investigation proposes a fixed collision rate (FCR) back-off algorithm for wireless networks. The proposed scheme takes advantage of the central unit (CU) in a wireless network to broadcast a common back-off window size to all the users, significantly alleviating the unfairness of bandwidth utilization in conventional binary exponential back-off (BEB) algorithms. It is shown that, when maximum throughput is achieved, collision rate is almost a constant for any traffic load. In the operation of the FCR, the CU dynamically adjusts the back-off window size to keep the collision rate at a constant level for maximum throughput. Simulation results demonstrate that the unfairness of bandwidth utilization in the BEB is significantly lessened and the throughput can be maintained at e^-1≈0.368 when the number of users approaches infinity. The capture effect even further improves system performance.