排序方式: 共有29条查询结果,搜索用时 15 毫秒
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研究了丝阵Z箍缩等离子体内爆过程中单丝行为、物理参数匹配、X射线发射情况。根据丝阵Z箍缩等离子体动力学一维模型研制了相关的计算程序,对单丝的内爆过程进行了数值模拟,对丝阵箍缩匹配关系进行了计算,给出了丝阵初始半径、电流脉冲宽度和峰值电流的匹配关系,同时对丝阵内的最小丝间距、材料的选择等问题进行优化研究。 相似文献
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Thermal Properties of Materials Characterized by Scanning Electron-Acoustic Microscopy 总被引:1,自引:0,他引:1 下载免费PDF全文
A modified technique of scanning electron-acoustic microscopy is employed to determine thermal diffusivity of materials. Using the dependence of the electron-acoustic signal on modulation frequency of the electron beam, the thermal diffusivity of materials is characterized based on a simplified thermoelastic theory. The thermal diffusivities of several metals characterized by the modified scanning electron-acoustic microscopy are in good agreement with the referential values of the corresponding materials, which proves that the scanning electronacoustic microscopy can be used to characterize the thermal diffusivity of materials effectively. In addition, for micro-inhomogeneous materials, such as biological tissues, the macro-effective (average) thermal diffusivities are characterized by the technique. 相似文献
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Measurement accuracy analysis of the free carrier absorption determination of the electronic transport properties of silicon wafers 下载免费PDF全文
By introducing the random and systematic errors in simulated data computed from conventional frequency-scan and laterally resolved modulated free carrier absorption theory models, we investigate the relative determination sensitivities of three electronic transport properties, namely, carrier lifetime, carrier diffusivity and front surface recombination velocity of silicon wafers determined by frequency-scan and laterally resolved techniques. The phase and amplitude data with random errors as functions of the modulation frequency at zero pump-probe-beam separation or of the two-beam separation at four different modulation frequencies are simultaneously fitted to an appreciated carrier diffusion model to extract three transport parameters. The statistical results and fitted accuracies of the transport parameter determined by both techniques are theoretically analysed. Corresponding experimental results are carried out to compare to the simulated results. The simulated and experimental results show that the determination of the transport properties of silicon wafers by the laterally resolved technique are more accurate, as compared with that by the frequency-scan technique. 相似文献
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Differential nonlinear photocarrier radiometry for characterizing ultra-low energy boron implantation in silicon 下载免费PDF全文
Xiao-Ke Lei 《中国物理 B》2022,31(3):38102-038102
The measuring of the depth profile and electrical activity of implantation impurity in the top nanometer range of silicon encounters various difficulties and limitations, though it is known to be critical in fabrication of silicon complementary metal-oxide-semiconductor (CMOS) devices. In the present work, SRIM program and photocarrier radiometry (PCR) are employed to monitor the boron implantation in industrial-grade silicon in an ultra-low implantation energy range from 0.5 keV to 5 keV. The differential PCR technique, which is improved by greatly shortening the measurement time through the simplification of reference sample, is used to investigate the effects of implantation energy on the frequency behavior of the PCR signal for ultra-shallow junction. The transport parameters and thickness of shallow junction, extracted via multi-parameter fitting the dependence of differential PCR signal on modulation frequency to the corresponding theoretical model, well explain the energy dependence of PCR signal and further quantitatively characterize the recovery degree of structure damage induced by ion implantation and the electrical activation degree of impurities. The monitoring of nm-level thickness and electronic properties exhibits high sensitivity and apparent monotonicity over the industrially relevant implantation energy range. The depth profiles of implantation boron in silicon with the typical electrical damage threshold (YED) of 5.3×1015 cm-3 are evaluated by the SRIM program, and the determined thickness values are consistent well with those extracted by the differential PCR. It is demonstrated that the SRIM and the PCR are both effective tools to characterize ultra-low energy ion implantation in silicon. 相似文献
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�й�ITERʵ�����ģ���Ű�ȫ�������� 总被引:1,自引:1,他引:0
使用有限元分析方法,初步分析了中国ITER实验包层模块(CHHCSBTBM)在等离子体大破裂时的电磁安全特性。根据CHHCSBTBM设计结构建立了TBM及其子模块的电磁分析模型,模拟了等离子体大破裂情况下的电磁场边界条件,对CHHCSBTBM及其子模块进行了涡流、应力计算,得到了相应的感生涡流和应力分布。根据得到的应力分布,计算出在等离子体大破裂的不同时刻CHHCSBTBM及其子模块受到的电磁扭矩。用计算结果与材料的容许值相比较,确定了TBM设计的电磁安全性。 相似文献