基于FPGA的短波红外图像灰度级拉伸算法实现

为了增强短波红外成像仪的成像对比度,提高目标的识别率,介绍了一种基于现场可编程门阵列(FPGA)的灰度拉伸算法的实现方法。利用视频数据两帧之间灰度分布近似的特性,通过统计上一帧图像的灰度分布,计算图像拉伸所需要的参数,处理当前帧的图像,达到实时处理的效果。在灰度统计模块中,利用FPGA的片上块随机存储器(Block RAM)资源,采用非倍频的流水线数字逻辑设计,避免了跨时钟域的操作,降低了系统状态机的复杂度,提高了系统的工作频率。采用国产320×256元InGaAs面阵探测器,搭载了Xilinx Artix-7系列芯片的实验平台进行实验,仿真结果表明,该方法能有效提高短波红外图像的对比度,具有占用资源少、运算速度快、成本低、可移植性高等优点,满足短波红外成像仪实时灰度拉伸处理的设计要求。     

Properties of Strain Compensated Symmetrical Triangular Quantum Wells Composed of InGaAs/InAs Chirped Superlattice Grown Using Gas Source Molecular Beam Epitaxy

We investigate the properties of symmetrical triangular quantum wells composed of InGaAs/InAs chirped superlattice, which is grown by gas source molecular beam epitaxy via digital alloy method. In the quantum well structure tensile AlInGaAs are used as barriers to partially compensate for the significant compressive strain in the wells, the strain compensation effects are confirmed by x-ray measurement. The photoluminescence spectra of the sample are dominated by the excitonic recombination peak in the whole temperature range. The thermal quenching, peak energy shift and line-width broadening of the PL spectra are analysed in detail, the mechanisms are discussed.     

InP衬底上InAlAs异变缓冲层和高铟组分InGaAs的生长温度优化

利用气态源分子束外延技术在InP衬底上生长了包含InAlAs异变缓冲层的In0.83Ga0.17As外延层.使用不同生长温度方案生长的高铟InGaAs和InAlAs异变缓冲层的特性分别通过高分辨X射线衍射倒易空间图、原子力显微镜、光致发光和霍尔等测量手段进行了表征.结果表明, InAlAs异变缓冲层的生长温度越低, X射线衍射倒易空间图 (004) 反射面沿Qx方向的衍射峰半峰宽就越宽, 外延层和衬底之间的倾角就越大, 同时样品表面粗糙度越高.这意味着材料的缺陷增加, 弛豫不充分.对于生长在具有相同生长温度的InAlAs异变缓冲层上的In0.83Ga0.17As外延层, 采用较高的生长温度时, X射线衍射倒易空间图 (004) 反射面沿Qx方向的衍射峰半峰宽较小, 77K下有更强的光致发光, 但是表面粗糙度会有所增加.这说明生长温度提高后, 材料中的缺陷得到抑制.     

Optical properties of InGaAsBi/GaAs strained quantum wells studied by temperature-dependent photoluminescence

The effect of bismuth on the optical properties of InGaAsBi/GaAs quantum well structures is investigated using the temperature-dependent photoluminescence from 12 K to 450 K.The incorporation of bismuth in the InGaAsBi quantum well is confirmed and found to result in a red shift of photoluminescence wavelength of 27.3 meV at 300 K.The photoluminescence intensity is significantly enhanced by about 50 times at 12 K with respect to that of the InGaAs quantum well due to the surfactant effect of bismuth.The temperature-dependent integrated photoluminescence intensities of the two samples reveal different behaviors related to various non-radiative recombination processes.The incorporation of bismuth also induces alloy non-uniformity in the quantum well,leading to an increased photoluminescence linewidth.     

短波红外InGaAs／InP光伏探测器系列的研制

采用气态源分子束外延方法及应用有源区同质结构及较薄的组分渐变InxGa1-xAs缓冲层,研制了波长扩展的InGaAs/InP光伏探测器系列,其室温下的截止波长分别约为1.9μm,2.2μm.和2.5μm.对此探测器系列在较宽温度范围内的性能进行了细致表征,结果表明在室温下其R0A乘积分别为765,10.3和12.7Ωcm2,比室温降低100K时其暗电流和R0A可改善约3个量级.瞬态特性测量表明此探测器系列适合高速工作,实测响应速度已达数十ps量级.     

太周探测：从60年代四大天文发现说起(上)

介绍了高光谱用红外探测器的性能及使用情况,并将其与国外同类型高光谱红外探测器的关键指标(如信噪比、暗电流、读出噪声等)进行了对比测试分析。经过衬底去除工艺,短波探测器的光谱响应达到0.4~2.6 μm,平均量子效率超过75%,动态范围内响应线性度拟合曲线的R²值都大于 0.99,半阱信噪比可达到1600。该探测器的性能超过了国外报道的同类器件,满足我国高光谱应用需求。     

ICP刻蚀对光刻胶掩模及刻蚀图形侧壁的影响

采用AZ1500光刻胶作为掩模对GaAs和InP进行ICP刻蚀,研究了刻蚀参数对光刻胶掩模及刻蚀图形侧壁的影响。结果表明,光刻胶的碳化变性与等离子体的轰击相关,压强、ICP功率和RF功率的增加以及Cl2比例的减小都会加速光刻胶的碳化变性,Cl2/Ar比Cl2/BCl3更易使光刻胶发生变性。对于GaAs样品刻蚀,刻蚀气体中Cl2含量越高,刻蚀图形侧壁的横向刻蚀越严重。Cl2/BCl3对GaAs的刻蚀速率比Cl2/Ar慢,但刻蚀后样品的表面粗糙度比Cl2/Ar小。刻蚀InP时的刻蚀速率比GaAs样品慢,且存在图形侧壁倾斜现象。该工作有助于推动在器件制备工艺中以光刻胶作为掩模进行ICP刻蚀,从而提高器件制备效率。     

基于MIS电容器的Al2O3与In0.74Al0.26As的界面特性

采用In_0.74Al_0.26As/In_0.74Ga_0.26As/In_xAl_1-xAs异质结构多层半导体作为半导体层,制备了金属-绝缘体-半导体（MIS）电容器。其中,SiN_x和SiN_x/Al₂O₃分别作为MIS电容器的绝缘层。高分辨率透射电子显微镜和X射线光电子能谱的测试结果表明,与通过电感耦合等离子体化学气相沉积生长的SiN_x相比,通过原子层沉积生长的Al2_O3可以有效地抑制Al₂O₃和In_0.74Al_0.26As界面的In₂O₃的含量。根据MIS电容器的电容-电压测量结果,计算得到SiN_x/Al₂O₃/In...     

InGaAs/InP界面控制对InGaAs薄膜电学和光学性质 的影响

研究了全固态源分子束外延(MBE)生长InGaAs/InP异质结界面扩散对InGaAs外延薄膜电学和光学性质的影响.通过X射线衍射、变温霍尔测试和变温光致发光等方法对InGaAs薄膜样品进行细致研究.发现在InGaAs/InP界面之间插入一层利用As_4生长的InGaAs过渡层,能够显著改善上层InGaAs(利用As_2生长)外延薄膜的电学性能,其低温迁移率显著提高.同时荧光峰反常蓝移动消失,光学性质有所改善.研究表明利用As_4生长InGaAs过渡层,可显著降低As在InP中反常扩散,获得陡峭的InGaAs/InP界面,从而提高InGaAs材料电学和光学性能.     

Pulse Wavelength Scan of Room-Temperature Mid-Infrared Distributed Feedback Quantum Cascade Lasers for N2O Gas Detection

The tunable diode laser absorption spectroscopy under a pulse wavelength scan scheme is adapted to home-made room-temperature mid-infrared distributed feedback quantum cascade lasers; and identification of N2O spectral fingerprint is demonstrated experimentally. By driving the laser at 800ns pulse duration, a wave number tuning of about 1.6cm^-1 is produced, which make both 1289.04cm^-1 and 1289.86cm^-1 absorption fingerprints of N2O gas to be definitely assigned. The measured relative absorption intensity is consistent with the HITRAN data precisely.