中国企业如何应对美国关税法337条款调查

知识产权，特别是专利已成为国际知识经济竞争中的支柱。谁拥有的知识产权越多，谁占领的市场就越大，谁的获利能力也就越大，谁就越能在市场竞争中获胜。在高科技贸易方面一个非常引人注目的现象就是：美国厂商在拥有知识产权的前提下不断援引所谓337条款对外国厂商进行指控。     

X波段四路合成氮化镓功率放大器

本文利用自主研制的SiC 衬底的,栅宽为2.5mm的AlGaN/GaN HEMT器件,设计完成了X波段氮化镓合成固态放大器模块。模块由AlGaN/GaN HEMT器件,Wilkinson功率合成/分配器,偏置电路和微带匹配电路构成。为了使放大器稳定,在每一路放大器的输入端和输出端加入了RC 稳定网络,在栅极和直流输入之间加上稳定电阻,并且利用3/4 λ 枝接的威尔金森功率合成/分配器,从而有效消除其自激和低频串扰问题。在连续波条件下(直流偏置电压为Vds=27V,Vgs=-4.0V),放大器在8GHz频率下线性增益为5dB,最大效率为17.9%,输出功率最大可为42.93dBm,此时放大器增益压缩为3dB。四路合成放大器的合成效率是67.5%。通过分析,发现了放大器合成效率的下降是由每路放大器特性的不一致、功率合成网络的损耗以及电路制造误差所造成。     

Optimization and Finite Element Analysis of the Temperature Field in a Nitride MOCVD Reactor by Induction Heating

A susceptor structure with a ring channel for a vertical metalorganic chemical vapor deposition reactor by induction heating is proposed. Thus the directions of heat conduction are changed by the channel, and the channel makes the heat in the susceptor redistribute. The pattern of heat transfer in this susceptor is also analyzed. In addition, the location and size of the channel in the susceptor are optimized using the finite element method. A comparison between the optimized and the conventional susceptor shows that the optimized susceptor not only enhances the heating efficiency but also the uniformity of temperature distribution in the wafer, which contributes to improving the quality of the film growth.     

^（60）Co γ-rays irradiation effect in DC performance of AlGaN/GaN high electron mobility transistors

Unpassivated/passivated AlGaN/GaN high electron mobility transistors （HEMTs） were exposed to 1.25 MeV 60Co γ-rays at a dose of 1 Mrad（Si）. The saturation drain current of the unpassivated devices decreased by 15% at 1 Mrad γ-dose, and the maximal transconductance decreased by 9.1% under the same condition; more- over, either forward or reverse gate bias current was significantly increased, while the threshold voltage is relatively unaffected. By sharp contrast, the passivated devices showed scarcely any change in saturation drain current and maximal transconductance at the same γ dose. Based on the differences between the passivated HEMTs and un- passivated HEMTs, adding the C–V measurement results, the obviously parameter degradation of the unpassivated AlGaN/GaN HEMTs is believed to be caused by the creation of electronegative surface state charges in sourcegate spacer and gate–drain spacer at the low dose （1 Mrad）. These results reveal that the passivation is effective in reducing the effects of surface state charges induced by the 60Co γ-rays irradiation, so the passivation is an effective reinforced approach.     

星载氮化镓功率放大器设计

介绍了星载L波段高效固态功率放大器设计。放大器由EPC电源和射频链系统组成。电源主要提供射频电路和低频控制电路所需工作电压,同时接受母线控制指令以及遥测数据。射频链由驱动级、中功率放大器和高功率电路组成,同时还包括控制电路、检波电路、隔离器等。为了获得大功率和高效率,整机中高功率模块采用CREE公司的CGH40045氮化镓器件为放大单元,利用其大信号模型和ADS电路设计软件,采用L型阻抗变换网络,把输出阻抗的虚部电抗结合到输出匹配电路中,完成基波匹配和二次谐波的调谐。设计中还包括消除低频和射频振荡的电路。在连续波测试中,末级放大器模块在Vds为28V、Vgs为-2.8V、工作频率1.2GHz条件下,模块输出功率58W,效率68%,增益为19dB。在100MHz带宽内,增益平坦度小于0.8dB。放大器整机在1.15~1.25GHz范围内输出功率大于50W,效率大于50%,整机增益大于47dB。在从-20~60°C全温范围内,放大器整机功率最大变化小于0.6dB。     

X 波段氮化镓合成固态放大器

Based on a self-developed A1GaN/GaN HEMT with 2.5 mm gate width technology on a SiC substrate, an X-band GaN combined solid-state power amplifier module is fabricated. The module consists of an AIGaN/GaN HEMT, Wilkinson power couplers, DC-bias circuit and microstrip line. For each amplifier, we use a bipolar DC power source. Special RC networks at the input and output and a resistor between the DC power source and the gate of the transistor at the input are used for cancellation of self-oscillation and crosstalk of low-frequency of each amplifier. At the same time, branches of length 3λ/4 for Wilkinson power couplers are designed for the elimination of self-oscillation of the two amplifiers. Microstrip stub lines are used for input matching and output matching. Under Vds = 27 V, Vgs = -4.0 V, CW operating conditions at 8 GHz, the amplifier module exhibits a line gain of 5.6 dB with power added efficiency of 23.4%, and output power of 41.46 dBm （14 W）, and the power gain compression is 3 dB. Between 8 and 8.5 GHz, the variation of output power is less than 1.5 dB.     

60Co-γ射线辐射对AlGaN/GaN HEMT器件直流特性的影响

采用1.25Mev 60Co γ射线辐射源对钝化前后的AlGaN/GaN HEMT器件进行了1Mrad(Si)的总剂量辐射,实验发现：1Mrad总剂量辐射后未钝化器件的饱和漏电流和最大跨导分别下降了15%和9.1%,而且正向和反向栅电流明显增加,但是阈值电压几乎没有发生变化。相反的,同样的累积剂量下,钝化器件的饱和漏电流和最大跨导却基本没变。通过对钝化前后器件的不同辐射反应以及C-V测试的分析表明,栅-源和栅-漏间隔区辐射感生表面态负电荷的产生是低剂量下AlGaN/GaN HEMT器件电特性退化的主要原因,同时也说明钝化可以有效地抑制60Co γ辐射感生表面态电荷,它是一种有效的加固手段。     

氮化镓器件非线性特性表征

对100um和1mm碳化硅衬底的氮化镓器件进行直流特性,小信号特性和大信号特性的表征。100um和1mm器件小信号特性测试结果发现,随栅长增大,由于电容寄生效应的减小,电流截止频率fT增大。从数据看出,器件可用在C波段和X波段。大信号测试包括C波段和X波段负载牵引测试和功率扫描测试。器件偏置在AB类工作点,并且选定源端阻抗,做负载牵引测试。在负载牵引园图上,最大功率阻抗点和最佳效率阻抗点可以确定。根据5.5GHz的不同栅长的器件的功率扫描结果分析器件尺寸变换效应与和大尺寸器件的自热效应密切相关。8GHz 不同漏极偏置的器件的功率扫描结果说明碳化硅衬底的氮化镓器件有好的热导率,高击穿电压和10.16W/mm 功率密度。从分析可证明碳化硅衬底的氮化镓器件是放大器设计的理想材料。     

GIDL应力下超薄栅氧LDD NMOS器件退化

The degradation of device under GIDL （gate-induced drain leakage current） stress has been studied using LDD NMOSFETs with 1.4 nm gate oxides. Experimental result shows that the degradation of device parameters depends more strongly on Vd than on Vg. The characteristics of the GIDL current are used to analyze the damage generated during the stress. It is clearly found that the change of GIDL current before and after stress can be divided into two stages. The trapping of holes in the oxide is dominant in the first stage, but that of electrons in the oxide is dominant in the second stage. It is due to the common effects of edge direct tunneling and band-to-band tunneling. SILC（stress induced leakage current）in the NMOSFET decreases with increasing stress time under GIDL stress. The degradation characteristic of SILC also shows saturating time dependence. SILC is strongly dependent on the measured gate voltage. The higher the measured gate voltage, the less serious the degradation of the gate current. A likely mechanism is presented to explain the origin of SILC during GIDL stress.     

一种新的兼容栅偏源结构AlGaN/GaN HEMT的小信号模型

本文提出了一种新的AlGaN/GaN HEMT小信号模型,此模型可在20GHz以内对栅偏源结构HEMT进行精确模拟。模型中的寄生参数由零偏及截止两种偏置下的S参数来决定,本征部分采用直接提取的方式得出。本模型中的所有参数及比例系数均由器件结构决定,并不涉及任何优化算法,因而保证了模型参数值与物理意义的统一。