A pair of integrated optoelectronic transceiving chips for optical interconnects

In this Letter, a pair of integrated optoelectronic transceiving chips is proposed. They are constructed by integrating a vertical cavity surface emitting laser unit above a positive-intrinsic-negative photodetector unit. One of the transceiving chips emits light at the wavelength of 848.1 nm with a threshold current of 0.8 mA and a slope efficiency of 0.81 W/A. It receives light between 801 and 814 nm with a quantum efficiency of higher than 70%.On its counterpart, the other one of the transceiving chips emits light at the wavelength of 805.3 nm with a threshold current of 1.1 mA and a slope efficiency of 0.86 W/A. It receives light between 838 and 855 nm with a quantum efficiency of higher than 70%. The proposed pair of integrated optoelectronic transceiving chips can work full-duplex with each other, and they can be applied to single fiber bidirectional optical interconnects.     

Integrated optoelectronic chip pair for transmitting and receiving optical signals simultaneously

An integrated optoelectronic chip pair, which can transmit and receive optical signals simultaneously, is proposed in this Letter. The design and optimization of its key structure, the vertical cavity surface emitting laser's distributed Bragg reflector, are presented. Analysis is also done for its influence on the integrated chip's performance. Moreover, the chip pair's performance under dynamic conditions is analyzed. Their 3 dB modulation bandwidths are higher than 10 GHz, and their 3 dB photo-response bandwidths are around 23 GHz. Their applications will further improve the performances of the optical interconnects.     

金属有机化学气相沉积法生长纯闪锌矿结构P型砷化镓纳米线

垂直纯闪锌矿结构P型砷化镓纳米线通过金催化金属有机化学气相沉积法在砷化镓（111）衬底上生长。一系列P型掺杂样本是在生长过程中通入不同流量的二乙基锌实现的。在高II/III族比下（II/III族比>9.1%）,P型砷化镓纳米线存在一个弯曲临界长度,超过这个长度纳米线发生弯曲。弯曲的两个可能原因被讨论。运用能量散射X射线方法验证Zn元素已经掺入纳米线,并且对应II/III=0.2%,掺杂浓度约为8*10(18)。     

Stacking-faults-free zinc blende GaAs/AlGaAs axial heterostructure nanowires during vapor-liquid-solid growth

Pure zinc blende structure GaAs/AlGaAs axial heterostructure nanowires (NWs) are grown by metal organic chemical vapor deposition on GaAs(111) B substrates using Au-catalyzed vapor-liquid-solid mechanism.Al adatom enhances the influence of diameters on NWs growth rate.NWs are grown mainly through the contributions from the direct impingement of the precursors onto the alloy droplets and not so much from adatom diffusion.The results indicate that the droplet acts as a catalyst rather than an adatom collector.     

一种具有平顶陡边响应的长波长光探测器

在PIN型光探测器的基础上制备了一种适用于波分复用系统的具有平顶陡边响应的长波长光探测器。利用低压金属有机化学气相沉积(LP-MOCVD)设备在GaAs衬底上二次外延生长了具有台阶结构的GaAs/AlGaAs滤波腔和InP基PIN光探测器。高质量的GaAs/InP异质外延采用了低温缓冲层生长工艺;具有台阶结构的Fabry-Pérot(F-P)滤波腔采用了纳米量级台阶的制备方法。通过理论计算优化了实现平顶陡边光谱响应特性的器件结构;并通过实验成功制备出了具有平顶陡边响应性能的光探测器,器件的工作波长位于1 549nm,峰值量子效率大于25%,0.5dB光谱响应线宽为3.9nm,3dB光谱响应线宽为4.2nm,响应速率达到17GHz。     

单片集成GaAs基长波长谐振腔光探测器的研究

介绍了一种GaAs基的长波长谐振腔增强型(RCE)光探测器.通过两步生长法,在GaAs村底上异质外延生长了InP-InGaAs-InP的p-i-n光吸收结构和GaAs/AlAs的分布布拉格反射镜(DBR).所制备的器件在1 549.4 nm处获得了67.3%的量子效率和17 nm的光谱响应线宽,在1 497.7 nm处获得了53.5%的量子效率和9.6 nm的光谱响应线宽,而InGaAs吸收层厚度仅为200 nm.采用单片集成法,工艺简单、易于产业化,随着缓冲层技术的发展,此种RCE光探测器的性能还将获得进一步提升.     

用于单片集成光接收机前端的GaAs基InP/InGaAs HBT

实现了一种可用于单片集成光接收机前端的GaAs基InP/InGaAs HBT。借助超薄低温InP缓冲层在GaAs衬底上生长出了高质量的InP外延层。在此基础上,只利用超薄低温InP缓冲层技术就在半绝缘GaAs衬底上成功制备出了InP/InGaAsHBT,器件的电流截止频率达到4.4GHz,开启电压0.4V,反向击穿电压大于4V,直流放大倍数约为20。该HBT器件和GaAs基长波长、可调谐InP光探测器单片集成为实现适用于WDM光纤通信系统的高性能、集成化光接收机前端提供了一种新的解决方法。     

光通信链路中集成芯片的收发一体工作

在PIN光电探测器(PIN-PD)结构的垂直方向上集成垂直腔面发射激光器(VCSEL)结构单元,实现了收发一体式工作的集成光电芯片对,可用于进一步提高光互连的性能。该集成光电芯片可以同时对两个波段进行收发一体工作,一端进行中心波长为805 nm的光信号的发送和中心波长为850 nm的光信号的接收,另一端进行中心波长为850 nm的光信号的发送和中心波长为805 nm的光信号接收。仿真优化805 nm波长处光信号发送端的结构与性能,理论分析结构中VCSEL单元和PIN-PD单元工作时的电学隔离和光学解耦,最终证实本结构可以同时进行收发一体的工作。     

基于异变缓冲层与应变层超晶格的InP/GaAs异质外延

利用低压金属有机化学气相沉积技术, 开展InP/GaAs异质外延实验。由450 ℃生长的低温GaAs层与超薄低温InP层组成双异变缓冲层, 并进一步在正常InP外延层中插入In1-xGaxP/InP(x=7.4%)应变层超晶格。在不同低温GaAs缓冲层厚度、应变层超晶格插入位置及应变层超晶格周期数等条件下, 详细比较了InP外延层(004)晶面的X射线衍射谱, 还尝试插入双应变层超晶格。实验中, 1.2 μm和2.5 μm厚InP外延层的ω扫描曲线半峰全宽仅370 arcsec和219 arcsec; 在2.5 μm厚InP层上生长了10周期In0.53Ga0.47As/InP 多量子阱, 室温PL谱峰值波长位于1625 nm, 半峰全宽为60 meV。实验结果表明, 该异质外延方案有可能成为实现InP-GaAs单片光电子集成的一种有效途径。     

Growth of pure zinc blende p-type GaAs nanowires by metal-organic chemical vapor deposition

Vertical p-type gallium arsenide（GaAs） nanowires with pure zinc blende structure were grown on GaAs （111） B substrate by metal-organic chemical vapor deposition via a Au-catalyst vapor-liquid-solid mechanism.The p-type doping was investigated by additional diethyl zinc（DEZn）.In the highⅡ/Ⅲratio range（Ⅱ/Ⅲ>9.1%）,there exists a critical length beyond which kinking takes place.Two possible reasons are discussed.Zn occurrence in the nanowires was verified by energy dispersive X-ray（EDX） analysis.Corresponding toⅡ/Ⅲ= 0.2%,the doping concentration is about 8×10¹⁸ cm^-3.