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Effects of Rapid Recurrent Thermal Annealing on Giant Magnetoresistance NiFe/Ag Multilayers
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NiFe/Ag multilayers were prepared by dc sputtering onto glass-ceramic substrates directly at room temperature. The samples were thermally processed by rapid recurrent thermal anneal (RRTA). We studied the effects of RRTA on giant magnetoresistance (GMR) NiFe/Ag multilayer by contro11ing the anneal temperature as well as the rapid anneal cycle. The samples after three RRTA cycles have a similar annealing temperature dependence of GMR responses to the ordinary annealed samples. With the increasing anneal cycle, the GMR response improved at first and then reached an unexpected high value of 9% before descent rapidly. Microstructure study shows that this effect is ascribed to the transformation of continuous NiFe layer into discontinuous one, and then into a granular like film in a step-by-step way. 相似文献
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Electrical transport properties in nanostructure have experimentally and theoretically importance. The interest in such researches is stimulated by possible applications in microelectronic devises such as giant magnetoresistance (GMR) sensor and magnetic random access memory (MRAM). One interesting property of the electrical transport in magnetic multilayer composed of ferromagnetic separated by nonmagnetic layers is the spacer dependence of GMR oscillation, which is generally believed to … 相似文献
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Since Yoshizawa et al found iron-basednanocrystalline soft magnetic materials in 1988[1],nanocrystalline soft magnetic thin films have attractedmuch attention due to their wide applications.According to the random anisotropy model proposedby Herzer[2,3], as grain size is smaller than theexchange correlation length, coercivity andpermeability will be proportional and inverselyproportional to the grain size to sixth power,respectively. Therefore, in order to reach excellent softmagnetic properti… 相似文献
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Structural Variation and Its Influence on the 1/f Noise of a-Si_(1-x)Ru_x Thin Films Embedded with Nanocrystals
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The structural variation and its influence on the 1/f noise of a-Si_(1-x)Ru_x thin films are investigated by Raman spectroscopy,transmission electron microscopy, and low frequency noise measurement. The Ru atoms are introduced into the amorphous silicon thin films by rf magnetron co-sputtering. Ru2 Si nanocrystals are found in the as-deposited samples. It is shown that the 1/f noise of the films can be reduced by a slight doping with Ru atoms. Moreover, both the microstructure and the 1/f noise performance of a-Si_(1-x)Ru_x thin films could be improved through a high-temperature annealing treatment. 相似文献
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采用等离子体化学气相沉积(PECVD)法,以高纯度硅烷(SiH4)为反应气体,硼烷(B2H6)为掺杂气体,在ITO玻璃衬底上制备出硼轻掺杂浓度的氢化非晶硅(a-Si∶H)半导体薄膜。测量了样品的光暗电导率、折射率、消光系数、禁带宽度随掺杂浓度的变化。结果表明:随着硼掺杂浓度的增加,薄膜的暗电导率先减小后增大。消光系数、禁带宽度等都随着掺杂浓度的增加而变化。在不同工艺条件下,改变硼掺杂浓度,确定了最佳掺杂比(光暗电导率之比最大),制备出适合器件级轻掺杂氢化非晶硅薄膜光敏层。 相似文献