盐酸胍在阻挡层化学机械抛光中对速率选择性及表面形貌的影响

We propose an alkaline barrier slurry containing guanidine hydrochloride（GH） and hydrogen peroxide.The slurry does not contain any corrosion inhibitors, such as benzotriazole（BTA）. 3-inch samples of tantalum copper and oxide were polished to observe the removal rate. The effect of GH on removal rate selectivity along withhydrogenperoxidewasinvestigatedbycomparingslurrycontainingGHandH2O2withslurrycontainingonly GH. Details about the tantalum polishing mechanism in an alkaline guanidine-based slurry and the electrochemical reactions are discussed. The results show that guanidine hydrochloride can increase the tantalum polishing rate and the selectivity of copper and barrier materials. The variation of the dishing and wire line resistance with the polishing time was measured. The dishing value after a 300 mm pattern wafer polishing suggests that the slurry has an effective performance in topography modification. The result obtained from the copper wire line resistance test reveals that the wire line in the trench has a low copper loss.     

多变元q-超几何项的乘法分解

将Ore-Sato定理的q-模拟由非混合情形推广到混合情形,证明了可驯条件下,混合q-超几何项可以分解为有理函数与q-阶乘项的乘积.     

2.45 GHz高线性功率放大器设计

基于SMIC 0.18 μm RF-CMOS工艺,实现了一种工作于2.45 GHz的功率放大器,给出了电路仿真结果和电路版图.电路采用两级放大的结构,分别采用自偏置技术和电阻并联负反馈网络来缓解CMOS器件低击穿电压的限制,同时保证了稳定性的要求.为了提高线性度,采用一种集成的二极管线性化电路对有源器件的输入电容变化提供一种补偿机制,漏端的LC谐振网络和优化的栅偏置用来消除由跨导产生的非线性谐波.在3 V电源电压下,放大器功率增益为23 dB,输出1 dB压缩点约为25 dBm,对应的功率附加效率PAE可达35%.     

奥克斯为何"超时"等待?

2004年10月,奥克斯起诉信息产业部违反<行政许可法>一案曾引起了社会各界的广泛关注.按照司法程序,法院要在7个工作日内作出是否受理此案的决定,并通知当事双方.但7天过后,法院仍没有明确是否正式立案受理,奥克斯只有等待.     

A new weakly alkaline slurry for copper planarization at a reduced down pressure

This study reports a new weakly alkaline slurry for copper chemical mechanical planarization （CMP）, it can achieve a high planarization efficiency at a reduced down pressure of 1.0 psi. The slurry is studied through the polish rate, planarization, copper surface roughness and stability. The copper polishing experiment result shows that the polish rate can reach 10032 A/rain. From the multi-layers copper CMP test, a good result is obtained, that is a big step height （10870 A） that can be eliminated in just 35 s, and the copper root mean square surface roughness （sq） is very low （〈 1 rim）. Apart from this, compared with the alkaline slurry researched before, it has a good progress on stability of copper polishing rate, stable for 12 h at least. All the results presented here are relevant for further developments in the area of copper CMP.     

一种高增益低功耗的CMOS低噪声放大器

设计了一种新型的全集成的电流复用两级共源低噪声放大器,采用新型输入匹配和一个级联的级间谐振电感实现了低功耗高增益。为了降低芯片面积,两个LC并联网络代替了传统的大电感。这种新型的电流复用结构更有利于输入匹配,降低噪声和功耗。采用SMIC0.18μm RF CMOS工艺制作了一个频率为2.4GHz,噪声系数1.7dB,S11为-30dB,S22为-36dB,功率增益为23dB,反向隔离度小于-35dB,在1.8V的供电电压下仅消耗2mA。     

一种基于超材料的极化无关超宽带吸波器

提出了一种新的基于氮化钽金属膜和多孔泡沫介质的具有超宽带吸收特性的超材料吸波器.吸收率大于80％的频段为15.5～47.2 GHz(在18.3 GHz,达到最大吸收率99.89％),相对带宽约为101％,完全覆盖了K波段、Ka波段,部分覆盖了U波段.对于斜入射的横电波、横磁波具有较宽角度的吸波性能.由于吸波单元的金属图案设计为5个同心圆环结构,具有全向旋转对称性,因而是极化无关的.该吸波器结构简单.容易制作,在电磁隐身、电磁兼容等领域具有重要应用价值.     

奥克斯为何“超时”等待？

2004年10月，奥克斯起诉信息产业部违反《行政许可法》一案曾引起了社会各界的广泛关注。按照司法程序，法院要在7个工作日内作出是否受理此案的决定，并通知当事双方。但7天过后，法院仍没有明确是否正式立案受理，奥克斯只有等待。