A modified electron bombardment type ion source for the study of solids

A modified electron bombardment type ion source suitable for use with mass spectrometer is described. Ion formation occurs throughout a relatively large volume in the ionisation box, since no magnetic field is used to collimate the ionising electrons. A sensitivity of 2 × 10⁻⁵ amp/torr is obtained for an ion extraction energy of 2 keV and 200 mass resolution. Trajectory tracing has been used to study the operation of the ion source. Capability of the ion source to analyse solid samples in microgram quantity was tested by studying evaporation of BaO from tungsten.     

Surface oxides produced during discharge in water ambient iron surface: A conversion electron Mössbauer spectroscopic study

Oxide layers are produced on iron surface, under discharge in water ambient, applying both anodic and cathodic potentials to iron foil. Non-stoichiometric Fe_1−xO containing different ratios of Fe³⁺ and Fe²⁺ has been detected by using CEMS. Corrosion of these samples in 0.5 M H₂SO₄ shows that, cathodically discharge treated iron foil has higher corrosion resistance as compared to the anodically treated sample. This is attributed to the microstructural differences in the Fe_1−xO_x films formed during the discharge.     

An ab-initio study of silicon adsorption on metallic surfaces (Au/Ag): Novel perspective to explore chemical bonding

We analyzed localized charge time evolution in the system of two interacting quantum dots (QD) (artificial molecule) coupled with the continuous spectrum states. We demonstrated that Coulomb interaction modifies relaxation rates and is responsible for non-monotonic time evolution of the localized charge. We suggested new mechanism of this non-monotonic charge time evolution connected with charge redistribution between different relaxation channels in each QD.     

Resistance changes in thin metallic films under ion bombardment

Resistance changes in thin films of copper, aluminium and bismuth have been studied under the bombardment of nitrogen, carbon and argon ions. Variations in resistance with implantation dose have been observed upto doses of ∼ 3 × 10¹⁷ ions/cm² for ion energies in the range 40 to 120 keV. The results are discussed in terms of desorption of gases from the film and a composite action of sputter removal of the film and its structural changes upon ion bombardment. A simple theoretical model is discussed which can qualitatively explain the experimental observations.     

(3+2) Annulation of Amidinothioureas with Binucleophile: Synthesis and Antimicrobial Activity of 3‐Phenylamino‐5‐aryl/alkyl‐1,2,4‐oxadiazole Derivatives

Herein, we report an efficient method for preparation of 3‐phenylamino‐5‐aryl/alkyl‐1,2,4‐oxadiazole by (3+2) annulation of amidinothioureas with binucleophilic hydroxylamine hydrochloride in the presence of mercury (II) chloride. Desired 3‐phenylamino‐5‐aryl/alkyl‐1,2,4‐oxadiazole was prepared in good to moderate yields. On the basis of the literature precedence, the mechanism for the formation of 3‐phenylamino‐5‐aryl/alkyl‐1,2,4‐oxadiazole is proposed. The synthesized compounds were tested for their antimicrobial activity and showed promising inhibition of Gram‐positive bacteria (Staphylococcus aureus) and fungi (Candida albicans).