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J.J. McClelland R. Gupta R.J. Celotta G.A. Porkolab 《Applied physics. B, Lasers and optics》1998,66(1):95-98
6 plasma. We show that the result can be an array of parallel wires as narrow as 68 nm or an array of parallel Si trenches
as narrow as 85 nm. The laser-focused deposition process is inherently parallel, so a large area is patterned simultaneously
with an accurate periodicity of 212.78 nm. This method represents a novel way to make large, coherent arrays of sub-100 nm-size
structures.
Received: 20 March 1997 相似文献
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