Deposition of SiOx barrier films by O2/TMDSO RF-PECVD

This paper reports that the SiOx barrier films are deposited on polyethylene terephthalate substrate by plasmaenhanced chemical vapour deposition （PECVD） for the application of transparent barrier packaging. The variations of 02/Tetramethyldisiloxane （TMDSO） ratio and input power in radio frequency （RF） plasma are carried out to optimize barrier properties of the SiOx coated film. The properties of the coatings are characterized by Fourier transform infrared, water vapour transmission rate （WVTR）, oxygen transmission rate （OTR）, and atomic force microscopy analysers. It is found that the 02/TMDSO ratio exceeding 2：1 and the input power over 200 W yield SiOx films with low carbon contents which can be good to the barrier （WVTR and OTR） properties of the SiOx coatings. Also, the film properties not only depend on oxygen concentration of the inlet gas mixtures and input power, but also relate to the surface morphology of the coating.     

HT-6A托卡马克平衡系统的实验

本文叙述了HT-6A托卡马克平衡系统及第一期平衡实验结果.讨论了HT-6A上铜壳对平衡的贡献;观察到改变垂直场形态因子n而产生的水平位移及垂直位移不稳定现象;介绍了正常放电时的平衡实验,观察到等离子体位移与MHD扰动是紧密相连的;用沙弗拉诺夫薄壳理论计算了对多大的等离子体电流应施加多大的垂直场,结果与实验完全符合。