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An All-Thin-Film Electrochromic Device Composed of MoO3--LiBSO--NiOx Multilayer Structure 总被引:1,自引:0,他引:1 下载免费PDF全文
An all-thin-tilm (ATF) electrochromic device for modulating the optical transmittance is manufactured using magnetron sputtering. The devices consists of MoO3 as the main electrochromic layer, LiBO2 +Li2SO4 (LiBSO) as the ion conductor layer, and NiOx as the complementary electrochromic layer. Glass covered with indium tin oxide (ITO) is used as the substrate and the ITO film is used as the bottom electrode. The ITO film deposited on the top of the devices is used as the other electrode. The structure and morphology of the films are characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). The devices exhibit good optical properties with low transmittance values in the coloured state, and the optical modulation is measured by spectrophotometer in the wavelength range from 400 to 800nm. The average visible light transmittance reaches 50.2% and 3.7% in bleached and coloured state, respectively. The results indicate that such a monolithic system has great potential to be applied in smart windows. 相似文献
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参考在美国麻省理工学院召开的第十届国际冷核聚变会议(ICCF 10)内容,对冷核聚变研究的现状作一简单介绍.国际原子能委员会(IAEA)分管聚变的官员(1995—2001年)T.J.Dolan在清华召开的ICCF 9国际会议上的总结会上提出五种重要的解释冷聚变现象的理论模型,其中有江兴流提出的涡旋动力学模型.涡旋动力学模型的主要论点在于:局域瞬态非平衡体系产生涡旋,而涡旋的内聚作用和极化效应,使体系内的粒子相互靠近,产生局域极化核反应和高度定向的轴向加速高能粒子.这种局域瞬态非平衡体系出现在电极微突起处或多层膜的非平衡点处.这一理论成功地解释了许多异常放热和核嬗变现象,因而受到了广泛重视.对涡旋动力学作以简单介绍. Many papers published in the 10th International Conference of Cold Fusion( MIT, Massachusetts .Aug. 2003) reveal the experimental results of excess heat with a few of products of nuclear reactions. Over the years it is become clear that there are new effects to be surfaced. Thomas J. Dolan listed several interesting theoretical ideas including the model of vortex dynamics proposed by Xingliu Jiang. This model says that excess heat and nuclear reactions in electrical discharge system and other transient... 相似文献
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140 keV质子辐照对石英玻璃光谱性能影响的研究 总被引:4,自引:1,他引:3
研究了JGS3 光学石英玻璃在真空、冷黑和能量为 14 0keV的质子辐照下光学透过率变化的基本规律。在辐照剂量大于 5× 10 14 proton/cm2 后 ,主要引起 2 30~ 2 5 0nm的吸收带 ,其吸收峰值随辐照剂量的增加而单调增加。在较大辐照剂量下 ,近紫外和可见区域也存在某些弱的吸收带。 2 30~ 2 5 0nm的吸收带由E′心引起。质子辐照下在JGS3 光学石英玻璃中形成的E′心是受氢扰动的 ,即辐照过程中不仅发生Si -O键的断裂 ,而且发生[≡Si- ]和 [≡Si-O]向 [≡Si-H]和 [≡Si-OH]的转变 相似文献
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为降低溅射过程中摹片温度的上升,进而成功制备非晶多孔、纳米微晶态电致变色薄膜和非晶态离子导电薄膜,介绍了一种配置于磁控溅射设备的液氮冷却装置.利用该装置制备了由WO3、NiOx和LiNbO3 薄膜组成的单基片全无机电致变色智能窗器件.采用分光光度计对该器件的电致变色性能进行了测试,并计算了它的漂白和着色态在400 nm到800 nm波长范围内的平均透射率.实验结果表明,经过50次循环后,该器件的漂白和着色态的平均透射率分别为61.5%和5.5%.X射线衍射和扫描电镜(SEM)图像显示,组成该器件的WO2、NiOx和LiNbO3薄膜分别为非晶多孔、纳米微晶和非晶态结构. 相似文献
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