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<正>The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with T_p higher than 98%and T_p/T_s higher than 200:1(T_p and T_s are transmissions for p- and s-polarizations,respectively) with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs. 相似文献
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利用电子束蒸发方法,在不同沉积温度(50~350℃)下制备了Sc2O3薄膜。分别用分光光度计,小角掠入射X射线衍射仪和轮廓仪测试了薄膜样品的光谱、微结构和表面粗糙度信息,并用薄膜分析软件Essential Macleod计算了Sc2O3薄膜的折射率和消光系数。结果表明:随着沉积温度升高,Sc2O3薄膜结晶程度增强,晶粒尺寸增大,且较高的沉积温度有利于获得较高的折射率。最后用355 nm,8 ns的三倍频Nd:YAG激光器测试了其激光损伤阈值(LIDT),最大值为2.6 J/cm2,且阈值与薄膜的消光系数、表面粗糙度、光学损耗均呈现相反的变化趋势。用光学显微镜和扫描电子显微镜表征了该薄膜的破坏形貌,详细分析了薄膜在不同激光能量作用下破坏的发展过程,以及Sc2O3薄膜在355 nm紫外激光作用下LIDT与制备工艺的关系,重点分析了355 nm激光作用下薄膜的破坏机理。 相似文献
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采用原子力显微镜(AFM)、俄歇电子能谱(AES)和显微压痕分析等手段对射频等离子体增强化学气相沉积法制备的掺氮类金刚石(DLC:N)薄膜的微观结构和力学性能进行了研究.结果表明,随着含氮量的增加,DLC薄膜的AFM表面形貌中出现了几十纳米的颗粒,原子侧向力显微镜和AES分析表明这种纳米颗粒是x大于0.126的非晶氮化碳CNx结构.这种非晶DLC/CNx的纳米复合结构,减小了薄膜的内应力,从而提高了薄膜与衬底的附着力.
关键词:
类金刚石碳膜
微观结构
附着特性 相似文献
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以1 030 nm高反,940,980 nm高透的波长分离膜作为实例,为提高该薄膜元件的波长分离效果,从膜系的优化方面做了一系列的研究,诸如采用带通滤光片的设计思想,在膜堆两侧加入了匹配层,调整膜堆的周期厚度,并用膜系设计软件对通带作进一步的优化.通过这一系列的优化设计后,利用RF双离子束溅射工艺在BK7玻璃基底上沉积样品薄膜,并在基底背面加镀通带增透膜.结果显示,透射带在940和980 nm处的透过率分别为97.73%和93.63%,反射带在1 030 nm的反射率为99.99%.对所制备的样品薄膜进行了激光损伤阈值测量,得到了35 J/cm2(1 064 nm,12 ns)的结果. 相似文献
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Damage threshold influenced by polishing imperfection distribution under 355-nm laser irradiation 下载免费PDF全文
A systematic interpretation of laser-induced damage in the nanosecond regime is realized with a defect distribution buried inside the redeposited layer arising from a polishing process. Under the 355-nm laser irradiation, the size dependence of the defect embedded in the fused silica can be illustrated through the thermal conduction model. Considering CeO_2 as the major initiator, the size distribution with the power law model is determined from the damage probability statistics. To verify the accuracy of the size distribution, the ion output scaling with depth for the inclusion element is obtained with the secondary ion mass spectrometer. For CeO_2 particulates in size of the depth interval with ion output satisfied in the negative exponential form, the corresponding density is consistent with that of the identical size in the calculated size distribution. This coincidence implies an alternative method for the density analysis of photoactive imperfections within optical components at the semi-quantitative level based on the laser damage tests. 相似文献
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In contrast to uncoated substrate, a nonlinear relationship of phase shift with the thicknesses of the thin film makes the calculation of wavefront aberration complicated. A program is compiled to calculate the wavefront aberration of multilayer thin film produced by thickness nonuniformity. The physical thickness and the optical phase change on reflection are considered. As an example, the wavefront aberration of the all-dielectric mirror is presented in ArF excimer lithography system with a typical thickness distribution. In addition, the wavefront errors of the thin film at wavelengths of 193 and 633 nm are compared in the one-piece and two-piece arrangements. Results show that the phase shift upon reflection of the thin film produced by thickness nonuniformity is very sensitive to the incident angle, wavelength, and polarization. 相似文献
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将Sc2O3替代层引入到532 nm高反膜(HfO2/SiO2)n中,利用Sc2O3在盐酸中具有较好的溶解性这个特点,把膜层与基片脱离,以方便基片返修,缩短返修周期,降低成本。能量色散谱元素测试表明,脱离后Sc元素残留率为0。用Lamada900分光光度计、WykoNT1100轮廓仪和ZYGO干涉仪分别表征了替代层引入对高反膜的光谱、表面粗糙度和应力的影响,并测试了膜系在532 nm的激光损伤阈值的变化,结果表明Sc2O3替代层的引入对高反膜的性能几乎没有负面影响。 相似文献