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利用两维particle-in-cell方法研究了半圆形容器表面等离子体源离子注入过程中鞘层的时空演化规律. 详尽考察了鞘层内随时间变化的电势分布和离子密度分布规律,离子在鞘层中的运动轨迹和运动状态,得到了半圆容器内、外表面和边缘平面上各点离子注入剂量分布规律,获得了工件表面各点注入离子的入射角分布规律. 研究结果揭示了半圆容器边缘附近鞘层中离子聚焦现象,以及离子聚焦现象导致工件表面注入剂量分布和注入角度分布存在很大不均匀的基本物理规律.
关键词:
等离子体源离子注入
鞘层
两维particle-in-cell方法
离子运动轨迹 相似文献
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Two-dimensional particle-in-cell plasma source ion implantation of a prolate spheroid target
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A two-dimensional particle-in-cell simulation is used to
study the time-dependent evolution of the sheath surrounding a
prolate spheroid target during a high voltage pulse in plasma source
ion implantation. Our study shows that the potential contour lines
pack more closely in the plasma sheath near the vertex of the major
axis, i.e. where a thinner sheath is formed, and a non-uniform total
ion dose distribution is incident along the surface of the prolate
spheroid target due to the focusing of ions by the potential
structure. Ion focusing takes place not only at the vertex of the
major axis, where dense potential contour lines exist, but also at
the vertex of the minor axis, where sparse contour lines exist. This
results in two peaks of the received ion dose, locating at the
vertices of the major and minor axes of the prolate spheroid target,
and an ion dose valley, staying always between the vertices, rather
than at the vertex of the minor axis. 相似文献
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A particle-in-cell simulation is developed to study dc plasma immersion ion implantation. Particular attention is paid to the influence of the voltage applied to the target on the ion path, and the ion flux distribution on the target surface. It is found that the potential near the aperture within the plasma region is not the plasma potential, and is impacted by the voltage applied to the implanted target. A curved equipotential contour expands into the plasma region through the aperture and the extent of the expansion depends on the voltage. Ions accelerated by the electric field in the sheath form a beam shape and a flux distribution on the target surface, which are strongly dependent on the applied voltage. The results of the simulations demonstrate the formation mechanism of the grid-shadow effect, which is in agreement with the result observed experimentally. 相似文献
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等离子体源离子注入过程(PSII)中样品温度是一个非常重要的参量。由于注入到样品上的能量很大,导致样品温度很高,所以在实验中获知样品的温度分布有着很重要的意义。本文利用热传导方程建立了半圆形碗状样品内部温度升高模型,研究样品内温度演化过程。以注入离子束流作为能量输入项,热辐射为能量损失项,并考虑了热辐射过程中样品的形状因子的影响。考察了离子注入过程中样品上所施加负偏压的脉冲宽度和频率对样品温度分布的影响。研究结果显示,脉冲频率达到一定值后,样品温度不再随频率增加而升高。 相似文献
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制作替代双棱镜的全息光学元件刘成森(辽宁师范大学物理系大连116022)全息光学元件在很多领域可以代替传统的玻璃光学元件(1),本文提出了一种制作可以代替玻璃双棱镜的全息光学元件的方法.光路如图1所示.其中L1、L2是柱透镜,它们将平行光会聚成狭缝状... 相似文献
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等离子体源离子注入过程中,鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构,对材料的不同部位这种影响是不同的.利用无碰撞两维流体动力学模型,研究了有限上升时间的电压脉冲作用下,共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中,鞘层的时空演化规律.通过计算得到了鞘层内随时间变化的电势分布和离子密度分布,计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律.计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异. 相似文献
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