Up to isometries,a deformation is a continuous function of its metric tensorAux isométries près,une déformation est une fonction continue de son tenseur métrique

If the Riemann–Christoffel tensor associated with a field of class $\text{C}{}^2$ of positive definite symmetric matrices of order three vanishes in a connected and simply connected open subset $\text{Ω?}\text{R}{}^3$, then this field is the metric tensor field associated with a deformation of class $\text{C}{}^3$ of the set $\text{Ω}$, uniquely determined up to isometries of $\text{R}{}^3$. We establish here that the mapping defined in this fashion is continuous, for ad hoc metrizable topologies. To cite this article: P.G. Ciarlet, F. Laurent, C. R. Acad. Sci. Paris, Ser. I 335 (2002) 489–493.     

Modeling of RF plasma torch with a metallic tube inserted for reactant injection

Flow, temperature, and electromagnetic (EM) fields in a radio-frequency thermal plasma torch designed for the preparation of superconducting powders or films have been analysed by using a new two-dimensional modeling approach with the electric field intensity as the fundamental EM field variable. The insertion of a stainless steel injection tube into the torch leads to large induction currents in this tube. Although such large induction currents cause pronounced changes of the EM fields near the injection tube, flow and temperature fields are little affected. There exists only one large toroidal vortex in the upper part of the present torch, while the maximum temperature appears at an off-axis location within the coil region.     

Arithmetic functions with linear recurrence sequences

We obtain asymptotic formulas for all the moments of certain arithmetic functions with linear recurrence sequences. We also apply our results to obtain asymptotic formulas for some mean values related to average orders of elements in finite fields.     

Nusselt number correlations for heat transfer to small spheres in thermal plasma flows

Seven different equations predicting heat transfer rates to small spheres in plasma flows are examined considering argon and nitrogan as plasma gases from 300 to 21,000 K at 1 atm. For argon there is a general consensus up to 9000 K, beyond which wide deviations in behavior occur. For nitrogen, the seven correlations are in good agreement up to 4000 K, but show substantial deviations beyond this value. Comparisons with the sparsely available experimental data are made for argon from 300 to 17,000 K and for nitrogen up to 5500 K. Disagreement between the various correlations and experiment can exceed one order of magnitude.     

Multiscale Finite Element Modeling of Arc Dynamics in a DC Plasma Torch

The dynamics of the electric arc inside a direct current non-transferred arc plasma torch are simulated using a three-dimensional, transient, equilibrium model. The fluid and electromagnetic equations are solved numerically in a fully coupled approach by a multiscale finite element method. Simulations of a torch operating with argon and argon–hydrogen under different operating conditions are presented. The model is able to predict the operation of the torch in steady and takeover modes without any further assumption on the reattachment process except for the use of an artificially high electrical conductivity near the electrodes, needed because of the equilibrium assumption. The results obtained indicate that the reattachment process in these operating modes may be driven by the movement of the arc rather than by a breakdown-like process. It is also found that, for a torch operating in these modes and using straight gas injection, the arc will tend to re-attach to the opposite side of its original attachment. This phenomenon seems to be produced by a net angular momentum on the arc due to the imbalance between magnetic and fluid drag forces.     

Über die Identifizierung von Alkoholen mit 1-Chlormethyl-isatin

Monatshefte für Chemie - Chemical Monthly - Primary, secondary and tertiary aliphatic alcohols quickly react with 1-chloromethyl-isatin (1) to give good yields of alkoxymethylisatines4-novel...     

Process study of thermal plasma chemical vapor deposition of diamond,part II: Pressure dependence and effect of substrate pretreatment

The effect of pressure during thermal plasma chemical vapor deposition of diamond films has been investigated for a pressure range from 100 to 760 Torr. The maximum growth rate in our experiments occurs at 270 Torr for substrate temperatures around 1000°C. The existence of an optimum pressure for diamond deposition may he related to the balance between generation and recombination of atomic hydrogen and carbon-containing active species in front of the substrate. To estimate the concentrations of atomic hydrogen and methyl radicals under thermal plasma conditions, calculations based on thermodynamic equilibrium have been performed. This approximate evaluation provides useful guidelines because rapid diffusion results in a near frozen chemistry within the boundary layer. The effect of substrate pretreatment on diamond deposition depends on the type of substrate used. Two growth modes have been observed-layer growth and island growth of diamond crystals on various substrates. Screw dislocations have been observed in diamond deposition in thermal plasmas, and defects such as secondary nucleations are more concentrated along (III) directions than along (100) directions.     

A Three-Dimensional Two-Phase Model for Thermal Plasma Chemical Vapor Deposition with Liquid Feedstock Injection

In this paper, a comprehensive model for thermal plasma chemical vapor deposition (TPCVD) with liquid feedstock injection is documented. The gas flow is assumed to be steady, of a single temperature. Radiation and charged species contributions are excluded, but extensive homogeneous and heterogeneous chemistry is included. The liquid phase is traced by considering individual droplets. Discussion on the model's application to diamond production from acetone in a hydrogen–argon plasma is included. The major conclusions are: (1) Liquid injection possesses a capability to deliver the hydrocarbon precursor directly onto the deposition target. (2) For the case of complete evaporation of the droplet before reaching the substrate, the deposition rate is similar to that obtained with gaseous precursors. (3) The computational results compare well with experimental data. The modeling results can be used to optimize the injection parameters with regard to the deposition rate.