Pure spin-current diode based on interacting quantum dot tunneling junction

A magnetic field-controlled spin-current diode is theoretically proposed, which consists of a junction with an interacting quantum dot sandwiched between a pair of nonmagnetic electrodes. By applying a spin bias V_S across the junction, a pure spin current can be obtained in a certain gate voltage regime,regardless of whether the Coulomb repulsion energy exists. More interestingly, if we applied an external magnetic field on the quantum dot, we observed a clear asymmetry in the spectrum of spin current I_S as a function of spin bias, while the charge current always decays to zero in the Coulomb blockade regime. Such asymmetry in the current profile suggests a spin diode-like behavior with respect to the spin bias, while the net charge through the device is almost zero. Different from the traditional charge current diode, this design can change the polarity direction and rectifying ability by adjusting the external magnetic field, which is very convenient. This device scheme can be compatible with current technologies and has potential applications in spintronics or quantum processing.     

缓冲层厚度对Ge/Si多层膜的影响

采用离子束溅射技术,通过改变Si缓冲层厚度,在p型Si衬底生长了一系列的Ge/Si多层膜样品.利用Raman光谱、X射线小角衍射以及原子力显微镜等分析测试技术,研究了多层薄膜的结晶、膜层结构、表面形貌等性质.结果表明:通过引入缓冲层,在一定程度上可以提高颗粒的结晶性;随着缓冲层逐渐沉积,来自界面态的影响有了明显的减弱,且多层膜结构的生长得到有效改善.红外吸收光谱实验表明多层膜的吸收特性与其周期结构密切相关,因此可以通过改变缓冲层厚度的方法,实现对多层薄膜红外吸收特性的调制.