Ozone production in oxygen by means of F2-laser irradiation at λ=157.6 nm

Ozone is generated in pure oxygen (p5 kPa), synthetic air (p7 kPa) and oxygen-argon mixtures (p3 kPa) by irradiation of these gases with the VUV light of a repetitively pulsed (f _L15 Hz) F₂-laser at =157.6 nm with maximum about 4 mJ/pulse. An absorption photometer measurement operating at 253.7 nm (Hg line) determines the ozone concentration as a function of oxygen and/or additive gas pressure, the repetition frequency of the laser and the wall temperature of the reaction chamber. The temporal development of the ozone concentration as a function of these parameters is calculated by means of rate equations for the species O(³ P), O₂(X ³ _g ^– ), O₃(¹ A ₁), O(¹ D), O₂(a ¹_g), O₂(b ¹ _g ⁺ ) and vibrationally excited O ₃ ^* (¹ A ₁) and the photon distribution. The maximum concentration of O₃ in the sealed-off chamber reaches 1.6% in pure O₂, 4.1% in air and 1.2% in a 1:5 O₂-Ar mixture at 3 kPa. The annihilation of O₃ by the wall and temperature dependent volume processes (300 KT395 K) is studied and the experimental and theoretical results are compared.     

Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial Applications

Dielectric-barrier discharges (silent discharges) are used on a large industrial scale. They combine the advantages of non-equilibrium plasma properties with the ease of atmospheric-pressure operation. A prominent feature is the simple scalability from small laboratory reactors to large industrial installations with megawatt input powers. Efficient and cost-effective all-solid-state power supplies are available. The preferred frequency range lies between 1 kHz and 10 MHz, the preferred pressure range between 10 kPa and 500 kPa. Industrial applications include ozone generation, pollution control, surface treatment, high power CO₂ lasers, ultraviolet excimer lamps, excimer based mercury-free fluorescent lamps, and flat large-area plasma displays. Depending on the application and the operating conditions the discharge can have pronounced filamentary structure or fairly diffuse appearance. History, discharge physics, and plasma chemistry of dielectric-barrier discharges and their applications are discussed in detail.     

Dichtebestimmung in zylindersymmetrischen Medien aus Lichtstrahlablenkungsmessungen

Ohne Zusammenfassung     

Generation of excimer emission in dielectric barrier discharges

Dielectric barrier discharges (silent discharges) are used to excite a large number of excimers radiating in the VUV, UV or visible spectral range. The excited species include rare-gas dimers, halogen dimers as well as rare-gas halogen excimers and mercury halogen excimers. In many cases narrow-band UV radiation of typically 1–17 nm halfwidth and remarkable efficiency (1–10%) could be generated. Thus, dielectric barrier discharges provide a simple, versatile arrangement to study the basic reaction kinetics of excimer formation and also bear a substantial potential for large-scale industrial UV processes.     

Self-assembled block polymer templates as high resolution lithographic masks

Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene-block-methyl methacrylate) (PS-b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW = 67,100 g mol⁻¹. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.     

Interferometrie und Schlieren-Diagnostik an Hochdruck-Bögen mittels Pulsholographie

Ohne Zusammenfassung     

用无声放电转化甲烷和二氧化碳同时制备合成气与烃

在低温常压条件下,研究了在无声放电反应器中以A型分子筛为催化剂从甲烷和二氧化碳合成烃和合成气,实现了在无声放电反应器中同时合成烃和合成气。实验在原料气流量200－600ml/min、原料气甲烷和二氧化碳摩尔比1／1－3／1及输入功率100－500W的范围内进行。研究结果表明,低原料气流量有利于甲烷和二氧化碳的转化,而高原料气流量有利于烃的生成;原料气甲烷和二氧化碳摩尔比对制得合成气的H2／CO摩尔比的影响最显著;甲烷和二氧化碳转化率及合成气和烃的产率均随输入功率的增加而提高。而所研究的范围内,当原料气流理为200ml/min、甲烷和二氧化碳摩尔比为1／1、输入功率为500S时,甲烷和二氧化碳转化率达到最高值,分别为64％和39％。以此法制备的合成气的H2／CO摩尔可以在很宽的范围内变化,本研究合成气H2／CO摩尔比的变化范围是0.7-3.1。     

UV excimer radiation from dielectric-barrier discharges

Dielectric-barrier (silent) discharges are ideally suited for efficient excitation of high-intensity UV radiation from excimers. The molecular continuum of xenon at 172 nm could be obtained with an efficiency of close to 10%. Model calculations for excimer formation and UV efficiencies in such discharges are presented. The possibility of obtaining many other wavelengths (e.g. KrF^* at 248 nm and XeCl^* at 308 nm) and the variety of conceivable geometries (plane or cylindrical) makes this new UV source an attractive choice for many photophysical and photochemical applications.     

Partial Oxidation of Methane to Methanol with Oxygen or Air in a Nonequilibrium Discharge Plasma

The partial oxidation of methane to methanol with oxygen or air was investigated experimentally and theoretically in a dielectric-barrier discharge (DBD). The predominant parameters of specific electric energy, oxygen content, flow rate, temperature, and gas pressure were determined in CH ₄ /O ₂ and CH ₄ /air mixtures. Optimum selectivities toward methanol formation were found at an oxygen concentration of about 15% in both feed gas mixtures. Low specific energy favors the selectivity toward methanol and suppresses the formation of carbon oxides. The experiments indicate that high methanol selectivities can be obtained at high methane conversion. The highest methanol yield of 3% and the highest methanol selectivity of about 30% were achieved in CH ₄ /O ₂ mixtures. In CH ₄ /air mixtures, as high as 2% methanol yield was also obtained. In addition, other useful products, like ethylene, ethane, propane, and ethanol, were detected. Experiment and numerical simulations show that the formation of H ₂ O and CO has a strong negative influence on methanol formation.