Effects of boron and barium dopants on VMgO catalysts employed in the oxidative dehydrogenation of n-octane

Kinetics and Catalysis - Boron and barium were employed as dopants for the VMgO system. The catalysts were characterized by ICP-OES, BET, IR, powder XRD, EDX, TPR-H2, TPD-NH3, XPS, and 51V MAS NMR....     

Conformal fields,restriction properties,degenerate representations and SLEChamps conformes,propriété de restriction,représentations dégénérées et SLE

We relate the Schramm–Loewner Evolution processes (SLE) to highest-weight representations of the Virasoro Algebra. The restriction properties of SLE that have been recently derived in [19] play a crucial role. In this setup, various considerations from conformal field theory can be interpreted and reformulated via SLE. This enables one to make a concrete link between the two-dimensional discrete critical systems from statistical physics and conformal field theory. To cite this article: R. Friedrich, W. Werner, C. R. Acad. Sci. Paris, Ser. I 335 (2002) 947–952.     

Rehabilitation of the Gauss-Jordan algorithm

Summary In this paper a Gauss-Jordan algorithm with column interchanges is presented and analysed. We show that, in contrast with Gaussian elimination, the Gauss-Jordan algorithm has essentially differing properties when using column interchanges instead of row interchanges for improving the numerical stability. For solutions obtained by Gauss-Jordan with column interchanges, a more satisfactory bound for the residual norm can be given. The analysis gives theoretical evidence that the algorithm yields numerical solutions as good as those obtained by Gaussian elimination and that, in most practical situations, the residuals are equally small. This is confirmed by numerical experiments. Moreover, timing experiments on a Cyber 205 vector computer show that the algorithm presented has good vectorisation properties.     

Investigation of organic impurities adsorbed on and incorporated into electroplated copper layers

At room temperature electroplated copper layers exhibit changes in resistivity, residual stress, and microstructure. This process, known as self-annealing, is intimately linked to the release of organic impurities, which stem from the incorporation of organic additives into the Cu layer in the course of the electroplating process. The behavior of these impurities during self-annealing, represented by the carbon content, could be detected by analytical radio frequency glow discharge optical emission spectrometry (GD-OES) and carrier gas hot extraction (CGHE). The precondition of a quantitative determination is a surface cleaning procedure to remove adsorbed organics from the copper surface. It was observed that at first almost all impurities have to leave the Cu metallization before an accelerated abnormal grain growth can start. The small amount of remaining organic species after self-annealing could be quantified by both examination techniques, GD-OES and CGHE.     

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