缓蚀剂在N80钢上吸附行为研究

应用极化曲线和交流阻抗技术研究了 4种缓蚀剂在N80钢基体和碳酸亚铁膜上的吸脱附行为 .实验表明 ,对同一种缓蚀剂 ,其在N80钢光洁表面和在腐蚀产物膜上的吸附力强度不同 ,而酸性缓蚀剂和小分子缓蚀剂在N80钢光洁金属表面和碳酸亚铁膜上各表现出不同的缓蚀行为     

Surface characteristics of SiO_2-TiO_2 strip fabricated by laser direct writing

SiO_2-TiO_2 sol-gel films are deposited on SiO_2/Si by dip-coating technique.The SiO_2-TiO_2 strips are fabricated by laser direct writing using an ytterbium fiber laser and followed by chemical etching.Surface structures,morphologies and roughness of the films and strips are characterized.The experimental results demonstrate that the SiO_2-TiO_2 sol-gel film is loose in structure and a shrinkage concave groove forms if the film is irradiated by laser beam.The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time.But the roughness of laser irradiated area increases more than that of non-irradiated area under the same etching time.After being etched for 28 s,the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.     

溶胶-凝胶法制备SiO2-TiO2平板光波导工艺研究

采用溶胶-凝胶法制备了SiO₂-TiO₂平板光波导,计算了平板光波导通光条件,分析了硅/钛溶胶-凝胶材料的热性能,观测了平板光波导的结构形貌,并测试了其通光损耗。结果表明：经过200℃,30 min干燥处理的凝胶薄膜呈疏松多孔状态,对于非对称平板波导,存在芯层通光截止厚度,而且当SiO₂-TiO₂芯层厚度为0.5 μm时,SiO₂下包层厚度至少有6 μm才能防止1550 nm波长光泄露入单晶硅衬底中。制备的光波导对于1550 nm波长光传输损耗最小值为0.34 dB/cm。