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热致晶化高反射率SbOx薄膜的结构分析和光学性质 总被引:2,自引:0,他引:2
利用直流磁控反应溅射法制备了SbOx薄膜,利用X射线衍射分析仪和光谱仪分别研究了这种薄膜热致晶化的微观结构和光学性质的变化,并通过非晶态薄膜粉末的示差扫描量热实验测出不同加热速度条件下结晶峰温度,研究了这种薄膜的结晶动力学。发现沉积态SbOx薄膜为非晶态,非晶态SbOx薄膜在热致晶化过程中发生了两种变化,分别对应为较低温度下Sb晶体和较高温度下立方Sb2O3相的生成。退火后晶态薄膜中出现了单质Sb和Sb2O3,300℃退火后Sb2O3相含量最大。晶态薄膜的反射率均高于沉积态,在晶态薄膜中200℃退火的薄膜反射率最大。 相似文献
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The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400 - 800 nm were studied. The optical absorption coefficients and the optical energy gap (Eg) were calculated. The results gave values for the absorption coefficients in the range of (1.3 - 7.5) × 105 cm-1 which were in the high absorption wavelength region of 400 - 800 nm. The optical energy gaps were 0.684, 0.753 and 0.810 eV corresponding the films thicknesses of 57, 88 and 127 nm, respectively, showing the characteristic of increasing with the increase of the film thickness. 相似文献
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The optical properties of monolayer Ge2Sb2Te5 thin films with three different thicknesses prepared by dc magnetron sputtering method at the range of 400-800 nm were studied. The optical absorption coefficients and the optical energy gap (Eg) were calculated, The results gave values for the absorption coefficients in the range of (1.3-7.5)×105 cm-1 which were in the high absorption wavelength region of 相似文献
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