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中国艺术观是以"写意"为特点的,"外师造化,中得心源"是其绘画的创作原则.工笔人物画理应在新时期既发扬传统的优势,又兼具现代意识,主客观情景交融,开拓出新天地来. 相似文献
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The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale. 相似文献
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W/Si多层膜反射镜在硬X射线天文望远镜中有重要应用. 为减小其应力对反射镜面形和望远镜分辨率的影响, 同时保证较高的反射率, 采用150, 175和200 ℃ 的低温退火工艺对采用磁控溅射镀制的W/Si周期多层膜进行后处理. 利用掠入射X射线反射测试和样品表面面形测试对退火前后W/Si多层膜的应力和结构进行表征. 结果表明, 在150 ℃ 退火3 h 后, 多层膜1级峰反射率和膜层结构几乎没有发生变化, 应力减少约27%; 在175 ℃ 退火3 h后, 多层膜膜层结构开始发生变化, 应力减少约50%; 在200 ℃退火3 h 后, 多层膜应力减小超过60%, 但1级布拉格峰反射率相对下降17%, 且膜层结构发生了较大变化. W, Si界面层的增大和相互扩散加剧是应力和反射率下降的主要原因. 相似文献
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Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements. 相似文献
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试析吉林市房产管理地理信息系统的改进 总被引:1,自引:0,他引:1
本文主要阐述了房产管理地理信息系统在房产管理方面的必要性与重要性,针对吉林市房产管理地理信息系统存在的现状与问题,提出了具体的改进措施,对房产管理地理信息系统的建设具有一定的借鉴作用。 相似文献
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In this paper, a simple theoretical model combining Monte Carlo simulation with the enthalpy method is provided to simulate the damage resistance of B4C/Si-sub mirror under X-ray free-electron laser irradiation. Two different damage mechanisms are found, dependent on the photon energy. The optimum B4C film thickness is determined by studying the dependence of the damage resistance on the film thickness. Based on the optimized film thickness, the damage thresholds are simula... 相似文献