Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

软X射线多层膜透射式起偏器和检偏器设计

叙述了软X射线波段多层膜透射式起偏器和检偏器的设计原理，提出了设计准则，通过该准则设计的多层膜偏振元件能够同时满足具有较大的光通量和偏振度要求．同时还优化了不同膜厚比情况下软X射线多层膜偏振元件的性能，讨论了在多层膜制作过程中，由于表界面粗糙度和扩散的不同对元件性能的影响，这些工作为制作软X射线多层膜透射式起偏器和检偏器提供了设计基础。     

Design, Fabrication and Measurement of Ni/Ti Multilayer Used for Neutron Monochromator

Ni/Ti multilayers, which can be used for neutron monochromators, are designed, fabricated and measured. Firstly, their reflectivities are simulated based on the Nevot-Croce model. Reflectivities of two Ni/Ti multilayer mirrors with periods d = 10.3 nm （M1） and d = 7.8 nm （M2） are calculated. In the calculation, the reflectivity of the Ni/Ti multilayer is taken as a function of the gazing angle with different roughness factors δ =1.0 nm and = 1.5 nm. Secondly, these two multilayers are fabricated by the direct current magnetron sputtering technology. Thirdly their structures are characterized by small-angle x-ray diffraction. The roughness factors are fitted to be 0.68 nm and 1.16nm for M1 and M2, respectively. Finally their reflective performances are measured on the V14 neutron beam line at the Berlin Neutron Scattering Centre （BENSC）, Germany. The experimental data show that the grazing angle of the reflected neutron intensity peak increases, but the reflected neutron intensity decreases, with the decreasing periods of the multilayers.     

相对论效应实验中的数据处理

相对论效应实验是近年来新开设的较为成功的近代物理实验,目前已经编入我系及复旦、南开等院校物理系近代物理实验课程系列之中。有关该实验的原理和装置,作者已在本刊第7卷第4期刊登的“相对论效应实验及装置”一文中予以介绍。作为该文的续篇,本文将着重讨论相对论效应实验中有关数据处理方面的一些方法和特点。一、实验的总体安排本实验通过同时测定高速电子的动量值和动能来验证两者间具有相对论关系E_k=(p~2c~2+m~2c~4)~(1/2)-mc~2,并验证此关系在高能区(0.5～2.0MeV)明显有别于经典     

B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱradiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5℃. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.     

改进型验证相对论效应实验装置

验证相对论效应实验装置能够形象直观而又方便地验证快速电子的能量与动量的相对论关系，近年来的重新设计和改进在保留原有优点和特色的基础上改进了原装置的不足，突出了综合型、设计型的特点，真正达到了一机多用的目的，符合面向二十一世纪物理实验教学改革的趋势和方向。     

掺镧氟化钡晶体的闪烁光慢成分抑制特性

掺镧氟化钡晶体的闪烁光慢成分抑制特性顾牡，陈玲燕研究不同掺Ｌａ浓度下ＢａＦ２闪烁晶体的慢成分抑制特性对于该晶体的实际应用具有十分重要的意义．通过同步辐射闪烁光衰减时间港和Ｘ光激发发射光谱的测量，我们系统地获得了在掺Ｌａ含量小于或等于１（质量分数）范围...     

分层蒸镀制备聚酰亚胺自支撑膜及其特性研究

 采用分层蒸镀法,在玻璃基片上依次蒸镀二氨基二苯醚（ODA）和均苯四甲酸二酐（PMDA）两种单体,然后在空气环境中对样品进行不同温度和时间的热亚胺化处理,使二者在交界面上反应生成聚酰亚胺。经加热150 ℃ 1 h然后经350 ℃ 2 h处理的样品,在脱膜后能制备出直径1.8 cm,厚度为100 nm的聚酰亚胺自支撑薄膜。用FTIR测量了自支撑薄膜的红外光谱,特征吸收峰的分析表明薄膜已基本上完全亚胺化。用原子力显微镜分析了浮法玻璃衬底上聚酰亚胺薄膜的表面形貌,结果表明以ODA作为内层制备的膜层表面更光滑平整。     

基于多层膜技术的硬X射线Laue透镜衍射效率的理论研究

采用耦合波理论分析了X射线在多层膜Laue透镜中的传播,选择Cu的Kα线作X射线光源,计算了多层膜Laue透镜的衍射效率.材料为WSi2/Si,最外层宽度为10 nm,深度为8 500 nm的多层膜Laue透镜,倾斜情况下外层区域局部光栅的衍射效率可达59%,理论上证明了多层膜Laue透镜是实现X射线聚焦的有效手段.     

水窗波段反射式偏振光学元件的设计和制作

水窗波段是软X射线进行生物活细胞显微成像的最佳波段,因此对于水窗波段偏振光学元件的研究有着非常重要的意义。用菲涅耳公式计算出在水窗波段内不同材料组合对应不同波长的最大反射率,模拟分析了多层膜周期和表界面粗糙度对多层膜偏振光学元件性能的影响。用超高真空磁控溅射镀膜设备,制作出2．40nm、3．00nm和4．30nm波长处W／B4C多层膜偏振元件,并用X射线衍射仪对元件的周期厚度进行了测量,得到的测量结果与设计值偏差很小,可以进行实际应用。为水窗波段反射式偏振光学元件的研究提供了理论依据,同时也为相应偏振光学元件的制备确定了合适的工艺参量。